Protective coatings

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CPC
G03F1/48

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/48Protective coatings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask with reduced wafer neighboring effect
- Patent number 12,130,548
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,124,164
- Issue date Oct 22, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 12,105,411
- Issue date Oct 1, 2024
- Hoya Corporation
- Kota Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for lithography process
- Patent number 12,066,756
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 12,055,850
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks and methods for depositing layers on mask blank
- Patent number 12,019,367
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection layer on low thermal expansion material (LTEM) substrate...
- Patent number 12,001,132
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and its manufacturing method
- Patent number 11,977,325
- Issue date May 7, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhineng Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 11,953,822
- Issue date Apr 9, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,261
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,914,284
- Issue date Feb 27, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,829,065
- Issue date Nov 28, 2023
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing workpiece
- Patent number 11,823,903
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,747,730
- Issue date Sep 5, 2023
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing extreme ultraviolet mask with reduced wafer...
- Patent number 11,740,547
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,703,751
- Issue date Jul 18, 2023
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for forming the same
- Patent number 11,681,215
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsuan-Wen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 11,662,660
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 11,624,978
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask assembly with reflective photomask and method of manufact...
- Patent number 11,537,039
- Issue date Dec 27, 2022
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks and methods for depositing layers on mask blank
- Patent number 11,531,262
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask for extreme ultraviolet lithography
- Patent number 11,467,485
- Issue date Oct 11, 2022
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a planar polymer stack
- Patent number 11,454,880
- Issue date Sep 27, 2022
- Arkema France
- Xavier Chevalier
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask for lithography process and method for manufacturing the same
- Patent number 11,448,955
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask with an amorphous capping layer
- Patent number 11,442,356
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for EUV lithography and method of manufacturing the same
- Patent number 11,402,745
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK
- Publication number 20240427228
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANU...
- Publication number 20240393678
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- Keiko ABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...
- Publication number 20240377719
- Publication date Nov 14, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED
- Publication number 20240357791
- Publication date Oct 24, 2024
- Shanghai Huali Integrated Circuit Corporation
- Yuan Yuan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
- Publication number 20240288763
- Publication date Aug 29, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Daisuke Miyawaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240241433
- Publication date Jul 18, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20240241455
- Publication date Jul 18, 2024
- InnoLux Corporation
- Kuang-Ming FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME
- Publication number 20240231219
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Nam Jin CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20240231214
- Publication date Jul 11, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20240210814
- Publication date Jun 27, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20240184193
- Publication date Jun 6, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY PATTERNING METHOD
- Publication number 20240176245
- Publication date May 30, 2024
- Korea Advanced Institute of Science and Technology
- Jungchul SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240176224
- Publication date May 30, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK
- Publication number 20240176226
- Publication date May 30, 2024
- SK HYNIX INC.
- Suk Won PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240168370
- Publication date May 23, 2024
- AGC Inc.
- Shunya TAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE HARDMASK ON HARDMASK
- Publication number 20240168371
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240160096
- Publication date May 16, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
- Publication number 20240142866
- Publication date May 2, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20240134265
- Publication date Apr 25, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240061324
- Publication date Feb 22, 2024
- SK enpulse Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK STRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240053674
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHUN-LANG CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240045320
- Publication date Feb 8, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE WITH IMPROVED PROPERTIES
- Publication number 20240004284
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT
- Publication number 20230367194
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chang HSUEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DEVICE FABRICATION METHOD
- Publication number 20230367202
- Publication date Nov 16, 2023
- Shphotonics Ltd
- Lei SUN
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20230350285
- Publication date Nov 2, 2023
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
- Publication number 20230341762
- Publication date Oct 26, 2023
- Canon Kabushiki Kaisha
- KEIJI MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20230333459
- Publication date Oct 19, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Protective coatings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme ultraviolet mask with reduced wafer neighboring effect

Reflective mask blank and reflective mask

Substrate with multilayer reflective film, reflective mask blank, r...

Positive photosensitive resin composition, positive photosensitive...

Method for lithography process

Fabricating method of photomask, photomask structure thereof, and s...

Reflective mask and fabricating method thereof

Mask blanks and methods for depositing layers on mask blank

Protection layer on low thermal expansion material (LTEM) substrate...

Reflective mask blank, reflective mask, method of manufacturing ref...

Photomask and its manufacturing method

Reflective mask blank for EUV lithography, reflective mask for EUV...

Method for making photolithography mask plate

Reflective mask blank, reflective mask, method of manufacturing ref...

Multiple patterning with organometallic photopatternable layers wit...

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for processing workpiece

Method for making photolithography mask plate

Method of manufacturing extreme ultraviolet mask with reduced wafer...

Reflective mask blank and reflective mask

Photomask and method for forming the same

Fabricating method of photomask, photomask structure thereof, and s...

Fabricating method of photomask, photomask structure thereof, and s...

Photomask assembly with reflective photomask and method of manufact...

Mask blanks and methods for depositing layers on mask blank

Blankmask and photomask for extreme ultraviolet lithography

Method for producing a planar polymer stack

Mask for lithography process and method for manufacturing the same

Lithography mask with an amorphous capping layer

Mask for EUV lithography and method of manufacturing the same

Patents Applicationslast 30 patents

PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK

REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANU...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...

PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED

REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

ELECTRONIC DEVICE

HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR...

PHOTOLITHOGRAPHY PATTERNING METHOD

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

SELECTIVE HARDMASK ON HARDMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

BLANK MASK AND PHOTOMASK USING THE SAME

PHOTOMASK STRUCTURE AND METHOD OF MANUFACTURING THE SAME

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

PELLICLE MEMBRANE WITH IMPROVED PROPERTIES

EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT

OPTICAL DEVICE FABRICATION METHOD

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...