using coherent light; using polarised light

Industry

CPC
G03F7/2006

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2006using coherent light; using polarised light

Industries

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High voltage pulse generation device, gas laser apparatus, and elec...
- Patent number 12,166,329
- Issue date Dec 10, 2024
- National University Corporation Nagaoka University of Technology
- Weihua Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowed gas laser apparatus, control method therefor, electro...
- Patent number 12,140,869
- Issue date Nov 12, 2024
- Gigaphoton Inc.
- Yousuke Fujimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser device and electronic device manufacturing method
- Patent number 12,113,326
- Issue date Oct 8, 2024
- Gigaphoton Inc.
- Yoichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line narrowed gas laser apparatus, control method therefor, electro...
- Patent number 12,105,426
- Issue date Oct 1, 2024
- Gigaphoton Inc.
- Yousuke Fujimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aqueous developer for flexographic printing plate and manufacturing...
- Patent number 12,044,971
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Yusuke Namba
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer material, composition, and method of manufacturing semicond...
- Patent number 12,018,107
- Issue date Jun 25, 2024
- Kioxia Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive resist material and patterning process
- Patent number 12,013,639
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of operating semiconductor apparatus
- Patent number 11,994,805
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of making a picoscopic scale/ nanoscopic scale circuit pattern
- Patent number 11,953,828
- Issue date Apr 9, 2024
- LONGSERVING TECHNOLOGY CO., LTD
- Ko-Cheng Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,953,832
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,934,100
- Issue date Mar 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,934,099
- Issue date Mar 19, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,914,294
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,914,291
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 11,880,136
- Issue date Jan 23, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing a part comprising at least one three-dimen...
- Patent number 11,857,035
- Issue date Jan 2, 2024
- Comadur S.A.
- Jan Lintymer
- A44 - HABERDASHERY JEWELLERY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,835,860
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHAMBER FOR GAS LASER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVI...
- Publication number 20240405496
- Publication date Dec 5, 2024
- Gigaphoton Inc.
- Yoichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER APPARATUS, METHOD FOR MEASURING SPECTRAL LINEWIDTH, AND METHO...
- Publication number 20240405502
- Publication date Dec 5, 2024
- Gigaphoton Inc.
- Kazuhiro SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGE ELECTRODE, METHOD OF MANUFACTURING DISCHARGE ELECTRODE, A...
- Publication number 20240396282
- Publication date Nov 28, 2024
- Gigaphoton Inc.
- Yoichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345477
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20240329527
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240329529
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, AND ARF DRY PHOTORESIST COMPOSITION COMPRISING SAME AND APPL...
- Publication number 20240302749
- Publication date Sep 12, 2024
- Su WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING SEMICONDUCTOR APPARATUS
- Publication number 20240280910
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROCESSES FOR MAKING POLYMER-BASED ELEMENTS
- Publication number 20240184209
- Publication date Jun 6, 2024
- Intel Corporation
- Changhua LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240176237
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240134274
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240128701
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Atsushi FUCHIMUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240118615
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
- Publication number 20240103370
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
- Publication number 20240103367
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240103364
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...
- Publication number 20240094633
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Jungha CHAE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...
- Publication number 20240085791
- Publication date Mar 14, 2024
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Seung-Keun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE LIGHT BEAM PHASE MEASUREMENT METHOD IN LASER INTERFERENCE...
- Publication number 20240061352
- Publication date Feb 22, 2024
- TSINGHUA UNIVERSITY
- Leijie WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240053679
- Publication date Feb 15, 2024
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS AND METHODS FOR GENERATING MOLECULAR ARRAYS USING OLIG...
- Publication number 20240026444
- Publication date Jan 25, 2024
- 10X Genomics, Inc.
- Steven William SHORT
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240027909
- Publication date Jan 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240027902
- Publication date Jan 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240027899
- Publication date Jan 25, 2024
- Samsung SDI Co., Ltd.
- Seung HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymerizable Monomer, Polymer Compound, Resist Composition, And Pa...
- Publication number 20230408921
- Publication date Dec 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using coherent light; using polarised light

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Composition for forming silicon-containing resist underlayer film a...

Chemically amplified negative resist composition and resist pattern...

Chemically amplified positive resist composition and resist pattern...

High voltage pulse generation device, gas laser apparatus, and elec...

Resist underlayer film material, patterning process, and method for...

Line narrowed gas laser apparatus, control method therefor, electro...

Carboxylate, resist composition and method for producing resist pat...

Laser device and electronic device manufacturing method

Line narrowed gas laser apparatus, control method therefor, electro...

Radiation-sensitive resin composition, method for forming resist pa...

Composition for forming silicon-containing resist underlayer film a...

Resist composition and patterning process

Aqueous developer for flexographic printing plate and manufacturing...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Polymer material, composition, and method of manufacturing semicond...

Positive resist material and patterning process

Negative resist composition and pattern forming process

Method of operating semiconductor apparatus

Photoresist composition, coated substrate including the photoresist...

Method of making a picoscopic scale/ nanoscopic scale circuit pattern

Positive resist composition and pattern forming process

Composition for forming silicon-containing resist underlayer film a...

Resist composition and method of forming resist pattern

Positive resist composition and pattern forming process

Resist composition and patterning process

Manufacturing method of semiconductor chip, and kit

Resist composition and patterning process

Method for manufacturing a part comprising at least one three-dimen...

Resist composition and patterning process

Patents Applicationslast 30 patents

CHAMBER FOR GAS LASER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVI...

LASER APPARATUS, METHOD FOR MEASURING SPECTRAL LINEWIDTH, AND METHO...

DISCHARGE ELECTRODE, METHOD OF MANUFACTURING DISCHARGE ELECTRODE, A...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

RESIN, AND ARF DRY PHOTORESIST COMPOSITION COMPRISING SAME AND APPL...

METHOD OF OPERATING SEMICONDUCTOR APPARATUS

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

LITHOGRAPHIC PROCESSES FOR MAKING POLYMER-BASED ELEMENTS

Onium Salt, Resist Composition, And Patterning Process

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

Composition For Forming Adhesive Film, Patterning Process, And Meth...

Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...

COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...

EXPOSURE LIGHT BEAM PHASE MEASUREMENT METHOD IN LASER INTERFERENCE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

COMPOSITIONS AND METHODS FOR GENERATING MOLECULAR ARRAYS USING OLIG...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

Polymerizable Monomer, Polymer Compound, Resist Composition, And Pa...