This application relates to the field of electronic device technologies, and in particular, to an electronic device, a circuit board, and a manufacturing method for the circuit board.
Rapid development of technologies such as 5th generation mobile communication technology (5G), cloud computing, big data, Internet of Things, and artificial intelligence drives explosive growth of data and the increasing complexity of algorithms, and also rapidly increases requirements for computing power scale and computing power capabilities. With improvement of chip computing power, a requirement for power of a corresponding single chip increases from 450 W to 2000 W or even to 40 kW.
However, a horizontal power supply path of an existing circuit board is excessively long, and cannot meet a through-current requirement of a chip with high computing power. To shorten the power supply path, the circuit board supplies power to the chip in a vertical power supply manner, for example, through a via. However, for a chip with high power consumption, density of chip pins is high, bringing a small spacing between soldering pads that are connected to the chip pins and that are on the circuit board. A via with a large via diameter cannot be disposed on the circuit board. Therefore, a conductive layer with a large thickness cannot be formed in the via to meet a requirement for a high through-current capability.
Embodiments of this application provide an electronic device, a circuit board, and a manufacturing method for the circuit board, to resolve a problem that a requirement for a high through-current capability cannot be met because a via having a thick conductive layer cannot be manufactured on an existing circuit board connected to a high-power chip.
To achieve the foregoing objectives, this application uses the following technical solutions.
According to a first aspect, an embodiment of this application provides a circuit board. The circuit board has a first surface. The circuit board includes a pad array and a first conductive hole. The pad array is disposed on the first surface. The pad array includes one or more pad units, the pad unit includes two or more first power pads that are disposed adjacently, and all the first power pads of the pad unit are configured to be connected to a same power network of a chip. There may be one or more first conductive holes. For a circuit board having one pad unit and one conductive hole, the conductive hole is disposed at a position that is on the first surface and that corresponds to the pad unit. All first power pads in the pad unit are spaced and cover a same first conductive hole. In addition, all the first power pads in the pad unit may be connected to the first conductive hole. For a circuit board having a plurality of pad units and a plurality of conductive holes, a quantity of pad units may be equal to a quantity of first conductive holes, or may be greater than a quantity of first conductive holes. The plurality of first conductive holes may be disposed corresponding to the plurality of pad units. The first power pads connected to the same power network are connected to each other, which does not affect functions of the circuit board. Therefore, all first power pads in one pad unit are spaced and cover one corresponding first conductive hole, and are electrically connected to the first conductive hole.
When the foregoing circuit board is connected to a high-power chip, a pin spacing of the chip is small, bringing a small spacing between adjacent first power pads on the circuit board. Because the first conductive hole may occupy positions of two or more adjacent first power pads, an area of the first conductive hole may be large, and a thickness-to-diameter ratio of the first conductive hole is reduced. When the first conductive hole is manufactured, a large-area connection hole may be disposed on the first surface of the circuit board. The large-area connection hole has small resistance to an electroplating solution. This helps entering of the electroplating solution, so that the electroplating solution can have a full reaction with a seed layer in the connection hole. In this way, conversion rate of the electroplating solution is improved, so that a thick conductive layer is formed in the connection hole, to obtain the first conductive hole. The thick conductive layer improves a through-current capability of the first conductive hole. Therefore, the circuit board in this embodiment of this application can improve a vertical through-current capability of the circuit board without increasing a manufacturing process, so that the vertical through-current capability of the circuit board can reach more than 5 A/hole.
For different through-current requirements, there may be a plurality of structures of the first conductive hole on the circuit board. In some embodiments, the first conductive hole includes a first connection hole, a first conductive layer, and a first filling medium. The first connection hole is disposed at the position that is on the first surface and that corresponds to the pad unit. There may be two or more first conductive layers, and a specific quantity of the first conductive layers may correspond to a quantity of first power pads in the pad unit. The plurality of first conductive layers are spaced in a circumferential direction on a hole wall of the first connection hole. In addition, the plurality of first conductive layers may be electrically connected to the plurality of first power pads in the pad unit respectively. The first filling medium fills the first connection hole, and separates the plurality of first conductive layers. Because the area of the first conductive hole is large, a thick first conductive layer may be formed, so that the circuit board may have a good horizontal through-current capability and a good vertical through-current capability. Therefore, the circuit board is applicable to an application scenario in which a moderate vertical through-current capability is required.
To meet some requirements for a higher vertical through-current capability, in some embodiments of this application, the first conductive hole includes a first connection hole and a conductive medium. The first connection hole is disposed at the position that is on the first surface and that corresponds to the pad unit. The conductive medium fills the first connection hole, and the conductive medium covers an entire hole wall of the first connection hole. The conductive medium is electrically connected to all the first power pads in the pad unit. The conductive medium covers the entire hole wall of the first connection hole, so that the circuit board has a good horizontal through-current capability. The conductive medium fills the entire first connection hole, and a volume of a conductive material in the first conductive hole is increased, so that a conductive capability of the first conductive hole is further improved. Therefore, an application scenario in which a high vertical through-current capability is required can be met.
