3113896

Information

• Patent Grant
• 3113896

• References
• Source

• Patent Number

  3,113,896

• Date Filed

  Not available

• Date Issued

  Tuesday, December 10, 1963
  61 years ago

• CPC

  • B82Y10/00 - Nano-technology for information processing, storage or transmission
  • B82Y40/00 - Manufacture or treatment of nano-structures
  • C08F2/46 - Polymerisation initiated by wave energy or particle radiation
  • C23F1/02 - Local etching
  • H01J37/3175 - Projection methods
  • H05K3/061 - Etching masks
  • H01J2237/31754 - using electron beams
  • H01J2237/31777 - by projection
  • H05K3/0082 - characterised by the exposure method of radiation-sensitive masks
  • H05K2201/0179 - Thin film deposited insulating layer
  • H05K2203/092 - Particle beam
  • Y10S438/949 - Energy beam treating radiation resist on semiconductor
  • Y10T29/49156 - with selective destruction of conductive paths

• US Classifications

  • 430 - Radiation imagery chemistry: process, composition, or product thereof
  • 029 - Metal working
  • 216 - Etching a substrate: processes
  • 219 - Electric heating
  • 250 - Radiant energy
  • 427 - Coating processes
  • 438 - Semiconductor device manufacturing: process
  • 522 - Synthetic resins or natural rubbers