comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

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G03F7/203

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/203comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-tone scheme for maskless lithography
- Patent number 12,105,424
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum-limited extreme ultraviolet coherent diffraction imaging
- Patent number 12,085,520
- Issue date Sep 10, 2024
- Regents of the Univ of Colorado
- Henry C. Kapteyn
- G01 - MEASURING TESTING
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,061,418
- Issue date Aug 13, 2024
- FUJIFILM Corporation
- Hideyuki Ishihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for exposure of flexographic printing plates u...
- Patent number 12,055,856
- Issue date Aug 6, 2024
- Esko-Graphics Imaging GmbH
- Jörg Wolterink
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mask, exposure method and touch panel
- Patent number 12,050,397
- Issue date Jul 30, 2024
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Jie Lei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition that contains triaryldia...
- Patent number 12,025,916
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material and patterning process
- Patent number 11,994,798
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two-stage bake photoresist with releasable quencher
- Patent number 11,955,343
- Issue date Apr 9, 2024
- Intel Corporation
- Robert L. Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition, and resis...
- Patent number 11,926,581
- Issue date Mar 12, 2024
- SAN-APRO LIMITED
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,914,291
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,899,366
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film structure for electric field guided photoresist patterning pro...
- Patent number 11,880,137
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens adjustment for an edge exposure tool
- Patent number 11,852,979
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yong-Ting Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and template manufacturing method
- Patent number 11,809,082
- Issue date Nov 7, 2023
- Kioxia Corporation
- Mitsuru Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a patterned structure and device thereof
- Patent number 11,803,125
- Issue date Oct 31, 2023
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive composition and pattern-forming method
- Patent number 11,796,912
- Issue date Oct 24, 2023
- JSR Corporation
- Motohiro Shiratani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus of patterning a semiconductor device
- Patent number 11,762,296
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for forming resist pattern using EUV light wi...
- Patent number 11,754,925
- Issue date Sep 12, 2023
- SK Hynix Inc.
- Bu Geun Ki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminate for patterned substrates
- Patent number 11,732,098
- Issue date Aug 22, 2023
- LG Chem, Ltd.
- Mi Sook Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,681,224
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES U...
- Publication number 20240369934
- Publication date Nov 7, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Jörg Wolterink
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MASK, EXPOSURE METHOD AND TOUCH PANEL
- Publication number 20240345470
- Publication date Oct 17, 2024
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jie LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT
- Publication number 20240271996
- Publication date Aug 15, 2024
- KLA Corporation
- Matthew Hoffman
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240264541
- Publication date Aug 8, 2024
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Xiaosong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE...
- Publication number 20240231234
- Publication date Jul 11, 2024
- Mitsubishi Electric Corporation
- Yasuhiro MATSUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Polymer Composition, Coated Product, And Patterning Process
- Publication number 20240219836
- Publication date Jul 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240192598
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...
- Publication number 20240118623
- Publication date Apr 11, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL
- Publication number 20240085798
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Ting WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PHASE ARRAY ANTENNA BASED ON OPTICAL WAVEGUIDE TYPE WITH HY...
- Publication number 20240077594
- Publication date Mar 7, 2024
- GIST (Gwangju Institute of Science and Technology)
- Nan Ei YU
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR EXPOSURE OF RELIEF PRECURSORS WITH MULTIPLE PROFILES
- Publication number 20240061340
- Publication date Feb 22, 2024
- XSYS GERMANY GMBH
- Maximilian THATE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR IMPROVED EXPOSURE OF RELIEF PRECURSORS
- Publication number 20240061341
- Publication date Feb 22, 2024
- XSYS GERMANY GMBH
- Maximilian THATE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION O...
- Publication number 20240061335
- Publication date Feb 22, 2024
- UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Bong Soo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist Material And Patterning Process
- Publication number 20240027903
- Publication date Jan 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PATTERNED BASE MEMBER, PROCESSING METHOD, A...
- Publication number 20240012331
- Publication date Jan 11, 2024
- Nichia Corporation.
- Tsutomu YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TANTALA-RING-RESONATOR-BASED PHOTONIC DEVICE AND FREQUENCY-COMB GEN...
- Publication number 20240004262
- Publication date Jan 4, 2024
- The Regents of the University of Colorado, a body corporate
- Su-Peng Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20230418156
- Publication date Dec 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE
- Publication number 20230359118
- Publication date Nov 9, 2023
- ASML HOLDING N.V.
- Sotrios LYRINTZIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC...
- Publication number 20230333479
- Publication date Oct 19, 2023
- FUJIFILM CORPORATION
- Kazuki WATANABE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHY STITCHING
- Publication number 20230324805
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS
- Publication number 20230259035
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Paola DE CECCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD
- Publication number 20230176479
- Publication date Jun 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20230118534
- Publication date Apr 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...
- Publication number 20230103682
- Publication date Apr 6, 2023
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
APPARATUS AND METHOD FOR EXPOSURE OF RELIEF PRECURSORS
- Publication number 20230059435
- Publication date Feb 23, 2023
- XSYS PREPRESS NV
- Dirk Ludo Julien DE RAUW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004082
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemical amplification methods and techniques for developable botto...

Multi-tone scheme for maskless lithography

Quantum-limited extreme ultraviolet coherent diffraction imaging

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Method and apparatus for exposure of flexographic printing plates u...

Mask, exposure method and touch panel

Resist material and patterning process

Resist underlayer film-forming composition that contains triaryldia...

Resist material and patterning process

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Two-stage bake photoresist with releasable quencher

Sulfonium salt, photoacid generator, curable composition, and resis...

Resist composition and patterning process

Method and apparatus for post exposure processing of photoresist wa...

Multiple patterning with organometallic photopatternable layers wit...

Film structure for electric field guided photoresist patterning pro...

Lens adjustment for an edge exposure tool

Pattern forming method and template manufacturing method

Method of forming a patterned structure and device thereof

Underlayer material for photoresist

Radiation-sensitive composition and pattern-forming method

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Method of making semiconductor device and semiconductor device

Method and apparatus of patterning a semiconductor device

Methods and apparatus for forming resist pattern using EUV light wi...

Laminate for patterned substrates

Sulfonium compound, chemically amplified resist composition, and pa...

Resin, resist composition and method for producing resist pattern

Patents Applicationslast 30 patents

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

METHOD AND APPARATUS FOR EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES U...

MASK, EXPOSURE METHOD AND TOUCH PANEL

Composition For Forming Silicon-Containing Resist Underlayer Film A...

OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT

EXPOSURE APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE...

Conductive Polymer Composition, Coated Product, And Patterning Process

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...

LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL

OPTICAL PHASE ARRAY ANTENNA BASED ON OPTICAL WAVEGUIDE TYPE WITH HY...

METHOD FOR EXPOSURE OF RELIEF PRECURSORS WITH MULTIPLE PROFILES

APPARATUS AND METHOD FOR IMPROVED EXPOSURE OF RELIEF PRECURSORS

CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION O...

Resist Material And Patterning Process

METHOD OF MANUFACTURING PATTERNED BASE MEMBER, PROCESSING METHOD, A...

TANTALA-RING-RESONATOR-BASED PHOTONIC DEVICE AND FREQUENCY-COMB GEN...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE

LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC...

LITHOGRAPHY STITCHING

CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS

NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...

APPARATUS AND METHOD FOR EXPOSURE OF RELIEF PRECURSORS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS