Dichlorosilane

Industry

CPC
Y10S148/027

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/027Dichlorosilane

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Patents Grantslast 30 patents

Information Patent Grant
Tungsten silicide (WSi.sub.x) deposition process for semiconductor...
- Patent number 5,231,056
- Issue date Jul 27, 1993
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substantially facet-free selective epitaxial growth process
- Patent number 5,168,089
- Issue date Dec 1, 1992
- AT&T Bell Laboratories
- Anatoly Feyenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of composite monosilicon/polysilicon layer using reduced-...
- Patent number 5,110,757
- Issue date May 5, 1992
- North American Philips Corp.
- Margareth C. Arst
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating self-aligned semiconductor devices
- Patent number 5,061,644
- Issue date Oct 29, 1991
- Honeywell Inc.
- Jerry Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide deposition method
- Patent number 4,810,673
- Issue date Mar 7, 1989
- Texas Instruments Incorporated
- Dean W. Freeman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 4,637,127
- Issue date Jan 20, 1987
- Nippon Electric Co., Ltd.
- Yukinori Kurogi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of dielectrically isolated microelectronic semiconducto...
- Patent number 4,462,847
- Issue date Jul 31, 1984
- Texas Instruments Incorporated
- Stephen W. Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous semiconductor method
- Patent number 4,459,163
- Issue date Jul 10, 1984
- Chronar Corporation
- Alan G. MacDiarmid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3853974
- Patent number 3,853,974
- Issue date Dec 10, 1974
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3824121
- Patent number 3,824,121
- Issue date Jul 16, 1974
- C30 - CRYSTAL GROWTH
Information Patent Grant
3745043
- Patent number 3,745,043
- Issue date Jul 10, 1973
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3661637
- Patent number 3,661,637
- Issue date May 9, 1972
- C30 - CRYSTAL GROWTH

Dichlorosilane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Tungsten silicide (WSi.sub.x) deposition process for semiconductor...

Substantially facet-free selective epitaxial growth process

Formation of composite monosilicon/polysilicon layer using reduced-...

Method for fabricating self-aligned semiconductor devices

Oxide deposition method

Method for manufacturing a semiconductor device

Fabrication of dielectrically isolated microelectronic semiconducto...

Amorphous semiconductor method

3853974

3824121

3745043

3661637

Patents Applicationslast 30 patents