for introducing the material into processing chamber

Industry

CPC
H01J37/32743

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32743for introducing the material into processing chamber

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple process semiconductor processing system
- Patent number 12,266,550
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter deposition
- Patent number 12,249,498
- Issue date Mar 11, 2025
- Dyson Technology Limited
- Michael Edward Rendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas curtain for semiconductor manufacturing system
- Patent number 12,243,750
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kent Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 12,217,973
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating a substrate
- Patent number 12,205,837
- Issue date Jan 21, 2025
- Semes Co., Ltd.
- Seong Hyun Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing graphene
- Patent number 12,194,566
- Issue date Jan 14, 2025
- ASUSTeK COMPUTER Inc.
- Yun-Wei Tsai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and processes for producing fixed-nitrogen compounds
- Patent number 12,186,728
- Issue date Jan 7, 2025
- Nitricity Inc.
- Joshua Michael McEnaney
- C05 - FERTILISERS MANUFACTURE THEREOF
Information Patent Grant
Ion beam chamber fluid delivery apparatus and method and ion beam e...
- Patent number 12,176,177
- Issue date Dec 24, 2024
- Techinsights Inc.
- Christopher Pawlowicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated showerhead with improved hole pattern for delivering rad...
- Patent number 12,116,669
- Issue date Oct 15, 2024
- Lam Research Corporation
- Rachel Batzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,087,560
- Issue date Sep 10, 2024
- Semes Co., Ltd.
- Dukhyun Son
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital control of plasma processing
- Patent number 12,068,134
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber architecture for higher throughput...
- Patent number 12,062,526
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Viren Kalsekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate with localized flow control
- Patent number 12,020,907
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Arun Thottappayil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,020,909
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Jang-Yeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for transporting substrate, treatment device with receiving...
- Patent number 12,009,186
- Issue date Jun 11, 2024
- MEYER BURGER (GERMANY) GMBH
- Hermann Schlemm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming method, manufacturing method of electronic device, and...
- Patent number 12,009,183
- Issue date Jun 11, 2024
- The Japan Steel Works, Ltd.
- Keisuke Washio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and method for forming semiconductor structure
- Patent number 12,002,663
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Rung Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,614
- Issue date May 7, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing a semiconductor substrate
- Patent number 11,972,935
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,961,714
- Issue date Apr 16, 2024
- Linco Technology Co., Ltd.
- Yi-Yuan Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM
- Publication number 20250166998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Lid.
- Kent LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
- Publication number 20250140536
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Changheon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SHOWERHEAD WITH IMPROVED HOLE PATTERN FOR DELIVERING RAD...
- Publication number 20250003074
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Rachel E. BATZER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404801
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
- Publication number 20240337012
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20240312801
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Shohei ARAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR TRANSPORTING A SUBSTRATE, TREATMENT DEVICE WITH A RECEIV...
- Publication number 20240290584
- Publication date Aug 29, 2024
- MEYER BURGER (GERMANY) GMBH
- Hermann SCHLEMM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...
- Publication number 20240290585
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Pradeep SAMPATH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...
- Publication number 20240274411
- Publication date Aug 15, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...
- Publication number 20240274407
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Peiqi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED LASER AND PLASMA ETCH DICING
- Publication number 20240266220
- Publication date Aug 8, 2024
- Jonathan Bryant MELLEN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240258082
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FOCUS RING COATING
- Publication number 20240249921
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching with Metal Sputtering
- Publication number 20240249927
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE
- Publication number 20240222097
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hsiang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Plasma Processing
- Publication number 20240213005
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING GRAPHENE
- Publication number 20240181568
- Publication date Jun 6, 2024
- ASUSTEK COMPUTER INC.
- Yun-Wei TSAI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AN...
- Publication number 20240178019
- Publication date May 30, 2024
- ASM IP HOLDING B.V.
- Mandar Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS SYSTEM FOR MULTI-STATION
- Publication number 20240162006
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS
- Publication number 20240150898
- Publication date May 9, 2024
- ASM IP HOLDING B.V.
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240120183
- Publication date Apr 11, 2024
- Tokyo Electron Limited
- Makoto WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for In-Situ Dry Development
- Publication number 20240096622
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...
- Publication number 20240096604
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Yukinori ABURATANI
- H01 - BASIC ELECTRIC ELEMENTS

for introducing the material into processing chamber

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus including shower head and edge ring...

Multiple process semiconductor processing system

Sputter deposition

Substrate holding method and substrate processing apparatus

Gas curtain for semiconductor manufacturing system

Plasma reactor having array of coaxial multiple pins and processing...

Method of etching film and plasma processing apparatus

Apparatus for treating a substrate

Method for producing graphene

Systems and processes for producing fixed-nitrogen compounds

Ion beam chamber fluid delivery apparatus and method and ion beam e...

Integrated showerhead with improved hole pattern for delivering rad...

PECVD apparatus

Electrostatic chucking process

Apparatus and method for treating substrate

Substrate treating apparatus and substrate treating system having t...

Atomic layer etch and ion beam etch patterning

Etching apparatus and methods of cleaning thereof

Digital control of plasma processing

Plasma processing apparatus

Semiconductor processing chamber architecture for higher throughput...

Apparatus and method for manufacturing metal gate structures

Faceplate with localized flow control

Plasma processing apparatus and plasma processing method

Device for transporting substrate, treatment device with receiving...

Film-forming method, manufacturing method of electronic device, and...

Processing apparatus and method for forming semiconductor structure

Substrate processing apparatus

Methods for processing a semiconductor substrate

Substrate processing apparatus

Patents Applicationslast 30 patents

GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

INTEGRATED SHOWERHEAD WITH IMPROVED HOLE PATTERN FOR DELIVERING RAD...

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

PLASMA TREATMENT APPARATUS

PLASMA TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

DEVICE FOR TRANSPORTING A SUBSTRATE, TREATMENT DEVICE WITH A RECEIV...

HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT C...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...

PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...

INTEGRATED LASER AND PLASMA ETCH DICING

SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS

IN-SITU FOCUS RING COATING

Plasma Etching with Metal Sputtering

METHODS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

System and Method for Plasma Processing

METHOD FOR PRODUCING GRAPHENE

EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AN...

PLASMA PROCESS SYSTEM FOR MULTI-STATION

CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Method and Apparatus for In-Situ Dry Development

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...