for introducing the material into processing chamber

Industry

CPC
H01J37/32743

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32743for introducing the material into processing chamber

Industries

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Patents Grantslast 30 patents

Information Patent Grant
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Information Patent Grant
Substrate holding method and substrate processing apparatus
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- Tokyo Electron Limited
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Gas curtain for semiconductor manufacturing system
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- HANGZHOU CITY UNIVERSITY
- Qi Qiu
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Method of etching film and plasma processing apparatus
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- Tokyo Electron Limited
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Apparatus for treating a substrate
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Etching apparatus and methods of cleaning thereof
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Plasma processing apparatus
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Patents Applicationslast 30 patents

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CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
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PLASMA TREATMENT APPARATUS
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PLASMA PROCESSING APPARATUS
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ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
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IN-SITU FOCUS RING COATING
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Information Patent Application
Method and Apparatus for In-Situ Dry Development
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- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
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- Takeharu MOTOKAWA
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Information Patent Application
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- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
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- Publication number 20240079214
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- Yuji Mimura
- H01 - BASIC ELECTRIC ELEMENTS

for introducing the material into processing chamber

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple process semiconductor processing system

Sputter deposition

Substrate holding method and substrate processing apparatus

Gas curtain for semiconductor manufacturing system

Plasma reactor having array of coaxial multiple pins and processing...

Method of etching film and plasma processing apparatus

Apparatus for treating a substrate

Method for producing graphene

Systems and processes for producing fixed-nitrogen compounds

Ion beam chamber fluid delivery apparatus and method and ion beam e...

Integrated showerhead with improved hole pattern for delivering rad...

PECVD apparatus

Electrostatic chucking process

Apparatus and method for treating substrate

Substrate treating apparatus and substrate treating system having t...

Atomic layer etch and ion beam etch patterning

Etching apparatus and methods of cleaning thereof

Digital control of plasma processing

Plasma processing apparatus

Semiconductor processing chamber architecture for higher throughput...

Apparatus and method for manufacturing metal gate structures

Faceplate with localized flow control

Plasma processing apparatus and plasma processing method

Device for transporting substrate, treatment device with receiving...

Film-forming method, manufacturing method of electronic device, and...

Processing apparatus and method for forming semiconductor structure

Substrate processing apparatus

Methods for processing a semiconductor substrate

Substrate processing apparatus

Preparation method for bifacial perc solar cell

Patents Applicationslast 30 patents

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

INTEGRATED SHOWERHEAD WITH IMPROVED HOLE PATTERN FOR DELIVERING RAD...

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

PLASMA TREATMENT APPARATUS

PLASMA TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

DEVICE FOR TRANSPORTING A SUBSTRATE, TREATMENT DEVICE WITH A RECEIV...

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...

PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...

INTEGRATED LASER AND PLASMA ETCH DICING

SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS

IN-SITU FOCUS RING COATING

Plasma Etching with Metal Sputtering

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

System and Method for Plasma Processing

METHOD FOR PRODUCING GRAPHENE

EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AN...

PLASMA PROCESS SYSTEM FOR MULTI-STATION

CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Method and Apparatus for In-Situ Dry Development

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...

SURFACE MODIFYING METHOD AND SURFACE MODIFYING APPARATUS