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DC Bias in Plasma Process
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Publication number 20240071722
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Publication date Feb 29, 2024
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Taiwan Semiconductor Manufacturing Co., Ltd.
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H01 - BASIC ELECTRIC ELEMENTS
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FILM FORMING APPARATUS
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Publication number 20230051432
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Publication date Feb 16, 2023
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TOKYO ELECTRON LIMITED
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Shinya IWASHITA
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H01 - BASIC ELECTRIC ELEMENTS
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DC Bias in Plasma Process
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Publication number 20220359158
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Publication date Nov 10, 2022
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Taiwan Semiconductor Manufacturing Co., Ltd.
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Sheng-Liang Pan
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H01 - BASIC ELECTRIC ELEMENTS
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APPARATUS FOR REDUCING TUNGSTEN RESITIVITY
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Publication number 20220341025
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Publication date Oct 27, 2022
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Applied Materials, Inc.
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Wenting HOU
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ELECTROSTATIC CHUCKING PROCESS
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Publication number 20200328063
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Publication date Oct 15, 2020
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Applied Materials, Inc.
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Sarah Michelle BOBEK
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H01 - BASIC ELECTRIC ELEMENTS
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SUBSTRATE PROCESSING METHOD AND APPARATUS
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Publication number 20200294767
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Publication date Sep 17, 2020
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TOKYO ELECTRON LIMITED
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Yoshinori YAMAMOTO
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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WAFER CHUCK AND PROCESSING ARRANGEMENT
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Publication date Aug 6, 2020
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INFINEON TECHNOLOGIES AG
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Rudolf Kogler
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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HIGH VOLTAGE FILTER ASSEMBLY
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Publication number 20200243303
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Publication date Jul 30, 2020
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Applied Materials, Inc.
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Anurag Kumar MISHRA
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H01 - BASIC ELECTRIC ELEMENTS