Deposition of Tantalum oxides

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H01L21/31637

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31637Deposition of Tantalum oxides

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Enhanced thin film deposition
- Patent number 10,964,534
- Issue date Mar 30, 2021
- ASM International
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 10,297,444
- Issue date May 21, 2019
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 9,831,094
- Issue date Nov 28, 2017
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device comprising capacitive element
- Patent number 9,373,679
- Issue date Jun 21, 2016
- Renesas Electronics Corporation
- Ippei Kume
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile semiconductor memory device and manufacturing method th...
- Patent number 9,231,070
- Issue date Jan 5, 2016
- Semiconductor Energy Laboratory Co., Ltd.
- Tetsuya Kakehata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced thin film deposition
- Patent number 9,127,351
- Issue date Sep 8, 2015
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced thin film deposition
- Patent number 8,993,055
- Issue date Mar 31, 2015
- ASM International N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post deposition plasma cleaning system and method
- Patent number 8,974,868
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device comprising capacitive element
- Patent number 8,810,000
- Issue date Aug 19, 2014
- Renesas Electronics Corporation
- Ippei Kume
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge reservoir structure
- Patent number 8,802,539
- Issue date Aug 12, 2014
- Soitec
- Frederic Allibert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectrics containing at least one of a refractory metal or a non-...
- Patent number 8,772,851
- Issue date Jul 8, 2014
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Zirconium-doped tantalum oxide films
- Patent number 8,765,616
- Issue date Jul 1, 2014
- Micron Technology, Inc.
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium tantalum oxynitride dielectric
- Patent number 8,759,170
- Issue date Jun 24, 2014
- Micron Technology, Inc.
- Leonard Forbes
- G11 - INFORMATION STORAGE
Information Patent Grant
Hafnium tantalum titanium oxide films
- Patent number 8,685,815
- Issue date Apr 1, 2014
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectrics containing at least one of a refractory metal or a non-...
- Patent number 8,557,672
- Issue date Oct 15, 2013
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium tantalum oxide dielectrics
- Patent number 8,524,618
- Issue date Sep 3, 2013
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tantalum silicon oxynitride high-K dielectrics and metal gates
- Patent number 8,519,466
- Issue date Aug 27, 2013
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium tantalum oxynitride dielectric
- Patent number 8,466,016
- Issue date Jun 18, 2013
- Micron Technolgy, Inc.
- Leonard Forbes
- G11 - INFORMATION STORAGE
Information Patent Grant
Dielectric structures
- Patent number 8,421,140
- Issue date Apr 16, 2013
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hafnium tantalum titanium oxide films
- Patent number 8,405,167
- Issue date Mar 26, 2013
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilization of high-k dielectric materials
- Patent number 8,323,754
- Issue date Dec 4, 2012
- Applied Materials, Inc.
- Christopher Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Zirconium-doped tantalum oxide films
- Patent number 8,288,809
- Issue date Oct 16, 2012
- Micron Technology, Inc.
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium tantalum oxide dielectrics
- Patent number 8,278,225
- Issue date Oct 2, 2012
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor device and methods of manufacture thereof
- Patent number 8,269,289
- Issue date Sep 18, 2012
- Infineon Technologies AG
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a capacitor dielectric having tetragonal phase
- Patent number 8,256,077
- Issue date Sep 4, 2012
- Hynix Semiconductor Inc.
- Jong-Bum Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a high-K dielectric layer
- Patent number 8,211,812
- Issue date Jul 3, 2012
- IMEC
- Lars-Ake Ragnarsson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Crystallographically orientated tantalum pentoxide and methods of m...
- Patent number 8,208,241
- Issue date Jun 26, 2012
- Micron Technology, Inc.
- Vishwanath Bhat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tantalum silicon oxynitride high-K dielectrics and metal gates
- Patent number 8,168,502
- Issue date May 1, 2012
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitor of a semiconductor device
- Patent number 8,159,016
- Issue date Apr 17, 2012
- Samsung Electronics Co., Ltd.
- Sung-ho Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tantalum aluminum oxynitride high-K dielectric
- Patent number 8,114,763
- Issue date Feb 14, 2012
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ENHANCED THIN FILM DEPOSITION
- Publication number 20180130666
- Publication date May 10, 2018
- ASM INTERNATIONAL N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20140322923
- Publication date Oct 30, 2014
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR OPTOELECTRONICS DEVICES
- Publication number 20140217539
- Publication date Aug 7, 2014
- SILECS OY
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20140035101
- Publication date Feb 6, 2014
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC
- Publication number 20130279259
- Publication date Oct 24, 2013
- Leonard Forbes
- G11 - INFORMATION STORAGE
Information Patent Application
HAFNIUM TANTALUM TITANIUM OXIDE FILMS
- Publication number 20130224916
- Publication date Aug 29, 2013
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR OPTOELECTRONICS DEVICES
- Publication number 20130193543
- Publication date Aug 1, 2013
- SILECS OY
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED THIN FILM DEPOSITION
- Publication number 20130183445
- Publication date Jul 18, 2013
- ASM INTERNATIONAL N.V.
- Antti Rahtu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...
- Publication number 20130058007
- Publication date Mar 7, 2013
- Hynix Semiconductor Inc.
- Jong-Bum Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HAFNIUM TANTALUM OXIDE DIELECTRICS
- Publication number 20130012031
- Publication date Jan 10, 2013
- Micron Technology, Inc.
- Kie Y. Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ZIRCONIUM-DOPED TANTALUM OXIDE FILMS
- Publication number 20130012034
- Publication date Jan 10, 2013
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES
- Publication number 20120205720
- Publication date Aug 16, 2012
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20120133428
- Publication date May 31, 2012
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC
- Publication number 20120094477
- Publication date Apr 19, 2012
- Leonard Forbes
- G11 - INFORMATION STORAGE
Information Patent Application
HAFNIUM TANTALUM TITANIUM OXIDE FILMS
- Publication number 20110298028
- Publication date Dec 8, 2011
- KIE Y. AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transistor Device and Methods of Manufacture Thereof
- Publication number 20110284970
- Publication date Nov 24, 2011
- INFINEON TECHNOLOGIES AG
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD TH...
- Publication number 20110227139
- Publication date Sep 22, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Tetsuya KAKEHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICES INCLUDING DIELECTRIC THIN FILM AND METHOD OF MANUFAC...
- Publication number 20110212612
- Publication date Sep 1, 2011
- ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Sung-Yool CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE COMPRISING CAPACITIVE ELEMENT
- Publication number 20100327409
- Publication date Dec 30, 2010
- Ippei Kume
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES
- Publication number 20100301428
- Publication date Dec 2, 2010
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ZIRCONIUM-DOPED TANTALUM OXIDE FILMS
- Publication number 20100301406
- Publication date Dec 2, 2010
- Kie Y. Ahn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOSFET HAVING A CHANNEL MECHANICALLY STRESSED BY AN EPITAXIALLY GRO...
- Publication number 20100283109
- Publication date Nov 11, 2010
- Taiwan Semiconductor Manufacturing Co., LTD
- Min CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TANTALUM ALUMINUM OXYNITRIDE HIGH-K DIELECTRIC
- Publication number 20100283537
- Publication date Nov 11, 2010
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...
- Publication number 20100255217
- Publication date Oct 7, 2010
- Hynix Semiconductor Inc.
- Jong-Bum Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...
- Publication number 20100239758
- Publication date Sep 23, 2010
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL HIGH-K DIELECTRIC MATERIALS AND PROCESSES FOR MANUFACTURING THEM
- Publication number 20100227450
- Publication date Sep 9, 2010
- Micron Technology, Inc.
- Jiong-Ping Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGE RESERVOIR STRUCTURE
- Publication number 20100187649
- Publication date Jul 29, 2010
- Frederic Allibert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC
- Publication number 20100041244
- Publication date Feb 18, 2010
- Micron Technology, Inc.
- Leonard Forbes
- G11 - INFORMATION STORAGE
Information Patent Application
HAFNIUM TANTALUM OXIDE DIELECTRICS
- Publication number 20100029054
- Publication date Feb 4, 2010
- KIE Y. AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HAFNIUM TANTALUM TITANIUM OXIDE FILMS
- Publication number 20100006918
- Publication date Jan 14, 2010
- KIE Y. AHN
- H01 - BASIC ELECTRIC ELEMENTS

