The present disclosure generally relates to fabricating semiconductor devices, and more particularly, to equipment front-end modules for semiconductor processing systems employed to fabricate semiconductor devices.
Semiconductor processing systems commonly employ process modules to perform various processes during the fabrication of semiconductor devices including patterning, etching, material layer deposition, polishing or planarization, and metrology. Processing generally entails loading a substrate into the process module, performing a desired processing operation on the substrate, and thereafter transferring the substrate to another process module to perform another operation on the substrate. Loading the substrate into the process module typically entails positioning a pod carrying the substrate on a load port coupled to the process, removing the substrate from the pod, and transferring the substrate into the process module for processing. Once processing is complete the substrate is typically unloaded from the process module, returned to transfer pod, and carried within the pod to other semiconductor processing systems for further processing using, as appropriate according for the semiconductor device being fabricated.
In some semiconductor processing systems an equipment front-end module (EFEM) is employed to transfer substrates between the process module and the pod. The EFEM generally and interfaces pods carrying substrates with one or more process modules coupled to the EFEM using a substrate transfer robot housed within the EFEM, which transfers substrates between the pod carrying the substrates and the process module employed to process the substrates. The EFEM is typically spaced apart from the process module employed to process the substrates such that suitable service space is provided about the process module while limiting the floor space (e.g., footprint) occupied by the semiconductor processing system. The provision of service space about the process module allows maintainers to access the process module when servicing is required, such as to replace consumables and/or replace components in the unlikely event that a component fails. Limiting the floor space occupied by the semiconductor processing system generally limits cost of ownership of the semiconductor processing system, for example, by limiting cleanroom space required by the semiconductor processing system.
One challenge to providing service space about process modules while limiting floor space occupied by a semiconductor processing systems is that different process modules require different EFEM-process module spacing to ensure sufficient process space exists about the process module. For example, process modules that process singular substrates generally have smaller footprints than process modules employed to process two or more substrates at time. As a consequence, EFEMs are typically customized according to the footprint of the process module coupled to the EFEM to ensure that sufficient service space exists about the process module while limiting total floor space occupied by the semiconductor processing system. While customization is generally satisfactory insofar as ensuring access space exists and limiting total floor space occupied by the semiconductor processing system, customization can increase cost of EFEM manufacture and support of the EFEM once commissioned for service by the EFEM owner.
Such systems and methods have generally been satisfactory for their intended purposes. However, there remains a need for improved EFEM, semiconductor processing systems, and methods of making semiconductor processing systems. The present disclosure provides a solution to this need.
An equipment front-end module (EFEM) includes a with a load port seat and a transfer robot seat. A fan filter unit is supported by the frame assembly and a controls box encloses the fan filter unit and is supported by the fan filter unit. The rear panel has a tunnel seat, is fixed to the frame assembly, and is separated from the load port seat by the transfer robot seat. One of (a) a plate body with an inboard passthrough and (b) a tunnel body with an outboard passthrough fixed at the tunnel seat and coupled to the frame assembly by the rear panel to space a process chamber with a quad chamber arrangement from the frame assembly differently along a transfer extending through the tunnel seat than a process module having a single or a dual chamber arrangement using a singular EFEM arrangement.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include an inboard floor joist arranged along the transfer axis and an outboard floor joist axially spaced apart from the inboard floor joist along the transfer axis. The inboard floor joist and the outboard floor joist may define the transfer robot seat and a front-end substrate transfer robot fixed to the transfer robot seat.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include a first inboard post laterally offset from the transfer axis and a second inboard post separated from the first inboard post by the transfer axis. The first inboard post and the second inboard post may define the load port seat a load port may be fixed to the load port seat.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the frame assembly comprises includes a first outboard post laterally offset from the transfer axis and a second outboard post separated from the first outboard post by the transfer axis. The first outboard post and the second outboard post may support the rear panel.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the plate body is fixed at the tunnel seat and coupled to the frame assembly by the rear panel. The transfer axis may extend through the inboard passthrough defined by the plate body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include a load lock module with a first front-end gate valve and a second front-end gate valve arranged along the transfer axis and abutting the plate body. The first front-end gate valve and the second front-end gate valve may be registered to the inboard passthrough.