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G03F1/48
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PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Current Industry
G03F1/48
Protective coatings
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Patents Grants
last 30 patents
Information
Patent Grant
Photomask and its manufacturing method
Patent number
11,977,325
Issue date
May 7, 2024
CHANGXIN MEMORY TECHNOLOGIES, INC.
Zhineng Kong
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
Patent number
11,953,822
Issue date
Apr 9, 2024
AGC Inc.
Hirotomo Kawahara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for making photolithography mask plate
Patent number
11,947,261
Issue date
Apr 2, 2024
Tsinghua University
Mo Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
Patent number
11,914,284
Issue date
Feb 27, 2024
AGC Inc.
Daijiro Akagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
Patent number
11,886,116
Issue date
Jan 30, 2024
Inpria Corporation
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
Patent number
11,829,065
Issue date
Nov 28, 2023
AGC Inc.
Shunya Taki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for processing workpiece
Patent number
11,823,903
Issue date
Nov 21, 2023
Tokyo Electron Limited
Yoshihide Kihara
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for making photolithography mask plate
Patent number
11,747,730
Issue date
Sep 5, 2023
Tsinghua University
Mo Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of manufacturing extreme ultraviolet mask with reduced wafer...
Patent number
11,740,547
Issue date
Aug 29, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Wen-Chang Hsueh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reflective mask blank and reflective mask
Patent number
11,703,751
Issue date
Jul 18, 2023
AGC Inc.
Hiroshi Hanekawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask and method for forming the same
Patent number
11,681,215
Issue date
Jun 20, 2023
Taiwan Semiconductor Manufacturing Company Ltd.
Hsuan-Wen Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
Patent number
11,662,660
Issue date
May 30, 2023
Taiwan Semiconductor Manufacturing Company Ltd.
Cheng-Ming Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
Patent number
11,624,978
Issue date
Apr 11, 2023
Taiwan Semiconductor Manufacturing Company Ltd.
Cheng-Ming Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask assembly with reflective photomask and method of manufact...
Patent number
11,537,039
Issue date
Dec 27, 2022
Advanced Mask Technology Center GmbH & Co. KG
Thorsten Schedel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blanks and methods for depositing layers on mask blank
Patent number
11,531,262
Issue date
Dec 20, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Blankmask and photomask for extreme ultraviolet lithography
Patent number
11,467,485
Issue date
Oct 11, 2022
S&S TECH Co., Ltd.
Cheol Shin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for producing a planar polymer stack
Patent number
11,454,880
Issue date
Sep 27, 2022
Arkema France
Xavier Chevalier
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Mask for lithography process and method for manufacturing the same
Patent number
11,448,955
Issue date
Sep 20, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Hung Liao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithography mask with an amorphous capping layer
Patent number
11,442,356
Issue date
Sep 13, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Hsin-Chang Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask for EUV lithography and method of manufacturing the same
Patent number
11,402,745
Issue date
Aug 2, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and system for providing a quality metric for improved proce...
Patent number
11,372,340
Issue date
Jun 28, 2022
KLA Corporation
Daniel Kandel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask, method of fabricating a photomask, and method of fabrica...
Patent number
11,340,524
Issue date
May 24, 2022
Taiwan Semiconductor Manufacturing Company Ltd.
Tzu Han Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for producing photomask, method for producing semiconductor...
Patent number
11,275,305
Issue date
Mar 15, 2022
Kioxia Corporation
Yukio Oppata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for processing workpiece
Patent number
11,244,828
Issue date
Feb 8, 2022
Tokyo Electron Limited
Yoshihide Kihara
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask blank, phase shift mask, method for manufacturing thereof, and...
Patent number
11,226,549
Issue date
Jan 18, 2022
Hoya Corporation
Osamu Nozawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reflective mask blank and reflective mask
Patent number
11,150,550
Issue date
Oct 19, 2021
AGC Inc.
Hiroshi Hanekawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask and method for forming the same
Patent number
11,137,672
Issue date
Oct 5, 2021
Taiwan Semiconductor Manufacturing Co., Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithography mask with both transmission-type and reflective-type ov...
Patent number
11,137,684
Issue date
Oct 5, 2021
Taiwan Semiconductor Manufacturing Co., Ltd.
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blank, phase shift mask and method for manufacturing semicondu...
Patent number
11,119,399
Issue date
Sep 14, 2021
Hoya Corporation
Atsushi Matsumoto
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask for extreme-ultraviolet (extreme-UV) lithography and method fo...
