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with organic non-macromolecular light-sensitive compounds not otherwise provided for
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PHYSICS
G03
Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F7/00
Photomechanical
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G03F7/0045
with organic non-macromolecular light-sensitive compounds not otherwise provided for
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last 30 patents
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Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
Patent number
11,966,162
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Semiconductor device production method employing silicon-containing...
Patent number
11,966,164
Issue date
Apr 23, 2024
NISSAN CHEMICAL CORPORATION
Wataru Shibayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and method for forming pattern
Patent number
11,966,160
Issue date
Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
Patent number
11,966,161
Issue date
Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist composition, coated substrate including the photoresist...
Patent number
11,960,206
Issue date
Apr 16, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Two-stage bake photoresist with releasable quencher
Patent number
11,955,343
Issue date
Apr 9, 2024
Intel Corporation
Robert L. Bristol
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,953,832
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,947,257
Issue date
Apr 2, 2024
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
Patent number
11,947,258
Issue date
Apr 2, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,940,728
Issue date
Mar 26, 2024
Shin-Etsu Chemical Co., Ltd.
Masaki Ohashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist compositions and pattern formation methods
Patent number
11,940,730
Issue date
Mar 26, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,934,099
Issue date
Mar 19, 2024
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist composition and method of forming photoresist pattern
Patent number
11,934,101
Issue date
Mar 19, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,914,294
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Predicting defect rate based on lithographic model parameters
Patent number
11,914,306
Issue date
Feb 27, 2024
Synopsys, Inc.
Erik A. Verduijn
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
Patent number
11,914,301
Issue date
Feb 27, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Chieh-Hsin Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemically amplified positive photoresist composition for improving...
Patent number
11,906,900
Issue date
Feb 20, 2024
YOUNG CHANG CHEMICAL CO., LTD
Su Jin Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,899,363
Issue date
Feb 13, 2024
Sumitomo Chemical Company, Limited
Katsuhiro Komuro
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition, patterning process, method for fo...
Patent number
11,892,773
Issue date
Feb 6, 2024
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
Patent number
11,884,839
Issue date
Jan 30, 2024
NISSAN CHEMICAL CORPORATION
Yuki Endo
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Curable composition, near infrared absorber, film, near infrared cu...
Patent number
11,886,112
Issue date
Jan 30, 2024
FUJIFILM Corporation
Tokihiko Matsumura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,886,113
Issue date
Jan 30, 2024
FUJIFILM Corporation
Keita Kato
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photoresist compositions and pattern formation methods
Patent number
11,880,135
Issue date
Jan 23, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Film structure for electric field guided photoresist patterning pro...
Patent number
11,880,137
Issue date
Jan 23, 2024
Applied Materials, Inc.
Huixiong Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salts and photoresists comprising same
Patent number
11,880,134
Issue date
Jan 23, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,880,136
Issue date
Jan 23, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,874,601
Issue date
Jan 16, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithographic printing plate precursor, method for preparing lithogr...
Patent number
11,874,602
Issue date
Jan 16, 2024
FUJIFILM Corporation
Akira Sakaguchi
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Patents Applications
last 30 patents
Information
Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20240126167
Publication date
Apr 18, 2024
JSR Corporation
Ken MARUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...
Publication number
20240126171
Publication date
Apr 18, 2024
TORAY INDUSTRIES, INC.
Yutaro KOYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20240118619
Publication date
Apr 11, 2024
Tokyo Ohka Kogyo Co., Ltd.
Keiichi Ibata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
Publication number
20240103370
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Pattern Forming Method
Publication number
20240103365
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTO TREATMENT DEVICE
Publication number
20240103371
Publication date
Mar 28, 2024
Ushio Denki Kabushiki Kaisha
Akihiro Shimamoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR MANUFACTURING PHOTOCHROMIC LENS AND PHOTOCHROMIC LENS
Publication number
20240100789
Publication date
Mar 28, 2024
MITSUI CHEMICALS, INC.
Yuuki KASORI
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240103364
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20240094634
Publication date
Mar 21, 2024
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Publication number
20240096623
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chieh-Hsin HSIEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
Publication number
20240094631
Publication date
Mar 21, 2024
Samsung SDI Co., Ltd.
Ieju KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...
Publication number
20240094633
Publication date
Mar 21, 2024
Samsung Electronics Co., Ltd.
Jungha CHAE
C07 - ORGANIC CHEMISTRY
Information
Patent Application
NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR A...
Publication number
20240085786
Publication date
Mar 14, 2024
SAMYANG CORPORATION
Chun Rim OH
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT W...
Publication number
20240085785
Publication date
Mar 14, 2024
INPRIA CORPORATION
Kazuki Kasahara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR...
Publication number
20240085787
Publication date
Mar 14, 2024
Murata Manufacturing Co., Ltd.
Isamu MIYAKE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...
Publication number
20240085791
Publication date
Mar 14, 2024
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Seung-Keun KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PATTERNING A SEMICONDUCTOR WORKPIECE
Publication number
20240085795
Publication date
Mar 14, 2024
TOKYO ELECTRON LIMITED
Jodi Grzeskowiak
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITION...
Publication number
20240076471
Publication date
Mar 7, 2024
Stratasys, Inc.
Mingbo HE
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Application
METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20240077802
Publication date
Mar 7, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Yu-Chung SU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOACID GENERATOR
Publication number
20240069442
Publication date
Feb 29, 2024
International Business Machines Corporation
Gerhard Ingmar Meijer
C07 - ORGANIC CHEMISTRY
Information
Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
Publication number
20240069439
Publication date
Feb 29, 2024
Christopher D. Simpson
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Application
MULTI-LAYERED MOLECULAR FILM PHOTORESIST HAVING MOLECULAR LINE STRU...
Publication number
20240061330
Publication date
Feb 22, 2024
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
Myung Mo SUNG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
Publication number
20240061336
Publication date
Feb 22, 2024
Samsung SDI Co., Ltd.
Changsoo WOO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20240061331
Publication date
Feb 22, 2024
FUJIFILM CORPORATION
Yosuke BEKKI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSORS, METHODS OF USING AND MANUFA...
Publication number
20240061337
Publication date
Feb 22, 2024
Yasushi Miyamoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...