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the tunnel body is fixed at the tunnel seat and coupled to the frame assembly by the rear panel. The transfer axis may extend through the outboard passthrough defined by the tunnel body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include a load lock module with a first front-end gate valve and a second front-end gate valve arranged along the transfer axis and abutting the plate body. The first front-end gate valve and the second front-end gate valve may be registered to the outboard passthrough defined by the tunnel body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the plate body includes a plate body fastener pattern extending about the inboard passthrough, a plate body flange portion orthogonal relative to the plate body and a first plate body registration tab laterally offset from the transfer axis and between the plate body flange portion and the plate body fastener pattern. A second plate body registration tab may be separated from the first plate body registration tab by the transfer axis, the second plate body registration tab between the plate body flange portion and the plate body fastener pattern.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the tunnel body has a flange portion axially offset from a facia portion defining the outboard passthrough, a ceiling portion extending axially along the transfer axis and coupling the flange portion to the facia portion of the tunnel body, and a floor portion extending axially along the transfer axis and coupling the flange portion to the facia portion. The floor portion of the tunnel body may be separated from the ceiling portion of the tunnel body by the transfer axis.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the ceiling portion of the tunnel body is oblique relative to the transfer axis, that the floor portion is oblique relative to the transfer axis, and that the floor portion of the tunnel body slopes toward the flange portion at a greater angle than the ceiling portion of the tunnel body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the flange portion incudes comprises an upper fastener plate parallel to the facia portion and extending upwards from the ceiling portion of the tunnel body, a lower fastener plate orthogonal to the upper fastener plate and extending axially from the floor portion of the tunnel body, a first tunnel body registration tab laterally offset from the transfer axis and separating the upper fastener plate from the lower fastener plate; and a second tunnel body registration tab separated from the first tunnel body registration tab by the transfer axis. The second tunnel body registration tab may separate the upper fastener plate from the lower fastener plate.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the floor portion of the tunnel body intersects the rear panel below a transfer space defined within the EFEM to return purge circulated through the tunnel body below substrates being transferred to and from the outboard passthrough defined by the tunnel body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include a perforated plate supported within the EFEM between the fan filter unit and the transfer robot seat to distribute a purge fluid within a transfer space within the frame assembly.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the tunnel body has a perforated plate extension fixed within the tunnel body. The perforated plate extension may be parallel to the transfer axis. The perforated plate extension may abut the perforated plate supported in the EFEM.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the plate body abuts the perforated plate supported within the equipment front-end module in the tunnel seat.
In addition to one or more of the features described above, or as an alternative, further examples may include that the frame assembly of the EFEM has a symmetric arrangement.
In addition to one or more of the features described above, or as an alternative, further examples may include the frame assembly of the EFEM has an asymmetric arrangement.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include that the fan filter unit may have one and only one fan supported within a fan support body.
In addition to one or more of the features described above, or as an alternative, further examples of the EFEM may include four (4) fans distributed in two pairs on laterally opposite sides of the transfer axis.
A semiconductor processing system includes an EFEM as described above and further including a perforated plate supported within the EFEM between the fan filter unit and the transfer robot seat to distribute a purge fluid within the EFEM. A load lock module is axially spaced apart from the EFEM equipment front-end module along the transfer axis and one of (a) a process module having a dual chamber arrangement and (b) a process module having a quad chamber arrangement coupled the load lock and therethrough to the equipment front-end module.
In addition to one or more of the features described above, or as an alternative, further examples of the semiconductor processing system may include that the plate body is fixed at the tunnel seat and supported therethrough by the rear panel. The plate body may abut the perforated plate in the tunnel seat, and the process module may be coupled to the load lock module and therethrough to the EFEM.
In addition to one or more of the features described above, or as an alternative, further examples of the semiconductor processing system may include that the tunnel body is fixed at the tunnel seat and supported therethrough by the rear panel. The tunnel body may include a perforated plate extension fixed therein and abutting the perforated plate within the tunnel seat. The process module having the quad chamber arrangement may be coupled to the load lock module and therethrough to the EFEM.