Deposition of Tantalum oxides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Enhanced thin film deposition

Enhanced thin film deposition

Enhanced thin film deposition

Semiconductor device comprising capacitive element

Nonvolatile semiconductor memory device and manufacturing method th...

Enhanced thin film deposition

Enhanced thin film deposition

Post deposition plasma cleaning system and method

Semiconductor device comprising capacitive element

Charge reservoir structure

Dielectrics containing at least one of a refractory metal or a non-...

Zirconium-doped tantalum oxide films

Hafnium tantalum oxynitride dielectric

Hafnium tantalum titanium oxide films

Dielectrics containing at least one of a refractory metal or a non-...

Hafnium tantalum oxide dielectrics

Tantalum silicon oxynitride high-K dielectrics and metal gates

Hafnium tantalum oxynitride dielectric

Dielectric structures

Hafnium tantalum titanium oxide films

Stabilization of high-k dielectric materials

Zirconium-doped tantalum oxide films

Hafnium tantalum oxide dielectrics

Transistor device and methods of manufacture thereof

Method for forming a capacitor dielectric having tetragonal phase

Method for fabricating a high-K dielectric layer

Crystallographically orientated tantalum pentoxide and methods of m...

Tantalum silicon oxynitride high-K dielectrics and metal gates

Capacitor of a semiconductor device

Tantalum aluminum oxynitride high-K dielectric

Patents Applicationslast 30 patents

ENHANCED THIN FILM DEPOSITION

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

SEMICONDUCTOR OPTOELECTRONICS DEVICES

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC

HAFNIUM TANTALUM TITANIUM OXIDE FILMS

SEMICONDUCTOR OPTOELECTRONICS DEVICES

ENHANCED THIN FILM DEPOSITION

METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...

HAFNIUM TANTALUM OXIDE DIELECTRICS

ZIRCONIUM-DOPED TANTALUM OXIDE FILMS

TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC

HAFNIUM TANTALUM TITANIUM OXIDE FILMS

Transistor Device and Methods of Manufacture Thereof

NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD TH...

MEMORY DEVICES INCLUDING DIELECTRIC THIN FILM AND METHOD OF MANUFAC...

SEMICONDUCTOR DEVICE COMPRISING CAPACITIVE ELEMENT

TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES

ZIRCONIUM-DOPED TANTALUM OXIDE FILMS

MOSFET HAVING A CHANNEL MECHANICALLY STRESSED BY AN EPITAXIALLY GRO...

TANTALUM ALUMINUM OXYNITRIDE HIGH-K DIELECTRIC

METHOD FOR FORMING A CAPACITOR DIELECTRIC AND METHOD FOR MANUFACTUR...

SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...

NOVEL HIGH-K DIELECTRIC MATERIALS AND PROCESSES FOR MANUFACTURING THEM

CHARGE RESERVOIR STRUCTURE

HAFNIUM TANTALUM OXYNITRIDE DIELECTRIC

HAFNIUM TANTALUM OXIDE DIELECTRICS

HAFNIUM TANTALUM TITANIUM OXIDE FILMS