The invention described herein was made in the performance of work under a NASA contract, and is subject to the provisions of Public Law 96-517 (35 USC 202) in which the contractor has elected not to retain title.
Number | Name | Date | Kind |
---|---|---|---|
4051271 | Fujishige | Sep 1977 | |
4360585 | Frank et al. | Nov 1982 | |
4772539 | Gillespie | Sep 1988 | |
4797334 | Glendinning | Jan 1989 | |
4895790 | Swanson et al. | Jan 1990 | |
5051598 | Ashton et al. | Sep 1991 | |
5057397 | Miyabe et al. | Oct 1991 | |
5104772 | Kobayashi et al. | Apr 1992 | |
5112724 | Bradshaw | May 1992 | |
5241185 | Meiri et al. | Aug 1993 |
Number | Date | Country |
---|---|---|
59-61131 | Apr 1984 | JPX |
59-61133 | Apr 1984 | JPX |
4-212407 | Aug 1992 | JPX |
Entry |
---|
Ekberg et al, Appl. Opt. 15 568-569 (May 1990). |
Fujita et al, Appl. Opt. 6 613-615 (Dec. 1981). |
Fujita et al, Appl. Opt. 7 578-580 (Dec. 1982). |
Mihir Parikh, "Corrections to proximity effects in electron beam lithography," J. Appl. Phys. 50 (6), Jun. 1979, pp. 4371-4377. |
"Proximity effect correction for electron beam Lithography by equalization of background dose" by Geraint Owen and Paul Rissman, J. App. Physics 54 (6), Jun. 1983, pp. 3573-3581. |