Patent number
11,092,884
Issue date
Aug 17, 2021
Imec VZW
Jae Uk Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240160096
Publication date
May 16, 2024
AGC Inc.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
Publication number
20240142866
Publication date
May 2, 2024
HOYA CORPORATION
Masanori NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
Publication number
20240134265
Publication date
Apr 25, 2024
HOYA CORPORATION
Teiichiro UMEZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
Publication number
20240061324
Publication date
Feb 22, 2024
SK enpulse Co., Ltd.
GeonGon LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK STRUCTURE AND METHOD OF MANUFACTURING THE SAME
Publication number
20240053674
Publication date
Feb 15, 2024
Taiwan Semiconductor Manufacturing company Ltd.
CHUN-LANG CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240045320
Publication date
Feb 8, 2024
AGC Inc.
Takuma KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PELLICLE MEMBRANE WITH IMPROVED PROPERTIES
Publication number
20240004284
Publication date
Jan 4, 2024
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Pei-Cheng Hsu
B82 - NANO-TECHNOLOGY
Information
Patent Application
EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT
Publication number
20230367194
Publication date
Nov 16, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Wen-Chang HSUEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
OPTICAL DEVICE FABRICATION METHOD
Publication number
20230367202
Publication date
Nov 16, 2023
Shphotonics Ltd
Lei SUN
B82 - NANO-TECHNOLOGY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20230350285
Publication date
Nov 2, 2023
AGC Inc.
Daijiro AKAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
Publication number
20230341762
Publication date
Oct 26, 2023
Canon Kabushiki Kaisha
KEIJI MATSUMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
Publication number
20230333459
Publication date
Oct 19, 2023
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE PHO...
Publication number
20230333460
Publication date
Oct 19, 2023
Shin-Etsu Chemical Co., Ltd.
Keisuke SAKURAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
Publication number
20230333461
Publication date
Oct 19, 2023
TOPPAN PHOTOMASK CO., LTD.
Kyoko KUROKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
Publication number
20230324785
Publication date
Oct 12, 2023
AGC Inc.
Hirotomo KAWAHARA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FLUID PURGING SYSTEM
Publication number
20230314964
Publication date
Oct 5, 2023
ASML NETHERLANDS B.V.
José Nilton FONSECA JUNIOR
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR MANUFACTURING ELEMENT SUBSTRATE, ELEMENT SUBSTRATE, AND...
Publication number
20230311493
Publication date
Oct 5, 2023
Canon Kabushiki Kaisha
Tetsushi Ishikawa
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Application
REFLECTION-TYPE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTION-TYPE MAS...
Publication number
20230288794
Publication date
Sep 14, 2023
AGC Inc.
Daijiro AKAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FABRICATING METHOD OF PHOTOMASK, PHOTOMASK STRUCTURE THEREOF, AND S...
Publication number
20230266661
Publication date
Aug 24, 2023
Taiwan Semiconductor Manufacturing company Ltd.
CHENG-MING LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20230251564
Publication date
Aug 10, 2023
AGC Inc.
Shunya TAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
GROWTH INHIBITOR FOR FORMING PELLICLE-PROTECTIVE THIN FILM, METHOD...
Publication number
20230251565
Publication date
Aug 10, 2023
Soulbrain Co., LTD
Chang Bong YEON
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
REFLECTIVE MASK AND FABRICATING METHOD THEREOF
Publication number
20230229072
Publication date
Jul 20, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Tsiao-Chen WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
Publication number
20230213849
Publication date
Jul 6, 2023
SKC solmics Co., Ltd.
GeonGon LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
Publication number
20230176467
Publication date
Jun 8, 2023
TOPPAN PHOTOMASK CO., LTD.
Kenjiro ICHIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK
Publication number
20230135120
Publication date
May 4, 2023
SKC solmics Co., Ltd.
Sung Hoon SON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
Publication number
20230133304
Publication date
May 4, 2023
HOYA CORPORATION
Kota SUZUKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANKS AND METHODS FOR DEPOSITING LAYERS ON MASK BLANK
Publication number
20230121303
Publication date
Apr 20, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
Publication number
20230051705
Publication date
Feb 16, 2023
KLA Corporation
Daniel Kandel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK
Publication number
20220404693
Publication date
Dec 22, 2022
TOPPAN INC.
Kenjiro ICHIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY