Robert Jeffrey Bailey

Person

Scotts Valley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atmospheric pressure wafer processing reactor having an internal pr...
- Patent number 6,761,770
- Issue date Jul 13, 2004
- Aviza Technology Inc.
- Lawrence D. Bartholomew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition system
- Patent number 6,485,783
- Issue date Nov 26, 2002
- ASML US, Inc.
- Robert J. Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition system and method
- Patent number 6,206,973
- Issue date Mar 27, 2001
- Silicon Valley Group Thermal System LLC
- Robert J. Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing reactor having a gas flow control system and method
- Patent number 6,143,080
- Issue date Nov 7, 2000
- Silicon Valley Group Thermal Systems LLC
- Lawrence D. Bartholomew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer carrier and semiconductor apparatus for processing a semicond...
- Patent number 6,026,589
- Issue date Feb 22, 2000
- Silicon Valley Group, Thermal Systems LLC
- Jack Chihchieh Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing metal contamination during semiconductor process...
- Patent number 5,916,378
- Issue date Jun 29, 1999
- WJ Semiconductor Equipment Group, Inc.
- Robert Jeffrey Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLEXED DLTS AND HSCV MEASUREMENT SYSTEM
- Publication number 20190377025
- Publication date Dec 12, 2019
- MIASOLÉ HI-TECH CORP.
- Robert Jeffrey Bailey
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD OF FORMING SELENIZED COMPOSITE METAL POWDER
- Publication number 20190134651
- Publication date May 9, 2019
- BEIJING APOLLO DING RONG SOLAR TECHNOLOGY CO., LTD .
- Robert Jeffrey BAILEY
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ROLL-TO-ROLL REACTOR FOR PROCESSING FLEXIBLE CONTINUOUS WORKPIECE
- Publication number 20120234314
- Publication date Sep 20, 2012
- SoloPower, Inc.
- Howard Zolla
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
THERMAL REACTORS WITH IMPROVED GAS FLOW CHARACTERISTICS
- Publication number 20120234242
- Publication date Sep 20, 2012
- SoloPower, Inc.
- Robert Jeffrey Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY DEVICE
- Publication number 20110268891
- Publication date Nov 3, 2011
- SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
- John MacNeil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE-CONTAINING FILM FORMED FROM SILICON
- Publication number 20100117203
- Publication date May 13, 2010
- AVIZA TECHNOLOGY, INC.
- Robert Jeffrey Bailey
- C30 - CRYSTAL GROWTH
Information Patent Application
LAYER TRANSFER FOR LARGE AREA INORGANIC FOILS
- Publication number 20090208725
- Publication date Aug 20, 2009
- Robert J. Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical Assisted Batch Film Deposition
- Publication number 20080038486
- Publication date Feb 14, 2008
- Helmuth Treichel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Showerhead for a Gas Supply Apparatus
- Publication number 20080000424
- Publication date Jan 3, 2008
- AVIZA TECHNOLOGY, INC.
- Robert Jeffrey Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL PROCESSING SYSTEM WITH ACROSS-FLOW LINER
- Publication number 20070137794
- Publication date Jun 21, 2007
- AVIZA TECHNOLOGY, INC.
- Taiquing T. Qiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition apparatus for semiconductor processing
- Publication number 20070022959
- Publication date Feb 1, 2007
- Craig Bercaw
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Uniform batch film deposition process and films so produced
- Publication number 20070010072
- Publication date Jan 11, 2007
- AVIZA TECHNOLOGY, INC.
- Robert Jeffrey Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thermal processing system with cross-flow liner
- Publication number 20050098107
- Publication date May 12, 2005
- Dale R. Du Bois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heated vacuum support apparatus
- Publication number 20030121898
- Publication date Jul 3, 2003
- Tom Kane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atmospheric pressure wafer processing reactor having an internal pr...
- Publication number 20030094136
- Publication date May 22, 2003
- Lawrence D. Bartholomew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER CARRIER AND SEMICONDUCTOR APPARATUS FOR PROCESSING A SEMICOND...
- Publication number 20020066412
- Publication date Jun 6, 2002
- JACK CHIHCHIEH YAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Robert Jeffrey Bailey

Person

Patents Grantslast 30 patents

Atmospheric pressure wafer processing reactor having an internal pr...

Chemical vapor deposition system

Chemical vapor deposition system and method

Wafer processing reactor having a gas flow control system and method

Wafer carrier and semiconductor apparatus for processing a semicond...

Method of reducing metal contamination during semiconductor process...

Patents Applicationslast 30 patents

MULTIPLEXED DLTS AND HSCV MEASUREMENT SYSTEM

SYSTEM AND METHOD OF FORMING SELENIZED COMPOSITE METAL POWDER

ROLL-TO-ROLL REACTOR FOR PROCESSING FLEXIBLE CONTINUOUS WORKPIECE

THERMAL REACTORS WITH IMPROVED GAS FLOW CHARACTERISTICS

GAS DELIVERY DEVICE

OXIDE-CONTAINING FILM FORMED FROM SILICON

LAYER TRANSFER FOR LARGE AREA INORGANIC FOILS

Radical Assisted Batch Film Deposition

Showerhead for a Gas Supply Apparatus

THERMAL PROCESSING SYSTEM WITH ACROSS-FLOW LINER

Deposition apparatus for semiconductor processing

Uniform batch film deposition process and films so produced

Thermal processing system with cross-flow liner

Heated vacuum support apparatus

Atmospheric pressure wafer processing reactor having an internal pr...

WAFER CARRIER AND SEMICONDUCTOR APPARATUS FOR PROCESSING A SEMICOND...