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H01J2237/31777

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/31777by projection

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Patents Grantslast 30 patents

Information Patent Grant
Pattern formation method and template manufacturing method
- Patent number 11,862,430
- Issue date Jan 2, 2024
- Kioxia Corporation
- Ryota Seki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Blanking aperture array apparatus, charged particle beam lithograph...
- Patent number 10,068,750
- Issue date Sep 4, 2018
- NuFlare Technology, Inc.
- Masayoshi Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical fiber feedthrough device and fiber path arrangement
- Patent number 10,008,362
- Issue date Jun 26, 2018
- Mapper Lithography IP B.V.
- Johannes Petrus Sprengers
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,759,550
- Issue date Sep 12, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,714,822
- Issue date Jul 25, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Direct write lithography system
- Patent number 8,610,093
- Issue date Dec 17, 2013
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and projection method
- Patent number 8,242,467
- Issue date Aug 14, 2012
- Mapper Lithography IP B.V.
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Direct write lithography system
- Patent number 8,153,991
- Issue date Apr 10, 2012
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle-beam exposure apparatus with overall-modulation of a patte...
- Patent number 7,781,748
- Issue date Aug 24, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and projection method
- Patent number 7,709,815
- Issue date May 4, 2010
- Mapper Lithography IP B.V.
- Remco Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing apparatus and lithography system using the same
- Patent number 7,646,003
- Issue date Jan 12, 2010
- Samsung Electronics Co., Ltd.
- Chang-Wook Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing electron beam writing data, program of producin...
- Patent number 7,301,161
- Issue date Nov 27, 2007
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct write lithography system
- Patent number 6,919,952
- Issue date Jul 19, 2005
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for emission lithography using patterned emitter
- Patent number 6,740,895
- Issue date May 25, 2004
- Samsung Electronics Co., Ltd.
- In-Kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized curvilinear variable axis lens doublet for charged partic...
- Patent number 6,617,585
- Issue date Sep 9, 2003
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for pyroelectric lithography using patterned e...
- Patent number 6,566,666
- Issue date May 20, 2003
- Samsung Electronics Co., Ltd.
- In-Kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for pyroelectric emission lithography using patterned emi...
- Patent number 6,476,402
- Issue date Nov 5, 2002
- Samsung Electronics Co., Ltd.
- In-Kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system
- Patent number 6,335,783
- Issue date Jan 1, 2002
- Technische Universiteit Delft
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing system error detection
- Patent number 5,906,902
- Issue date May 25, 1999
- Lucent Technologies Inc.
- Reginald Conway Farrow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a lithographic mask
- Patent number 5,899,728
- Issue date May 4, 1999
- Motorola, Inc.
- Pawitter J. S. Mangat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion beam gun and ion beam exposure device
- Patent number 4,902,897
- Issue date Feb 20, 1990
- Seiko Epson Corporation
- Seiichi Iwamatsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron image projector
- Patent number 4,705,956
- Issue date Nov 10, 1987
- U.S. Philips Corporation
- Rodney Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and device for corpuscular projection
- Patent number 4,472,636
- Issue date Sep 18, 1984
- Eberhard Hahn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
3113896
- Patent number 3,113,896
- Issue date Dec 10, 1963
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20220051871
- Publication date Feb 17, 2022
- KIOXIA Corporation
- Ryota SEKI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ELECTRONIC LITHOGRAPHY WITH ELECTROSTATIC SCREENING
- Publication number 20190057838
- Publication date Feb 21, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Ludovic LATTARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL FIBER FEEDTHROUGH DEVICE AND FIBER PATH ARRANGEMENT
- Publication number 20180182594
- Publication date Jun 28, 2018
- MAPPER LITHOGRAPHY IP BV
- Johannes Petrus Sprengers
- G02 - OPTICS
Information Patent Application
BLANKING APERTURE ARRAY APPARATUS, CHARGED PARTICLE BEAM LITHOGRAPH...
- Publication number 20180076006
- Publication date Mar 15, 2018
- NuFlare Technology, Inc.
- Masayoshi ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...
- Publication number 20150198437
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Alexander Wolf
- G01 - MEASURING TESTING
Information Patent Application
DIRECT WRITE LITHOGRAPHY SYSTEM
- Publication number 20120224155
- Publication date Sep 6, 2012
- MAPPER LITHOGRAPHY IP BV
- Pieter KRUIT
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY SYSTEM AND PROJECTION METHOD
- Publication number 20100171046
- Publication date Jul 8, 2010
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Application
PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTE...
- Publication number 20090200495
- Publication date Aug 13, 2009
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system and projection method
- Publication number 20070064213
- Publication date Mar 22, 2007
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Application
Focusing apparatus and lithography system using the same
- Publication number 20060151712
- Publication date Jul 13, 2006
- Chang-Wook Moon
- B82 - NANO-TECHNOLOGY
Information Patent Application
Direct write lithography system
- Publication number 20050224726
- Publication date Oct 13, 2005
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of producing electron beam writing data, program of producin...
- Publication number 20050208772
- Publication date Sep 22, 2005
- Ryoichi Inanami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Direct write lithography system
- Publication number 20030219572
- Publication date Nov 27, 2003
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and apparatus for pyroelectric lithography using patterned e...
- Publication number 20030006381
- Publication date Jan 9, 2003
- Samsung Electronics Co., Ltd.
- In-Kyeong Yoo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and apparatus for emission lithography using patterned emitter
- Publication number 20020012860
- Publication date Jan 31, 2002
- In-Kyeong Yoo
- B82 - NANO-TECHNOLOGY

by projection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern formation method and template manufacturing method

Method for projecting a beam of particles onto a substrate with cor...

Blanking aperture array apparatus, charged particle beam lithograph...

Optical fiber feedthrough device and fiber path arrangement

Projection exposure apparatus for microlithography comprising an op...

Projection exposure apparatus for microlithography comprising an op...

Direct write lithography system

Lithography system and projection method

Direct write lithography system

Particle-beam exposure apparatus with overall-modulation of a patte...

Lithography system and projection method

Focusing apparatus and lithography system using the same

Method of producing electron beam writing data, program of producin...

Direct write lithography system

Method and apparatus for emission lithography using patterned emitter

Optimized curvilinear variable axis lens doublet for charged partic...

Method and apparatus for pyroelectric lithography using patterned e...

Apparatus for pyroelectric emission lithography using patterned emi...

Lithography system

Manufacturing system error detection

Method of forming a lithographic mask

Ion beam gun and ion beam exposure device

Electron image projector

Method of and device for corpuscular projection

3113896

Patents Applicationslast 30 patents

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

METHOD FOR ELECTRONIC LITHOGRAPHY WITH ELECTROSTATIC SCREENING

OPTICAL FIBER FEEDTHROUGH DEVICE AND FIBER PATH ARRANGEMENT

BLANKING APERTURE ARRAY APPARATUS, CHARGED PARTICLE BEAM LITHOGRAPH...

PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...

DIRECT WRITE LITHOGRAPHY SYSTEM

LITHOGRAPHY SYSTEM AND PROJECTION METHOD

PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTE...

Lithography system and projection method

Focusing apparatus and lithography system using the same

Direct write lithography system

Method of producing electron beam writing data, program of producin...

Direct write lithography system

Method and apparatus for pyroelectric lithography using patterned e...

Method and apparatus for emission lithography using patterned emitter