involving a beam of energy

Industry

CPC
H05G2/008

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Parent Industries

HELECTRICITY H05Electric techniques H05GX-RAY TECHNIQUE H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes

Current Industry

H05G2/008involving a beam of energy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for aligning master oscillator power amplifier...
- Patent number 11,973,302
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Lin Louis Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV light source with a separation device
- Patent number 11,968,767
- Issue date Apr 23, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Oliver Schlosser
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target material control in an EUV light source
- Patent number 11,963,285
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Abhiram Lakshmi Ganesh Govindaraju
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source apparatus and method for using the same
- Patent number 11,948,702
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chung Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guiding device
- Patent number 11,947,264
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Patrick Willem Paul Limpens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modular laser-produced plasma x-ray system
- Patent number 11,930,581
- Issue date Mar 12, 2024
- Brown University
- Daniel John DeCiccio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for pumping laser sustained plasma with an illumi...
- Patent number 11,921,297
- Issue date Mar 5, 2024
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 11,924,954
- Issue date Mar 5, 2024
- Gigaphoton Inc.
- Takayuki Yabu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 11,924,955
- Issue date Mar 5, 2024
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Metrology system and method for measuring an excitation laser beam...
- Patent number 11,920,977
- Issue date Mar 5, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron diffraction intensity from single crystal silicon in a pho...
- Patent number 11,915,837
- Issue date Feb 27, 2024
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,906,902
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tai-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Self-aligning vacuum feed-through for liquid nitrogen
- Patent number 11,879,683
- Issue date Jan 23, 2024
- KLA Corporation
- Sherman Seelinger
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Particle based X-ray source
- Patent number 11,882,642
- Issue date Jan 23, 2024
- Innovicum Technology AB
- Rolf Behling
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for and method of reducing contamination from source mate...
- Patent number 11,874,608
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Yue Ma
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target control in extreme ultraviolet lithography systems using abe...
- Patent number 11,860,544
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- G02 - OPTICS
Information Patent Grant
Target delivery system
- Patent number 11,856,681
- Issue date Dec 26, 2023
- ASML Netherlands B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target debris collection device and extreme ultraviolet light sourc...
- Patent number 11,852,984
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Sunghyup Kim
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for vacuum ultraviolet lamp assisted ignition of...
- Patent number 11,844,172
- Issue date Dec 12, 2023
- KLA Corporation
- John Szilagyi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Device and method to remove debris from an extreme ultraviolet (EUV...
- Patent number 11,841,625
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Han Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focusing device and EUV radiation generating device having same
- Patent number 11,835,699
- Issue date Dec 5, 2023
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Martin Lambert
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source for lithography process
- Patent number 11,829,082
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Ying Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source and extreme ultraviolet light source system using the...
- Patent number 11,828,952
- Issue date Nov 28, 2023
- Samsung Electronics Co., Ltd.
- Dohyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,832,372
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser sustained plasma and endoscopy light source
- Patent number 11,825,588
- Issue date Nov 21, 2023
- Excelitas Technologies Singapore Pte. Ltd.
- Rudi Blondia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Guiding device and associated system
- Patent number 11,822,252
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Foil trap and light source apparatus including the same
- Patent number 11,822,258
- Issue date Nov 21, 2023
- Ushio Denki Kabushiki Kaisha
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device for EUV light source
- Patent number 11,817,230
- Issue date Nov 14, 2023
- ESOL Inc.
- Dong Gun Lee
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Nanopatterned electron beams for temporal coherence and determinist...
- Patent number 11,798,706
- Issue date Oct 24, 2023
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Shock wave visualization for extreme ultraviolet plasma optimization
- Patent number 11,800,626
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240142878
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tai-Yu CHEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR VACUUM ULTRAVIOLET LAMP ASSISTED IGNITION OF...
- Publication number 20240138048
- Publication date Apr 25, 2024
- KLA Corporation
- John Szilagyi
- C01 - INORGANIC CHEMISTRY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20240126185
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Yoshifumi UENO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH BRIGHTNESS LPP EUV LIGHT SOURCE WITH FAST ROTATING TARGET AND...
- Publication number 20240121878
- Publication date Apr 11, 2024
- ISTEQ GROUP HOLDING B.V.
- Aleksandr Yurievich VINOKHODOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
- Publication number 20240121877
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Injae LEE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...
- Publication number 20240103387
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SUSTAINED PLASMA AND ENDOSCOPY LIGHT SOURCE
- Publication number 20240098867
- Publication date Mar 21, 2024
- EXCELITAS TECHNOLOGIES SINGAPORE PTE. LTD.
- Rudi Blondia
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABE...
- Publication number 20240085797
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Ya CHENG
- G02 - OPTICS
Information Patent Application
TARGET DELIVERY SYSTEM
- Publication number 20240090109
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Confocal Chromatic Metrology for EUV Source Condition Monitoring
- Publication number 20240090110
- Publication date Mar 14, 2024
- KLA Corporation
- Patrick Tae
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITION DETECTION APPARATUS, POSITION DETECTION METHOD AND NON-TRA...
- Publication number 20240074022
- Publication date Feb 29, 2024
- Lasertec Corporation
- Tsunehito KOHYAMA
- G01 - MEASURING TESTING
Information Patent Application
EUV EXCITATION LIGHT SOURCE AND EUV LIGHT SOURCE
- Publication number 20240074023
- Publication date Feb 29, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Stefan Piehler
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT SOURCE WITH A SEPARATION DEVICE
- Publication number 20240057243
- Publication date Feb 15, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Oliver Schlosser
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20240049378
- Publication date Feb 8, 2024
- Gigaphoton Inc.
- Masaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240027920
- Publication date Jan 25, 2024
- Gigaphoton Inc.
- Yusuke HOSHINO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240023223
- Publication date Jan 18, 2024
- Gigaphoton Inc.
- Yuichi NISHIMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FOIL TRAP COVER DEVICE AND DEBRIS REDUCTION APPARATUS
- Publication number 20230418171
- Publication date Dec 28, 2023
- Ushio Denki Kabushiki Kaisha
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20230413411
- Publication date Dec 21, 2023
- Gigaphoton Inc.
- Shogo KITASAKA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL
- Publication number 20230403778
- Publication date Dec 14, 2023
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LIGHT SOURCE APPARATUS
- Publication number 20230400786
- Publication date Dec 14, 2023
- Ushio Denki Kabushiki Kaisha
- Yusuke Teramoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20230387644
- Publication date Nov 30, 2023
- Gigaphoton Inc.
- Takashi SUGANUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY
- Publication number 20230389168
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION
- Publication number 20230380044
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Shuo SU
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND METHOD TO REMOVE DEBRIS FROM AN EXTREME ULTRAVIOLET (EUV...
- Publication number 20230375950
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Han LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE DEVICE AND PLASMA GAS RECYCLING SYSTEM FOR HIGH-DE...
- Publication number 20230371164
- Publication date Nov 16, 2023
- ESOL Inc.
- Dong Gun LEE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DEVICE FOR EUV LIGHT SOURCE
- Publication number 20230368937
- Publication date Nov 16, 2023
- ESOL Inc.
- Dong Gun LEE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
- Publication number 20230367224
- Publication date Nov 16, 2023
- ASML NETHERLANDS B.V.
- Hrishikesh PATEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
- Publication number 20230363074
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Chih LAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
- Publication number 20230359125
- Publication date Nov 9, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
- Che-Chang HSU
- G06 - COMPUTING CALCULATING COUNTING