A method of making a semiconductor processing system includes, at an EFEM as described above, removing a plate body with an inboard passthrough from the tunnel seat, fixing a tunnel body with an outboard passthrough at the tunnel seat and therethrough to the frame assembly by the rear panel, and coupling a load lock module to the outboard passthrough defined by the tunnel body. A substrate transfer module may be couple to the load lock module and a process module having a quad chamber arrangement coupled to the substrate transfer module and therethrough to the equipment front-end module through the load lock module. The process module with the quad chamber arrangement is spaced differently from the frame assembly along the transfer than a process module having a single or a dual chamber arrangement using a singular equipment front-end module arrangement.
This summary is provided to introduce a selection of concepts in a simplified form. These concepts are described in further detail in the detailed description of example embodiments of the disclosure below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.
These and other features, aspects, and advantages of the present disclosure are described below with reference to the drawings of certain examples, which are intended to illustrate and not to limit the present disclosure.
It will be appreciated that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help improve understanding of illustrated embodiments of the present disclosure.
Reference will now be made to the drawings wherein like reference numerals identify similar structural features or aspects of the subject disclosure. For purposes of explanation and illustration, and not limitation, a partial view of an example of a semiconductor processing system with an equipment front-end module (EFEM) in accordance with the present disclosure is shown in
Although certain embodiments and examples are disclosed below, it will be understood by those in the art that the invention extends beyond the specifically disclosed embodiments and/or uses of the invention and obvious modifications and equivalents thereof. Thus, it is intended that the scope of the invention disclosed should not be limited by the particular disclosed embodiments described below.
As used herein, the term “substrate” may refer to any underlying material or materials, including any underlying material or materials that may be modified, or upon which, a device, a circuit, or a film may be formed. The “substrate” may be continuous or non-continuous; rigid or flexible; solid or porous; and combinations thereof. The substrate may be in any form, such as a powder, a plate, or a workpiece. Substrates in the form of a plate may include wafers in various shapes and sizes, such as 200-millimeter or 300-millimeter silicon wafers. Substrates may be made from semiconductor materials, including, for example, silicon, silicon germanium, silicon oxide, gallium arsenide, gallium nitride and silicon carbide.
Referring to
The back-end transfer module 106 includes a back-end transfer chamber 116 and a back-end substrate transfer robot 118. The back-end transfer chamber 116 is arranged along a transfer axis 120 and has a first process module facet 122, a second process module facet 124, and a load lock facet 126. The first process module facet 122 is angled (e.g., oblique) relative to the transfer axis 120 and is connected to the process module gate valve 114. The second process module facet 124 is also angled (e.g., oblique) relative the transfer axis 120, may further be angled (or oblique) relative to the first process module facet 122, and is configured to seat thereon a second gate valve 128 to couple a second process module 130 to the back-end transfer module 106. The load lock facet 126 is substantially orthogonal relative to the transfer axis 120, couples the first process module facet 122 to the second process module facet 124, and is coupled to the load lock module 104 for transfer of the substrate between the back-end transfer module 106 and the load lock module 104. In certain examples the back-end transfer chamber 116 may have pentagonal shape, such a regular or an irregular pentagonal shape. It is also contemplated that the back-end transfer chamber 116 may have a different number of facts than shown in the illustrated example, for example have fewer than five (5) facets or more than five (5) facets, and remain within the scope of the present disclosure. It is contemplated that the back-end substrate transfer robot 118 be supported within the back-end transfer chamber 116 for movement relative to the back-end transfer chamber 116 to transfer the substrate 2 between the load lock module 104 and the process module 108. In the illustrated example the back-end substrate transfer robot 118 has a single end effector configured to carry a single substrate between the load lock module 104 and the process module 108. As will be appreciated by those of skill in the art in view of the present disclosure, the back-end substrate transfer robot 118 may have more than one end effector and remain within the scope of the present disclosure.
The load lock module 104 includes a load lock chamber 132, a transfer stage 134, a back-end gate valve 136, and a front-end gate valve 138. The transfer stage 134 is arranged within the load lock chamber 132 and is configured to support the substrate 2 during transfer between the back-end transfer module 106 and the EFEM 102. The back-end gate valve 136 couples the load lock chamber 132 to the back-end transfer chamber 116 and is configured to provide selective communication between the load lock module 104 and the back-end transfer module 106 for transfer of the substrate 2 between the load lock module 104 and the back-end transfer module 106. The front-end gate valve 138 couples the load lock chamber 132 to the EFEM 102 and is configured to provide selective communication between the load lock module 104 and the EFEM 102 for transfer of the substrate 2 between the load lock module 104 and the EFEM 102. In the illustrated example the load lock module 104 has a singular (i.e., one and only one) transfer stage. As will be appreciated by those of skill in the art in view of the present disclosure the load lock module 104 may have more than one transfer stage and remain within the scope of the present disclosure.
The EFEM 102 is connected to load lock module 104 and includes a frame assembly 140 (shown in
With reference to
It is contemplated that the rear panel 150 be fixed to the frame assembly 140 along the transfer axis 120 at a location separated from the load port seat 160 by the transfer robot seat 156, that the rear panel 150 define the tunnel seat 154, and that one of (a) the plate body 152 (shown in
The frame assembly 140 includes an inboard floor joist 178, an outboard floor joist 180, an inboard ceiling joist 182, and an outboard ceiling joist 184. The frame assembly 140 also includes a first inboard post 186, a second inboard post 188, a first outboard post 190, and a second outboard post 192. The inboard floor joist 178 and the outboard floor joist 180 are arranged along the transfer axis 120, laterally span the frame assembly 140, and define the transfer robot seat 156. The outboard floor joist 180 is axially spaced apart from the inboard floor joist 178 along the transfer axis 120, and the inboard floor joist 178 axially separates the load port seat 160 from the outboard floor joist 180. The inboard ceiling joist 182 and the outboard ceiling joist 184 are similar to the inboard floor joist 178 and the outboard floor joist 180, respectively, are additionally supported above the front-end substrate transfer robot 148 (shown in
The first inboard post 186 is laterally offset from transfer axis 120, extends upwards from the inboard floor joist 178, and couples the inboard ceiling joist 182 to the inboard floor joist 178. The second inboard post 188 is laterally offset from transfer axis 120, extends upwards from the inboard floor joist 178 to couple the inboard ceiling joist 182 of the inboard floor joist 178, and is additionally arranged on a side of the transfer axis 120 laterally opposite the first inboard post 186. It is contemplated that at least one of the first inboard post 186 and the second inboard post 188 define the load port seat 160, that the load port 146 be fixed at the load port seat 160 and therethrough to the first inboard post 186 and the second inboard post 188, and that the spacing between the first inboard post 186 and the second inboard post 188 enable the pod 8 (shown in
The first outboard post 190 is similar to the first inboard post 186, is additionally axially offset from the first inboard post 186, and is laterally offset from the transfer axis 120. The first outboard post 190 is further separated from the first inboard post 186 by the front-end substrate transfer robot 148 and couples the outboard ceiling joist 184 to the outboard floor joist 180. The second outboard post 192 is similar to the second inboard post 188, is axially offset from the second inboard post 188 along the transfer axis 120 and is arranged on a side of the transfer axis 120 laterally offset from the first outboard post 190, and also couples the outboard ceiling joist 184 to the outboard floor joist 180. It is contemplated that the first outboard post 190 and the second outboard post 192 define a rear panel fastener pattern, and that the rear panel 150 be fixed at the rear panel fastener pattern such that the transfer axis 120 extends through the tunnel seat 154 (shown in
With reference to
With reference to
The chemical filter seat 109 is arranged between the purge fluid intake 107 and the mesh body 105 and is configured to seat a chemical filter 12. The mesh body 105 is supported within the fan support body 101 between the chemical filter seat 109 and the fan 103 and is configured to separate a user servicing (positioning and/or replacing) the chemical filter 12 seated on the chemical filter seat 109 from the fan 103, limiting (or eliminating) the need to cease operation of the fan 103 during service of the chemical filter 12 seated on the chemical filter seat 109. The fan 103 is in turn configured to draw the purge fluid 10 received at the purge fluid intake 107 through the chemical filter 12 supported at the chemical filter seat 109 and is this respect is supported for rotation within the fan support body 101 between the mesh body 105 and the particulate filter seat 111. In certain examples, the fan 103 may include a single fan, the single fan overlaying the transfer axis 120 in such examples and limiting cost of the EFEM 102 (shown in
The particulate filter seat 111 is configured to seat a particulate filter 14 to remove particulate from the purge fluid 10 driven by the fan 103 prior to entry to the substrate transfer volume 164. In this respect the particulate filter seat 111 is arranged within the frame assembly 140 at a location between the fan 103 and the front-end substrate transfer robot 148. More specifically, the particulate filter seat 111 is arranged between the fan 103 and the perforated plate 198, is spaced apart from the perforated plate 198 by the supply plenum 194, and fluidly couples the fan 103 to the supply plenum 194 such that the perforated plate 198 may uniformly provide the purge fluid 10 laterally and axially to the substrate transfer volume 164 defined within the frame assembly 140. It is contemplated that the particulate filter seat 111 be configured to seat thereon one or more particulate filters, e.g., one or more ultra-low penetration air (ULPA) particulate filter, to impound particulate entrained within the purge fluid 10 driven by the fan 103, such as one or more ULPA filters having a standard (i.e., not customized) size. It is also contemplated that the perforated plate 198 may have a uniform distribution of perforations to provide the purge fluid 10 to the substrate transfer volume 164 in a generally laminar flow pattern.
Referring now to
In certain examples, the plate body flange portion 121, the first plate body registration tab 123, and the second plate body registration tab 125 may cooperate to enable installation of the plate body 152 with a single installer using a place and pivot technique. For example, the orthogonal orientation of the plate body flange portion 121 allows installer seat the plate body 152 in the tunnel seat 154 (shown in
In certain examples, a portion of an outboard edge of the perforated plate 198 may abut the plate body 152 within the tunnel seat 154 once the plate body 152 is seated in the tunnel seat 154. The perforated plate 198 edge may abut the plate body 152 at a location above the inboard passthrough 168, the perforated plate 198 providing a laminar flow of the purge fluid 10 (shown in
It is contemplated that, when the plate body 152 is fixed to the tunnel seat 154 (shown in
With continuing reference to
With reference to
The perforated plate extension 141 is fixed within the tunnel body 166 between the ceiling portion 129 and the floor portion 131 of the tunnel body 166. The perforated plate extension 141 further couples the first sidewall portion 133 of the tunnel body 166 to the second sidewall portion 135 of the tunnel body 166, and extends axially between the facia portion 139 and the flange portion 137 of the tunnel body 166. The perforated plate extension 141 may also be parallel to the transfer axis 20 when the tunnel body 166 is fixed to the tunnel seat 154 (shown in
The first sidewall portion 133 of the tunnel body 166 extends between the ceiling portion 129 and the floor portion 131 of the tunnel body 166. The first sidewall portion 133 further extends between the flange portion 137 of the tunnel body 166 and the facia portion 139 of the tunnel body 166. In certain examples the first sidewall portion 133 may be substantially parallel to the transfer axis 120. In accordance with certain examples, the first sidewall portion 133 may be angled (e.g., oblique) relative the transfer axis 120. The second sidewall portion 135 of the tunnel body 166 is similar to the first sidewall portion 133 of the tunnel body 166 and is additionally separated from the first sidewall portion 133 by the transfer axis 120. It is contemplated that the second sidewall portion 135 be spaced apart from the first sidewall portion 133 by the facia portion 139 of the tunnel body 166. In this respect it is contemplated that the outboard passthrough 174 be defined by the facia portion 139 of the tunnel body 166, the facia portion 139 extending about the outboard passthrough 174. In further respect, the facia portion 139 of the tunnel body 166 (and thereby the outboard passthrough 174) may be axially spaced from the flange portion 137 by the first sidewall portion 133 and the second sidewall portion 135 of the tunnel body 166 such that the outboard passthrough 174 is axially offset (and thereby outboard) of the rear panel 150.
The flange portion 137 of the tunnel body 166 is configured to fix the tunnel body 166 to the tunnel seat 154 and in this respect includes an upper fastener plate 143, a lower fastener plate 145, a first sidewall fastener plate 147, and a second sidewall fastener plate 149. The flange portion 137 also includes a first tunnel body registration tab 151 and a second tunnel body registration tab 153. The upper fastener plate 143 extends from the ceiling portion 129 in a direction opposite the floor portion 131 of the tunnel body 166, laterally spans the ceiling portion 129 of the tunnel body 166, and defines an upper fastener pattern conforming (in part) to the fastener pattern defined by the tunnel seat 154. The lower fastener plate 145 extends from the floor portion 131 of the tunnel body 166 in a direction opposite the facia portion 139, laterally spans the floor portion 131 of the tunnel body 166, and defines a lower fastener pattern also conforming (in part) to the fastener pattern defined by the tunnel seat 154.
