3573116

Information

• Patent Grant
• 3573116

• References
• Source

• Patent Number

  3,573,116

• Date Filed

  Not available

• Date Issued

  Tuesday, March 30, 1971
  54 years ago

• CPC

  • C30B31/10 - Reaction chambers Selection of material therefor
  • C30B29/06 - Silicon
  • C30B31/08 - the diffusion material being a compound of the elements to be diffused
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S148/043 - Dual dielectric
  • Y10S148/049 - Equivalence and options
  • Y10S438/92 - Controlling diffusion profile by oxidation

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment