A. P. Ghosh and D. B. Dove, Direct Phase Measurements In Phase Shifting Masks, SPIE vol. 1673 Integrated Circuit Metrology, Inspection and Process Control VI, pp. 242-254, Jan. 1992. |
A. Callegari et al., Optical properties of hydrogenated amorphous-carbon film for attenuated phase-shift mask applications, J. Vac. Sci. Technol B 11(6), pp. 2697-2699 (Nov./Dec. 1993). |
C. Pierrat, J. De Marco, Phase-Shifting Mask Fabrication, SPIE vol. 2087 Photomask Technology and Management, pp. 362-371, Jan. 1993. |
Wen-an Loong et al., Simulation and fabrication of a new phase shifting mask for 0.35 .mu.m contact hole pattern transfer: Halftone-rim, SPIE vol. 2087 Photomask Technology and Management, pp. 380-389, Jan. 1993. |
Burn J. Lin. The Attenuated Phase-Shifting Mask. Solid State Technology, pp. 43-47 (Jan/1992). |
M. A. McCord et al., Effect of mask absorber thickness on x-ray exposure latitude and resolution, J. Vac. Sci. Technol. B 11(6), pp. 2881-2887 (Nov./Dec. 1993). |
R. L. Kostelak et al., Printing of phase-shifting defects, J. Vac. Sci. Technol. B 11 (6), pp. 2705-2713 (Nov/Dec 1993). |
B. J. Lin., The optimum numerical aperture for attenuated phase-shifting masks, Microelectronic Engineering 17, pp. 79-86, Jan. 1992. |