involving a beam of energy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems for aligning master oscillator power amplifier...

EUV light source with a separation device

Target material control in an EUV light source

Radiation source apparatus and method for using the same

Guiding device

Modular laser-produced plasma x-ray system

System and method for pumping laser sustained plasma with an illumi...

Extreme ultraviolet light generation apparatus and electronic devic...

Extreme ultraviolet light generation apparatus and electronic devic...

Metrology system and method for measuring an excitation laser beam...

Electron diffraction intensity from single crystal silicon in a pho...

Semiconductor processing tool and methods of operation

Self-aligning vacuum feed-through for liquid nitrogen

Particle based X-ray source

Apparatus for and method of reducing contamination from source mate...

Target control in extreme ultraviolet lithography systems using abe...

Target delivery system

Target debris collection device and extreme ultraviolet light sourc...

System and method for vacuum ultraviolet lamp assisted ignition of...

Device and method to remove debris from an extreme ultraviolet (EUV...

Focusing device and EUV radiation generating device having same

Radiation source for lithography process

Light source and extreme ultraviolet light source system using the...

EUV light source and apparatus for lithography

Laser sustained plasma and endoscopy light source

Guiding device and associated system

Foil trap and light source apparatus including the same

Device for EUV light source

Nanopatterned electron beams for temporal coherence and determinist...

Shock wave visualization for extreme ultraviolet plasma optimization

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SYSTEM AND METHOD FOR VACUUM ULTRAVIOLET LAMP ASSISTED IGNITION OF...

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

HIGH BRIGHTNESS LPP EUV LIGHT SOURCE WITH FAST ROTATING TARGET AND...

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...

LASER SUSTAINED PLASMA AND ENDOSCOPY LIGHT SOURCE

TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABE...

TARGET DELIVERY SYSTEM

GUIDING DEVICE AND ASSOCIATED SYSTEM

Confocal Chromatic Metrology for EUV Source Condition Monitoring

POSITION DETECTION APPARATUS, POSITION DETECTION METHOD AND NON-TRA...

EUV EXCITATION LIGHT SOURCE AND EUV LIGHT SOURCE

EUV LIGHT SOURCE WITH A SEPARATION DEVICE

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

FOIL TRAP COVER DEVICE AND DEBRIS REDUCTION APPARATUS

EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL

LIGHT SOURCE APPARATUS

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY

SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION

DEVICE AND METHOD TO REMOVE DEBRIS FROM AN EXTREME ULTRAVIOLET (EUV...

EUV LIGHT SOURCE DEVICE AND PLASMA GAS RECYCLING SYSTEM FOR HIGH-DE...

DEVICE FOR EUV LIGHT SOURCE

RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT