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H01J37/32027

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32027DC powered

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron bias control signals for electron enhanced material proces...
- Patent number 12,125,686
- Issue date Oct 22, 2024
- VELVETCH, LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 12,119,205
- Issue date Oct 15, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable inductor for plasma generator
- Patent number 12,087,546
- Issue date Sep 10, 2024
- Advanced Energy Industries, Inc.
- Fabio Vicinanza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,027,344
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron bias control signals for electron enhanced material proces...
- Patent number 12,027,348
- Issue date Jul 2, 2024
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic polymer film and manufacturing method thereof
- Patent number 11,969,752
- Issue date Apr 30, 2024
- Feng Chia University
- Ping-Yen Hsieh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,942,306
- Issue date Mar 26, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for controlling ion energy distribution
- Patent number 11,901,157
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Linying Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron bias control signals for electron enhanced material proces...
- Patent number 11,887,823
- Issue date Jan 30, 2024
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,869,747
- Issue date Jan 9, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC bias in plasma process
- Patent number 11,854,766
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,830,704
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,825,589
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,810,757
- Issue date Nov 7, 2023
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,715,623
- Issue date Aug 1, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron bias control signals for electron enhanced material proces...
- Patent number 11,688,588
- Issue date Jun 27, 2023
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,676,797
- Issue date Jun 13, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,664,195
- Issue date May 30, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing tungsten resistivity
- Patent number 11,655,534
- Issue date May 23, 2023
- Applied Materials, Inc.
- Wenting Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of low-temperature plasma generation, method of an electrica...
- Patent number 11,651,937
- Issue date May 16, 2023
- FYZIKALINI USTAV AV CR, V.V.I.
- ZdenZden{hacek over (e)}k Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,574,798
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage filter assembly
- Patent number 11,508,554
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Anurag Kumar Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing tungsten resistivity
- Patent number 11,447,857
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Wenting Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DC bias in plasma process
- Patent number 11,404,245
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer chuck and processing arrangement
- Patent number 11,387,081
- Issue date Jul 12, 2022
- Infineon Technologies AG
- Rudolf Kogler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for coating surfaces
- Patent number 11,348,759
- Issue date May 31, 2022
- AGM Container Controls, Inc.
- Andrew Tudhope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma nitriding with PECVD coatings using hollow cathode ion immer...
- Patent number 11,339,464
- Issue date May 24, 2022
- AGM Container Controls, Inc.
- Andrew Tudhope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power cable with an overmolded probe for power transfer to a non-th...
- Patent number 11,289,240
- Issue date Mar 29, 2022
- Volt Holdings, LLC
- Peter Farrell
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240395508
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20240347323
- Publication date Oct 17, 2024
- VELVETCH LLC
- David Irwin Margolese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...
- Publication number 20240321561
- Publication date Sep 26, 2024
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSING POWER SUPPLY WITH POWERED CROWBAR
- Publication number 20240282552
- Publication date Aug 22, 2024
- EHT Ventures LLC
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONT
- Publication number 20240249913
- Publication date Jul 25, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PULSE PLASMA SUBSTRATE TREATMENT APPARATUS
- Publication number 20240249919
- Publication date Jul 25, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240154594
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...
- Publication number 20240128060
- Publication date Apr 18, 2024
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC Bias in Plasma Process
- Publication number 20240071722
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240006152
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...
- Publication number 20230260765
- Publication date Aug 17, 2023
- VELVETCH LLC
- Stewart Francis Sando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20230162946
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230144264
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230143453
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230140979
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20230051432
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM
- Publication number 20220384147
- Publication date Dec 1, 2022
- SEMES CO., LTD.
- Sang Hwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC Bias in Plasma Process
- Publication number 20220359158
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR REDUCING TUNGSTEN RESITIVITY
- Publication number 20220341025
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Wenting HOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANIC POLYMER FILM AND MANUFACTURING METHOD THEREOF
- Publication number 20220193719
- Publication date Jun 23, 2022
- Feng Chia University
- PING-YEN HSIEH
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND METHODS FOR CONTROLLING ION ENERGY DISTRIBUTION
- Publication number 20220157561
- Publication date May 19, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD, AND CONTROL PROGRAM
- Publication number 20220122813
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING TUNGSTEN RESITIVITY
- Publication number 20220081756
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Wenting HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...
- Publication number 20210343448
- Publication date Nov 4, 2021
- Volt Holdings, LLC
- Peter Farrell
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210267042
- Publication date Aug 26, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD
- Publication number 20210172060
- Publication date Jun 10, 2021
- DIAROTECH
- Horacio TELLEZ OLIVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20210134561
- Publication date May 6, 2021
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...
- Publication number 20210050181
- Publication date Feb 18, 2021
- FYZIKALNI USTAV AV CR, V.V.I.
- Zdenek Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20200357658
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Etching apparatus and etching method

Electron bias control signals for electron enhanced material proces...

Atomic layer etching by electron wavefront

Variable inductor for plasma generator

Film forming apparatus

Electron bias control signals for electron enhanced material proces...

Organic polymer film and manufacturing method thereof

Atomic layer etching by electron wavefront

Methods and apparatus for processing a substrate

Apparatus and methods for controlling ion energy distribution

Electron bias control signals for electron enhanced material proces...

Atomic layer etching by electron wavefront

DC bias in plasma process

Plasma processing apparatus and control method

Plasma processing apparatus and plasma processing method

Atomic layer etching by electron wavefront

DC plasma control for electron enhanced material processing

Electron bias control signals for electron enhanced material proces...

DC plasma control for electron enhanced material processing

DC plasma control for electron enhanced material processing

Apparatus for reducing tungsten resistivity

Method of low-temperature plasma generation, method of an electrica...

Plasma processing apparatus and control method

High voltage filter assembly

Methods and apparatus for reducing tungsten resistivity

DC bias in plasma process

Wafer chuck and processing arrangement

Systems and methods for coating surfaces

Plasma nitriding with PECVD coatings using hollow cathode ion immer...

Power cable with an overmolded probe for power transfer to a non-th...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD

COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING

ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...

PULSING POWER SUPPLY WITH POWERED CROWBAR

ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONT

DC PULSE PLASMA SUBSTRATE TREATMENT APPARATUS

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...

DC Bias in Plasma Process

ETCHING METHOD AND ETCHING APPARATUS

ELECTRON BIAS CONTROL SIGNALS FOR ELECTRON ENHANCED MATERIAL PROCES...

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

FILM FORMING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM

DC Bias in Plasma Process

APPARATUS FOR REDUCING TUNGSTEN RESITIVITY

ORGANIC POLYMER FILM AND MANUFACTURING METHOD THEREOF

APPARATUS AND METHODS FOR CONTROLLING ION ENERGY DISTRIBUTION

SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD, AND CONTROL PROGRAM

METHODS AND APPARATUS FOR REDUCING TUNGSTEN RESITIVITY

POWER CABLE WITH AN OVERMOLDED PROBE FOR POWER TRANSFER TO A NON-TH...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...

ETCHING APPARATUS AND ETCHING METHOD