The first sidewall fastener plate 147 extends from the upper fastener plate 143 along the first sidewall portion 133 of the tunnel body 166 and is spaced apart from the lower fastener plate 145 by the first tunnel body registration tab 151. The first sidewall fastener plate 147 further defines a first sidewall fastener pattern that conforms (in part) to the fastener pattern defined by the tunnel seat 154. The second sidewall fastener plate 149 is similar to the first sidewall fastener plate 147, additionally extends from the upper fastener plate 143 along the second sidewall portion 135 of the tunnel body 166, and is further spaced apart from the lower fastener plate 145 by the second tunnel body registration tab 153. It is contemplated that the second sidewall fastener plate 149 define a second sidewall fastener pattern further conforming (in part) to the fastener pattern defined on the tunnel seat 154 for fixation of the tunnel body 166 to the rear panel 150 at the tunnel seat 154.
The first tunnel body registration tab 151 and the second tunnel body registration tab 153 are configured to register the tunnel body 166 to tunnel seat 154 to facilitate fixation of the tunnel body 166 to the rear panel 150 at the tunnel seat 154. In this respect the first tunnel body registration tab 151 extends between the first sidewall fastener plate 147 and the lower fastener plate 145, the second tunnel body registration tab 153 extends between the second sidewall fastener plate 149 and the lower fastener plate 145, and the second tunnel body registration tab 153 is laterally spaced from the first tunnel body registration tab 151 by a distance slightly greater than a lateral width of the tunnel seat 154. It is contemplated that the first tunnel body registration tab 151 and/or the second tunnel body registration tab 153 be relatively pliable, the first tunnel body registration tab 151 and/or the second tunnel body registration tab 153 flexing upon insertion into the tunnel seat 154 such that the tunnel body 166 is fixed therein at a location wherein fastener patterns defined with the flange portion 137 are registered to the fastener pattern defined in the tunnel seat 154, allowing the tunnel body 166 to be seated using the aforementioned position and pivot single installer method. It is also contemplated that either (or both) the first tunnel body registration tab 151 and the second tunnel body registration tab 153 may be notched to register the tunnel body 166 at the tunnel seat 154 defined by the rear panel 150. As will be appreciated by those of skill in the art in view of the present disclosure, registering and fixing the tunnel body 166 at the tunnel seat 154 using the first tunnel body registration tab 151 and the second tunnel body registration tab 153 allows for installation of the tunnel body 166 in a cantilevered arrangement by a single installer, simplifying fixation of the tunnel body 166 at the tunnel seat 154.
When fixed at the tunnel seat 154 the perforated plate extension 141 of the tunnel body 166 abuts the perforated plate 198. More specifically, the perforated plate extension 141 abuts the perforated plate 198 within the outboard passthrough 174 such that the ceiling portion 129 of the tunnel body 166 and the perforated plate extension 141 define a supply plenum extension 163 within the tunnel body 166. It is contemplated the ceiling portion 129 of the tunnel body 166 slope downwards form the upper fastener plate 143 and toward the facia portion 139 of the tunnel body 166 between the tunnel seat 154 and the outboard passthrough 174 relative to the transfer axis 120, the ceiling portion 129 and the perforated plate extension 141 cooperating to distribute and direct the purge fluid 10 entering the supply plenum extension 163 toward the floor portion 131 of the tunnel body 166 with a laminar flow pattern. It is also contemplated that the floor portion 131 slope downwards between the facia portion 139 of the tunnel body and the tunnel seat 154 to return the purge fluid 10 to the enclosure 158. In certain examples, the floor portion 131 of the tunnel body 166 intersecting the tunnel seat 154 at a location below the transfer paths between the front-end gate valve 138 and the load port 146. As will be appreciated by those of skill in the art in view of the present disclosure, intersection of the floor portion 131 with the tunnel seat 154 below substrates carried by the front-end substrate transfer robot 148 can limit contamination of substrates carried by the front-end substrate transfer robot 148 by the portion of the purge fluid 10 shunted through the tunnel body 166 by the ceiling portion 129 of the tunnel body 166, the floor portion 131 of the tunnel body 166, and the perforated plate extension 141.
