| Number | Date | Country | Kind |
|---|---|---|---|
| 198 58 428 | Dec 1998 | DE |
| Number | Name | Date | Kind |
|---|---|---|---|
| 4118869 | Hartung et al. | Oct 1978 | A |
| 4589746 | Pavone | May 1986 | A |
| 4763420 | McCabe et al. | Aug 1988 | A |
| 4770531 | Tanaka et al. | Sep 1988 | A |
| 4882847 | Hammelgarn et al. | Nov 1989 | A |
| 5363196 | Cameron | Nov 1994 | A |
| 5836080 | Inagaki et al. | Nov 1998 | A |
| 5909938 | Brenner et al. | Jun 1999 | A |
| 6219931 | Roth | Apr 2001 | B1 |
| 6285457 | Ukaji | Sep 2001 | B2 |
| Number | Date | Country |
|---|---|---|
| 198 19 492 A 1 | Nov 1999 | DE |
| Entry |
|---|
| K.D. Roth, et al. “Mask Metrology Using the LEICA LMS IPRO for Semiconductor Production”; Mitteilungen Für Wissenschaft und Technik Bd. XI, No. 4, pp. 130-135, Oct. 1997 (Article W/English Summary). |