This invention relates to connection assemblies and, in particular, to connection pad layouts.
The substrate assembly 100 can be formed as a ceramic substrate and implemented to electrically connect semiconductor integrated circuits and other electronic or microelectronic components. The integrated circuits and electronic components can be interconnected by way of conductive vias formed within layers of the ceramic substrate assembly 100.
Interconnect terminals of an integrated circuit or electronic component are soldered, or otherwise affixed with a conductive adhesive, to the connection pads 104 to electrically couple the integrated circuit or electronic component with conductive vias in the substrate assembly 100. Solder can be pre-formed on an interconnect terminal or on a connection pad 104 and can be reflowed (e.g., heated to a liquid) to provide a conductive bond that electrically couples an interconnect terminal with a respective connection pad 104. This provides an electrical signal communication path between an electronic component and a conductive via in the substrate assembly 100 (coupled through a connection pad 104).
Although the interconnect terminals 202 at a mid-portion of the interconnect 200 do align with a respective connection pad 104, such as terminal 202(4) which aligns with connection pad 104(4), the terminals 202 at the ends of the warped interconnect 200 do not accurately align with a respective connection pad 104. For example, interconnect terminal 202(1) does not accurately align with connection pad 104(1), and interconnect terminal 202(N) also does not accurately align with a connection pad on the substrate assembly 100. These misaligned interconnect terminals and connection pads reduce the effectiveness of the electrical connections, and with some of the interconnect terminals, there is no electrical connection. In addition to the misaligned interconnect terminal 202(N) not having an established electrical connection with a respective connection pad, the misaligned interconnect terminal may overlap and electrically connect with the wrong connection pad, as shown in region 204.
Electronic devices continue to be manufactured smaller and/or more portable, yet increasingly are more complex and multi-functional which requires more electrical interconnections between components in the electronic devices. Substrate assemblies in these smaller electronic devices have limited available surface area for component interconnection, while at the same time, more electrical interconnections are needed to implement the many features that are available with these electronic devices. As a result, manufacturers utilize thin and elongated interconnects to electrically connect the components in an electronic device when available substrate surface space is at a premium.
When these thin and less rigid interconnects are manufactured, the interconnects tend to warp at one or both ends due to manufacturing inaccuracies, material variations, and/or non-uniform shrinkage of the material used to manufacture the interconnects. For example, differential shrinkage of multi-lead interconnects in a two-dimensional array occurs when a thin and long interconnect is fabricated with more coring on one end or the other resulting in non-uniform shrinkage on the end with more plastic or interconnect material. When the warped interconnect 200 is positioned over the connection pad array 102, not all of the interconnect terminals 202 accurately align with the respective connection pads 104 thus reducing the connection density, or manufacturing yields.
A conventional practice to ensure accurate alignment and electrical contact with the interconnect terminals of an electronic component is to oversize all of the connection pads. However, oversizing the connection pads to accommodate the worst case misalignment limits the number of connection pads that can be formed within the ever diminishing available substrate surface space, thus reducing and limiting the connection density.
The same numbers are used throughout the drawings to reference like features and components.
In an embodiment of connection pad layouts, connection pads can be disposed on a substrate assembly in any number of configurations to accommodate any shape of an interconnect, such as an interconnect that is warped during manufacture for example. The connection pads can be laid out to align with interconnect terminals of warped interconnects without over-sizing or increasing the contact area of the connection pads, which maintains a high connection density. The exemplary connection pad configurations described herein provide that an interconnect having any layout of terminals (e.g., a warped interconnect) will be electrically coupled to conductive vias within a substrate assembly by contact between the interconnect terminals and one or more of the connection pads in a connection pad configuration.
The substrate assembly 300 can be formed with layered sheets of substrate material such as alumina, glass ceramic aluminum nitride, laminated glass fibers and epoxy for a PC board, layers of polymide for a flex circuit, or any other type of substrate material. The layered substrate sheets can have conductive vias that are filled with a conductive material, plated or otherwise made conductive, to electrically connect each conductive via to a respective connection pad 304, 308. The connection pads 304 and 308, and the vias in substrate assembly 300, are multiple conductors which can be formed with such conductive material as tungsten, molybdenum, copper, conductive adhesive, brazing, or with any other type of conductive material.
Substrate assembly 300, which in one embodiment is a layered ceramic substrate, can be manufactured to electrically connect semiconductor integrated circuits and other electronic or microelectronic components, such as printing device components. The integrated circuits and electronic components can be connected by the conductive vias which may function as electrical interconnections and can be formed within the layers of the substrate assembly 300. The connection pads 304 and 308 can be part of circuitry disposed on the substrate assembly 300, or can be the connections for implementation within a larger circuit and/or electronic component.