With reference to
With reference to
With reference to
The process chamber gate valve pair 206 couples the process module 202 to the back-end transfer module 212 and provides selective communication between the first process chamber 216 and the second process chamber 218, and the back-end substrate transfer robot 214. The back-end substrate transfer robot 214 is supported within a transfer chamber 220, includes an end effector pair 222, and is configured to transfer substrate pairs between the load lock module 104 and the process module 202 through the first process module gate valve 208 and the second process module gate valve 210. It is contemplated that the plate body 152 be fixed at the tunnel seat 154 and supported by the rear panel 150, and therethrough the frame assembly 140 (shown in
With reference to
The process chamber gate valve pair 306 couples the process module 302 to the back-end transfer module 312 and provides selective communication between the process chambers 316-322, and the back-end substrate transfer robot 314. The back-end substrate transfer robot 314 is supported within a transfer chamber 324, includes an end effector pair 326, and is configured to transfer substrate pairs between the load lock module 104 and the process module 302 through the first process module gate valve 308 and the second process module gate valve 310. It is contemplated that the tunnel body 166 be fixed at the tunnel seat 154 and supported by the rear panel 150, and therethrough the frame assembly 140 (shown in
With reference to
Removing 410 the plate body from the tunnel seat may include removing fasteners fixing the plate body from the tunnel. Removing 410 the plate body from the tunnel seat may include removing the tunnel seat from a new-build EFEM, for example, when the plate body is employed as a shipping fixture in new-build EFEM for a semiconductor processing system having one or more process module with a quad chamber arrangement. Removing 410 the plate body from the tunnel seat may include removing the plate body from redeployed semiconductor processing system, such as when the EFEM is redeployed from a semiconductor processing system having a single chamber arrangement or a dual chamber arrangement to a semiconductor processing system having a quad chamber arrangement.
Fixing 420 the tunnel body to the tunnel seat may include registering the tunnel body at the tunnel seat using a first tunnel body registration tab and a second tunnel body registration tab, e.g., the first tunnel body registration tab 151 (shown in
Coupling 430 the load lock module to the tunnel body may include registering one or more gate valve, e.g., the first front-end gate valve 226 (shown in
Coupling 450 the process module to the back-end transfer module may include coupling more than one process module to the back-end transfer module. For example, the process module may be one of two, three, four or even more than four process modules coupled to the back-end transfer module and therethrough to the frame assembly through the outboard passthrough. Coupling 450 the process module to the back-end transfer chamber may include spacing the process module by a different distance than that of spacing associated with a process chamber having a single chamber arrangement or a dual chamber arrangement, as shown with box 452. For example, the back-end transfer chamber may be spaced further from the frame assembly by a distance corresponding to an axial depth of the perforated plate extension fixed within the tunnel body, as also shown with box 452.
The illustrations presented herein are not meant to be actual views of any particular material, structure, or device, but are merely idealized representations that are used to describe embodiments of the disclosure. The particular implementations shown and described are illustrative of the invention and its best mode and are not intended to otherwise limit the scope of the aspects and implementations in any way. Indeed, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the system may not be described in detail. Furthermore, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and/or physical couplings between the various elements. Many alternative or additional functional relationship or physical connections may be present in the practical system, and/or may be absent in some embodiments.
It is to be understood that the configurations and/or approaches described herein are exemplary in nature, and that these specific embodiments or examples are not to be considered in a limiting sense, because numerous variations are possible. The specific routines or methods described herein may represent one or more of any number of processing strategies. Thus, the various acts illustrated may be performed in the sequence illustrated, in other sequences, or omitted in some cases.
The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems, and configurations, and other features, functions, acts, and/or properties disclosed herein, as well as any and all equivalents thereof.
This application claims the benefit of U.S. Provisional Application 63/385,512 filed on Nov. 30, 2022, the entire contents of which are incorporated herein by reference.
Number | Date | Country | |
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63385512 | Nov 2022 | US |