In some feasible embodiments of this application, the conductive medium may be a copper pillar, and may directly fill the entire first connection hole by using an electroless plating process and an electroplating process.
In some other feasible embodiments of this application, the conductive medium includes a first conductive layer and a first filling medium. The first conductive layer covers the entire hole wall of the first connection hole. The first filling medium fills the first connection hole, and the first filling medium may be attached to the first conductive layer. The first filling medium is a conductive material. For example, the first filling medium may be conductive silver paste (for example, formed in the first connection hole by using a hole plugging process), conductive copper paste, carbon fiber, silver pillar (a pre-made product that is directly manufactured into a shape fitting the first connection hole having the first conductive layer), copper pillar (a pre-made product), or the like. The first conductive layer and the first filling medium are electrically connected to all the first power pads in the pad unit. The conductive medium formed by using the electroplating process and the hole plugging process has few disadvantages and high reliability of conductive performance.
In addition, according to different distribution and quantities of first power pads in the pad unit, the first conductive hole may have a plurality of shapes. For example, there are four first power pads. Correspondingly, a cross section of the first conductive hole may be rectangular or rhombic. For another example, there are two first power pads. Correspondingly, the first conductive hole may be strip-shaped. The first conductive hole may alternatively be in another shape such as an ellipse, a square, or a triangle.
It should be noted that the circuit board may be a multi-layer circuit board. The circuit board includes a plurality of layers of subboards, and the plurality of layers of subboards are disposed in a laminated manner. One or more layers of the plurality of layers of subboards are power subboards for power supply. The first conductive hole penetrates through the first surface of the circuit board to at least the power subboard. The first conductive layer of the first conductive hole is electrically connected to a routing layer of the power subboard. Therefore, the first conductive hole may be a blind hole or a through hole. When large routing space is required, the first conductive hole may be designed as the blind hole. The first conductive hole penetrates to only the power subboard, and a metal wire may be disposed at a position that is on a partial subboard located outside between the first surface of the circuit board and the power subboard and that corresponds to the blind hole. Therefore, routing space and routing density of the circuit board are improved. When large routing space is not required, the first conductive hole may be designed as the through hole, and it is convenient to dispose the first conductive hole.
Based on the foregoing descriptions, the circuit board further includes a second conductive hole, and the second conductive hole may be disposed on the first surface. In addition, the second conductive hole is strip-shaped. One end of the strip-shaped second conductive hole is located inside the pad array, and the other end of the second conductive hole is located outside the pad array. The pad array further includes a second power pad, and the second power pad is located at an edge of the pad array. A soldering pad adjacent to the second power pad may be a signal pad or a power pad connected to another power network. In other words, the second power pad may be disposed separately. The second power pad covers the end that is of the second conductive hole and that is located inside the pad array. In addition, the second power pad is electrically connected to the second conductive hole. Therefore, for the second power pad that is located at the edge of the pad array and that is disposed separately, a second conductive hole may be formed by extending the conductive hole outwards. A size of the second conductive hole is large, and electroplating may be performed to form a thick conductive layer. This improves a through-current capability of the second conductive hole. A vertical through-current capability of a circuit board having the first conductive hole and the second conductive hole is further improved.
In some embodiments of this application, the second conductive hole includes a second connection hole, a second conductive layer, and a second filling medium. The second connection hole is disposed on the first surface, and the second connection hole is strip-shaped. One end of the second connection hole is located inside the pad array, and the other end of the second connection hole is located outside the pad array. The second conductive layer covers a partial hole wall that is in the second connection hole and that is located in the pad array. The second power pad may be electrically connected to the second conductive layer. The second filling medium fills the second connection hole, and is attached to the second conductive layer. The second filling medium may be a non-conductive material, or may be a conductive material. In this way, different vertical through-current requirements are met. The second conductive hole can ensure a horizontal through-current capability, and can further have a high vertical through-current capability. In addition, the second conductive hole can avoid a short circuit caused by penetrating of tin through the second conductive hole during wave soldering of the circuit board.
Similarly, for a solution in which the circuit board is a multi-layer circuit board, the second conductive hole penetrates from the first surface of the circuit board through at least the power subboard. The second conductive layer of the second conductive hole is connected to the routing layer of the power subboard. When large routing space is required, the second conductive hole may be designed as a blind hole. The second conductive hole penetrates to only the power subboard, and a metal wire may be disposed at a position that is on a partial subboard located outside between the first surface of the circuit board and the power subboard and that corresponds to the blind hole. Therefore, routing space and routing density of the circuit board are improved. When large routing space is not required, the second conductive hole may be designed as a through hole, and it is convenient to dispose the second conductive hole.
According to a second aspect, an embodiment of this application further includes an electronic device. The electronic device may be a server, a switch, a bridge, a repeater, a router, a gateway (also referred to as a protocol converter), or the like. The electronic device includes a chip package structure and the circuit board described in the foregoing embodiment. The chip package structure may be connected to a first surface of the circuit board. Because a structure of the circuit board in the electronic device is the same as that of the circuit board in the foregoing embodiment, both can resolve the same technical problem and achieve the same technical effect. Details are not described herein again.
