3497407

Information

• Patent Grant
• 3497407

• References
• Source

• Patent Number

  3,497,407

• Date Filed

  Not available

• Date Issued

  Tuesday, February 24, 1970
  54 years ago

• CPC

  • H01L23/291 - Oxides or nitrides or carbides
  • H01L21/31111 - by chemical means
  • H01L23/485 - consisting of layered constructions comprising conductive layers and insulating layers
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • Y10S148/043 - Dual dielectric
  • Y10S148/051 - Etching
  • Y10S148/173 - Washed emitter

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment
  • 216 - Etching a substrate: processes
  • 252 - Compositions
  • 257 - Active solid-state devices