This application is a continuation of application Ser. No. 08/201,866, filed on Feb. 25, 1994
Number | Name | Date | Kind |
---|---|---|---|
4431923 | Wang et al. | Feb 1984 | |
4513203 | Bohlen et al. | Apr 1985 | |
4564764 | Yasuda et al. | Jan 1986 | |
4590382 | Tabata | May 1986 | |
4742923 | Kuyel | May 1988 | |
4757207 | Chappelow et al. | Jul 1988 | |
4929083 | Brunner | May 1990 | |
4971444 | Kato | Nov 1990 | |
5040228 | Bose et al. | Aug 1991 | |
5074667 | Miyatake | Dec 1991 | |
5079112 | Berger et al. | Jan 1992 | |
5087537 | Conway et al. | Feb 1992 | |
5130213 | Berger et al. | Jul 1992 | |
5153678 | Ota | Oct 1992 | |
5160845 | Stumbo et al. | Nov 1992 | |
5279925 | Berger et al. | Jan 1994 | |
5521036 | Iwamoto et al. | May 1996 |
Number | Date | Country |
---|---|---|
A-0 130 691 | Jan 1985 | EPX |
A-0 170 013 | Feb 1986 | EPX |
Entry |
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S. D. Berger et al., "Projection Electron-Beam Lithography: A New Approach," J. Vac. Sci. Technol., B9 (6), Nov./Dec. 1991, pp. 2996-2999. |
R. C. Farrow et al., "Mark Detection for Alignment and Registration in a High-Throughput Projection Electron Lithography Tool," J. Vac. Sci. Technol., B10 (6), Nov./Dec. 1992, pp. 2780-2783. |
R. C. Farrow et al., "Alignment and Registration Schemes for Projection Electron Lithography," J. Vac. Sci. Technol., B9 (6), Nov./Dec. 1991, pp. 3582-3585. |
Number | Date | Country | |
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Parent | 201866 | Feb 1994 |