In an embodiment, connection pads 304 are disposed on substrate assembly 300 in a configuration (e.g., connection pad array 302) with a warp variance 312 which in this example, is a distance that one or both ends of an interconnect are displaced from a center of the interconnect. In another embodiment, warp variance 312 can also be determined, or measured, as a distance from a center of the connection pad array 302. In an additional embodiment, a warp variance 312 can be described as one or more of the connection pads 304 having a center that is offset from a line in a direction parallel to a surface of the substrate assembly upon which the connections pads are disposed where the line is defined by a plane perpendicular to the surface of the substrate assembly. Other methods of measuring or determining warp variance may be utilized.
In the example shown in
The connection pad arrays 302 and 306 are only two examples of connection pad configurations that can be disposed on substrate assembly 300 to accommodate any shape of warped interconnects having any warp variance 312. The connection pads 304 and 308 are laid out to align with the terminals of warped interconnects without over-sizing or increasing the contact area of the connection pads to maintain a high connection density when mounting warped interconnect(s) on a substrate assembly.
Although only the two connection pad arrays 302 and 306 are shown having connection pads 304 and 308, respectively, any number of connection pad arrays which include any number of connection pads can be disposed on substrate assembly 300. Further, although the connection pads 304 and 308 are shown as rectangular pads, the connection pads can be implemented as any number of different shapes to align and coincide with any type of interconnect terminals. It should also be noted that the substrate assembly 300 and the connection pads 304 and 308 are only illustrative and are not shown to scale in the figures.
A warp variance 404, in this example, is a distance that each of a first end 406 and a second end 408 of the warped interconnect 400 is displaced from a center of the interconnect 400 due to warping, such as during manufacture. The warp variance 404 substantially aligns with warp variance 312 (
A particular substrate assembly can include any layout of connection pads to align with the interconnect terminals of any warped interconnect. For example, a substrate assembly can include connection pad arrays 302 and 306 to align with the terminals of an interconnect warped at both ends and an interconnect warped at only one end, respectively.
The connection pads 508 of connection pad array 506 are extended, or otherwise widened, on both sides to also align with the interconnect terminals of an interconnect (e.g., interconnect 702) which may be warped at one end, at both ends, or warped in some other area. Although all of the connection pads 508 are illustrated as being extended on both sides of the pads, any one or more of the connection pads 508 may be extended on one or both sides as applicable to accommodate a connection with an interconnect terminal of an interconnect. Further, any one or more of the connection pads 508 may be extended a distance less or greater than any other connection pad on one and/or both sides.
The connection pads 504 and 508 are disposed on a surface 512 of the substrate assembly 500 to form an electrical connection with thin film wiring (not shown) formed on a surface of the substrate assembly 500, or with conductive vias (not shown) formed within the substrate assembly 500. Connection pad arrays 502 and 506 allow an interconnect having any shape to be electrically coupled to conductive vias within the substrate assembly 500 by contact between the interconnect terminals and one or more of the connection pads 504 and 508 (e.g., using solder).
At block 702, a substrate assembly is formed having conductive vias. For example, substrate assembly 300 (shown in
At block 704, a warp variance of manufactured interconnects is determined. For example, warped interconnect 400 (shown in
At block 706, connection pads are disposed on the substrate assembly in a configuration that aligns each connection pad with a different terminal of a warped interconnect. For example, connection pads 304 and 308 (shown in
The connection pads 304 (shown in
Further, connection pads 504 and 508 (shown in
Although connection pad layouts has been described in language specific to structural features and/or methods, it is to be understood that the subject of the appended claims is not necessarily limited to the specific features or methods described. Rather, the specific features and methods are disclosed as exemplary implementations of connection pad layouts.
Number | Name | Date | Kind |
---|---|---|---|
4600970 | Bauer | Jul 1986 | A |
5019997 | Haller | May 1991 | A |
5315485 | Magill et al. | May 1994 | A |
5324569 | Nagesh et al. | Jun 1994 | A |
5375041 | McMahon | Dec 1994 | A |
5381307 | Hertz et al. | Jan 1995 | A |
5412537 | Magill et al. | May 1995 | A |
5435482 | Variot et al. | Jul 1995 | A |
5484963 | Washino | Jan 1996 | A |
5641946 | Shim | Jun 1997 | A |
5745986 | Variot et al. | May 1998 | A |
5777855 | Yokajty | Jul 1998 | A |
5798567 | Kelly et al. | Aug 1998 | A |
5951304 | Wildes et al. | Sep 1999 | A |
6113216 | Wong | Sep 2000 | A |
6422688 | Giere et al. | Jul 2002 | B2 |
6452112 | Terashima et al. | Sep 2002 | B1 |
6472607 | Someya et al. | Oct 2002 | B1 |
6558199 | Oguchi | May 2003 | B2 |
6974330 | Caldwell et al. | Dec 2005 | B2 |
20010033017 | Wang et al. | Oct 2001 | A1 |
Number | Date | Country | |
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20050094382 A1 | May 2005 | US |