3066052

Information

• Patent Grant
• 3066052

• References
• Source

• Patent Number

  3,066,052

• Date Filed

  Not available

• Date Issued

  Tuesday, November 27, 1962
  62 years ago

• CPC

  • H01L21/31604 - Deposition from a gas or vapour
  • C30B29/06 - Silicon
  • C30B31/02 - by contacting with diffusion material in the solid state
  • C30B31/06 - by contacting with diffusion material in the gaseous state
  • C30B31/08 - the diffusion material being a compound of the elements to be diffused
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S438/92 - Controlling diffusion profile by oxidation

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 257 - Active solid-state devices