Xinglong Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing systems having multiple plasma configurations
- Patent number 11,024,486
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle generation suppresor by DC bias modulation
- Patent number 10,504,697
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Jonghoon Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced etching processes using remote plasma sources
- Patent number 10,424,485
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 10,354,843
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 10,283,321
- Issue date May 7, 2019
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing systems having multiple plasma configurations
- Patent number 10,256,079
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulated semiconductor faceplate designs
- Patent number 10,170,282
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Xinglong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal with multi-zone temperature control and multiple purge cap...
- Patent number 10,062,587
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Xinglong Chen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 10,056,233
- Issue date Aug 21, 2018
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 10,032,606
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,991,134
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,978,564
- Issue date May 22, 2018
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle generation suppresor by DC bias modulation
- Patent number 9,892,888
- Issue date Feb 13, 2018
- Applied Materials, Inc.
- Jonghoon Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 9,741,545
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,704,723
- Issue date Jul 11, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,659,792
- Issue date May 23, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle generation suppressor by DC bias modulation
- Patent number 9,593,421
- Issue date Mar 14, 2017
- Applied Materials, Inc.
- Jonghoon Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and apparatus adapted to process substrates in e...
- Patent number 9,524,889
- Issue date Dec 20, 2016
- Applied Materials, Inc.
- Steve S. Hongkham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RPS assisted RF plasma source for semiconductor processing
- Patent number 9,502,218
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,449,850
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch selectivity
- Patent number 9,384,997
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 9,373,517
- Issue date Jun 21, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced etching processes using remote plasma sources
- Patent number 9,362,130
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal with multi-zone temperature control and multiple purge cap...
- Patent number 9,267,739
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Xinglong Chen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method for refurbishing an electrostatic chuck with reduced plasma...
- Patent number 9,202,736
- Issue date Dec 1, 2015
- Applied Materials, Inc.
- Kadthala Ramaya Narendrnath
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,184,055
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,153,442
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
INSULATED SEMICONDUCTOR FACEPLATE DESIGNS
- Publication number 20190139743
- Publication date May 9, 2019
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20170301517
- Publication date Oct 19, 2017
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE GENERATION SUPPRESOR BY DC BIAS MODULATION
- Publication number 20170236689
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Jonghoon BAEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20170236691
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEMS HAVING MULTIPLE PLASMA CONFIGURATIONS
- Publication number 20170229289
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE GENERATION SUPPRESOR BY DC BIAS MODULATION
- Publication number 20170148611
- Publication date May 25, 2017
- Applied Materials, Inc.
- Jonghoon BAEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20170125220
- Publication date May 4, 2017
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...
- Publication number 20160300694
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES
- Publication number 20160284556
- Publication date Sep 29, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...
- Publication number 20160126118
- Publication date May 5, 2016
- Applied Materials, Inc.
- Xinglong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160064233
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160027673
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20160005572
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150332930
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150235865
- Publication date Aug 20, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
- Publication number 20150221479
- Publication date Aug 6, 2015
- Applied Materials, Inc.
- Xinglong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY-ETCH SELECTIVITY
- Publication number 20150132968
- Publication date May 14, 2015
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE GENERATION SUPPRESSPR BY DC BIAS MODULATION
- Publication number 20150123541
- Publication date May 7, 2015
- Applied Materials, Inc.
- Jonghoon BAEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20150013793
- Publication date Jan 15, 2015
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS, APPARATUS, AND METHODS ADAPTED TO PROCESS SUBST...
- Publication number 20140263165
- Publication date Sep 18, 2014
- Steve S. Hongkham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273481
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140262038
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273489
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273406
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140273488
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20140271097
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INSULATED SEMICONDUCTOR FACEPLATE DESIGNS
- Publication number 20140252134
- Publication date Sep 11, 2014
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES
- Publication number 20140248780
- Publication date Sep 4, 2014
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS

Xinglong Chen

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Chemical control features in wafer process equipment

Semiconductor processing systems having multiple plasma configurations

Flow control features of CVD chambers

Particle generation suppresor by DC bias modulation

Enhanced etching processes using remote plasma sources

Chemical control features in wafer process equipment

Semiconductor processing system and methods using capacitively coup...

Semiconductor processing systems having multiple plasma configurations

Insulated semiconductor faceplate designs

Pedestal with multi-zone temperature control and multiple purge cap...

RPS assisted RF plasma source for semiconductor processing

Semiconductor processing with DC assisted RF power for improved con...

Processing systems and methods for halide scavenging

Chemical control features in wafer process equipment

Particle generation suppresor by DC bias modulation

RPS assisted RF plasma source for semiconductor processing

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Particle generation suppressor by DC bias modulation

Processing systems and apparatus adapted to process substrates in e...

RPS assisted RF plasma source for semiconductor processing

Processing systems and methods for halide scavenging

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved con...

Enhanced etching processes using remote plasma sources

Pedestal with multi-zone temperature control and multiple purge cap...

Method for refurbishing an electrostatic chuck with reduced plasma...

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Patents Applicationslast 30 patents

FLOW CONTROL FEATURES OF CVD CHAMBERS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

INSULATED SEMICONDUCTOR FACEPLATE DESIGNS

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

PARTICLE GENERATION SUPPRESOR BY DC BIAS MODULATION

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

SEMICONDUCTOR PROCESSING SYSTEMS HAVING MULTIPLE PLASMA CONFIGURATIONS

PARTICLE GENERATION SUPPRESOR BY DC BIAS MODULATION

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...

ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES

PEDESTAL WITH MULTI-ZONE TEMPERATURE CONTROL AND MULTIPLE PURGE CAP...

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

RPS ASSISTED RF PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING

DRY-ETCH SELECTIVITY

PARTICLE GENERATION SUPPRESSPR BY DC BIAS MODULATION

FLOW CONTROL FEATURES OF CVD CHAMBERS

PROCESSING SYSTEMS, APPARATUS, AND METHODS ADAPTED TO PROCESS SUBST...

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

INSULATED SEMICONDUCTOR FACEPLATE DESIGNS

ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES