Xue-Yu Qian

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reducing deposition of process residues on a surface in a chamber
- Patent number 6,835,275
- Issue date Dec 28, 2004
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber having process monitoring window
- Patent number 6,712,927
- Issue date Mar 30, 2004
- Applied Materials Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-cleaning etch process
- Patent number 6,699,399
- Issue date Mar 2, 2004
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with coil antenna of concentrically spiral conductor...
- Patent number 6,504,126
- Issue date Jan 7, 2003
- Applied Materials, Inc.
- Xue-Yu Qian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor with dynamic RF inductive and capacitive coupling co...
- Patent number 6,447,636
- Issue date Sep 10, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber having improved process monitoring window
- Patent number 6,390,019
- Issue date May 21, 2002
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment of etching chambers using activated cleaning gas
- Patent number 6,379,575
- Issue date Apr 30, 2002
- Applied Materials, Inc.
- Gerald Zheyao Yin
- B08 - CLEANING
Information Patent Grant
Plasma reactor with antenna of coil conductors of concentric helice...
- Patent number 6,373,022
- Issue date Apr 16, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with coil antenna of plural helical conductors with...
- Patent number 6,369,348
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with coil antenna of interleaved conductors
- Patent number 6,369,349
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma reactor with symmetrical parallel multip...
- Patent number 6,297,468
- Issue date Oct 2, 2001
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma reactor with symmetrical parallel multip...
- Patent number 6,291,793
- Issue date Sep 18, 2001
- Appplied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-cleaning etch process
- Patent number 6,136,211
- Issue date Oct 24, 2000
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically-enhanced plasma chamber with non-uniform magnetic field
- Patent number 6,113,731
- Issue date Sep 5, 2000
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron flood apparatus for neutralizing charge build-up on a subs...
- Patent number 6,100,536
- Issue date Aug 8, 2000
- Applied Materials, Inc.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma reactor with an inductive coil antenna h...
- Patent number 6,016,131
- Issue date Jan 18, 2000
- Applied Materials, Inc.
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic frequency tuning of an RF power source of an inductively...
- Patent number 5,919,382
- Issue date Jul 6, 1999
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma reactor with an inductive coil antenna h...
- Patent number 5,907,221
- Issue date May 25, 1999
- Applied Materials, Inc.
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon and polycide plasma etch appplications by use of silicon-co...
- Patent number 5,863,839
- Issue date Jan 26, 1999
- Applied Materials, Inc.
- Dale A. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring plasma characteristics within a semiconduct...
- Patent number 5,801,386
- Issue date Sep 1, 1998
- Applied Materials, Inc.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching silicon-containing materials by use of silicon-containing c...
- Patent number 5,705,433
- Issue date Jan 6, 1998
- Applied Materials, Inc.
- Dale A. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled RF plasma reactor with floating coil antenna fo...
- Patent number 5,683,539
- Issue date Nov 4, 1997
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring the amount of capacitive coupling of RF power i...
- Patent number 5,667,701
- Issue date Sep 16, 1997
- Applied Materials, Inc.
- Arthur Sato
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma reactor with a segmented balanced electrode for sputtering p...
- Patent number 5,565,074
- Issue date Oct 15, 1996
- Applied Materials, Inc.
- Xue Y. Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for altering magnetic coil current to produce...
- Patent number 5,534,108
- Issue date Jul 9, 1996
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma reactor with coil antenna of interleaved conductors
- Publication number 20010004000
- Publication date Jun 21, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with coil antenna of plural helical conductors with...
- Publication number 20010001201
- Publication date May 17, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with coil antenna of concentrically spiral conductor...
- Publication number 20010000898
- Publication date May 10, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with antenna of coil conductors of concentric helice...
- Publication number 20010000604
- Publication date May 3, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS

Xue-Yu Qian

Person

Patents Grantslast 30 patents

Reducing deposition of process residues on a surface in a chamber

Chamber having process monitoring window

Self-cleaning etch process

Plasma reactor with coil antenna of concentrically spiral conductor...

Plasma reactor with dynamic RF inductive and capacitive coupling co...

Chamber having improved process monitoring window

Treatment of etching chambers using activated cleaning gas

Plasma reactor with antenna of coil conductors of concentric helice...

Plasma reactor with coil antenna of plural helical conductors with...

Plasma reactor with coil antenna of interleaved conductors

Inductively coupled plasma reactor with symmetrical parallel multip...

Inductively coupled plasma reactor with symmetrical parallel multip...

Self-cleaning etch process

Magnetically-enhanced plasma chamber with non-uniform magnetic field

Electron flood apparatus for neutralizing charge build-up on a subs...

Inductively coupled plasma reactor with an inductive coil antenna h...

Automatic frequency tuning of an RF power source of an inductively...

Inductively coupled plasma reactor with an inductive coil antenna h...

Silicon and polycide plasma etch appplications by use of silicon-co...

Apparatus for measuring plasma characteristics within a semiconduct...

Etching silicon-containing materials by use of silicon-containing c...

Inductively coupled RF plasma reactor with floating coil antenna fo...

Method of measuring the amount of capacitive coupling of RF power i...

Plasma reactor with a segmented balanced electrode for sputtering p...

Method and apparatus for altering magnetic coil current to produce...

Patents Applicationslast 30 patents

Plasma reactor with coil antenna of interleaved conductors

Plasma reactor with coil antenna of plural helical conductors with...

Plasma reactor with coil antenna of concentrically spiral conductor...

Plasma reactor with antenna of coil conductors of concentric helice...