According to a third aspect, an embodiment of this application further includes a manufacturing method for the foregoing circuit board. The manufacturing method includes the following steps: forming a first conductive hole on a first surface of the circuit board; and forming at least two first power pads on the first conductive hole. Because the manufacturing method for the circuit board can complete manufacturing of the foregoing circuit board, both can resolve the same technical problem and achieve the same technical effect. Details are not described herein again.
Based on the foregoing descriptions, in some embodiments of this application, the forming a first conductive hole on a first surface of the circuit board includes: disposing a first connection hole on the first surface of the circuit board; manufacturing a first conductive layer in the first connection hole; and filling, with a first filling medium, the first connection hole having the first conductive layer. The first filling medium may be a conductive material, or may be a non-conductive material.
In some embodiments of this application, the manufacturing a first conductive layer in the first connection hole includes: forming, in an entire hole wall of the first connection hole by using an electroless plating process, a first conductive layer whose thickness is less than a preset thickness; removing a first conductive layer in a partial region in the first connection hole, to form a plurality of first conductive layers that are spaced; and increasing thickness of the plurality of first conductive layers in the first connection hole to the preset thickness by using an electroplating process. In this way, the first conductive layer that is manufactured in combination of advantages of the electroless plating process and the electroplating process may be uniform and dense.
In some other embodiments of this application, the manufacturing a first conductive layer in the first connection hole includes: covering a partial region in the first connection hole with a dry film; forming, in the first connection hole by using an electroless plating process, a first conductive layer whose thickness is less than a preset thickness; removing the dry film in the first connection hole, to obtain a plurality of first conductive layers that are spaced; and increasing thickness of the plurality of first conductive layers in the first connection hole to the preset thickness by using an electroplating process.
In addition, in some embodiments, the forming a first conductive hole on a first surface of the circuit board includes: disposing a first connection hole on the first surface of the circuit board; forming a seed layer of a conductive medium in the first connection hole by using an electroless plating process; and increasing a thickness of the seed layer in the first connection hole by using an electroplating process until the entire first connection hole is fully filled, to obtain the first conductive hole.
In addition, for a multi-layer circuit board, the circuit board in embodiments of this application includes at least two laminated board units, and one laminated board unit includes a plurality of layers of subboards disposed in a laminated manner. One or more laminated board units are first laminated board units having power subboards for power supply. In addition, the first surface is an outer surface of the first laminated board unit. Therefore, the forming a first conductive hole on a first surface of the circuit board includes: forming a first conductive hole electrically connected to the power subboard on the first surface of the first laminated board unit; and laminating the first laminated board unit and another laminated board unit. The first conductive hole on the first laminated board unit may be a through hole, and the first conductive hole of a blind hole structure may be obtained by laminating the first laminated board unit and the another laminated board unit. A manufacturing process of the first conductive hole is simple.
In addition, in some embodiments of this application, the manufacturing method for the circuit board further includes: forming a second conductive hole on the first surface of the circuit board; and forming a second power pad on the second conductive hole. A process of disposing the second conductive hole and a process of disposing the first conductive hole may be completed through a same processing procedure. A manufacturing process of the second power pad and a manufacturing process of the first power pad may be completed through a same processing procedure.
To describe technical solutions in embodiments of this application, the following describes the accompanying drawings used in embodiments of this application.
To make the objectives, technical solutions, and advantages of this application clearer, the following further describes this application in detail with reference to the accompanying drawings.
The terms “first” and “second” mentioned below are merely intended for a purpose of description, and shall not be understood as an indication or implication of relative importance or implicit indication of a quantity of indicated technical features. Therefore, features defined with “first”, “second”, and the like may explicitly or implicitly include one or more such features. In descriptions of this application, unless otherwise stated, “a plurality of” means two or more than two.
In addition, in this application, orientation terms such as “up”, “down”, “left”, “right”, “horizontal”, and “vertical” are defined relative to an orientation in which components are placed in the accompanying drawings. It should be understood that, these directional terms are relative concepts that are used for relative description and clarification, and may vary accordingly based on changes of the orientation in which the components are placed in the accompanying drawings.
In this application, unless otherwise specified and limited, the term “connection” should be understood in a broad sense. For example, the term “connection” may refer to a connection of a mechanical structure or a connection of a physical structure. For example, the connection may be a fixed connection, or may be a detachable connection, or may be an integrated connection, or may be a direct connection, or may be an indirect connection through an intermediate medium. The connection may alternatively be understood that components are in physical contact and electrically conductive, or may be understood that different components in a line structure are connected through a physical line that can transmit an electrical signal, such as a PCB copper foil or a conductor.
Embodiments of this application include an electronic device. The electronic device may include a server, a switch, a bridge, a repeater, a router, a gateway (also referred to as a protocol converter), and the like. A form of the electronic device is not specially limited in embodiments of this application. For ease of description, the following is all described by using an example in which the electronic device is a switch shown in
For ease of description of the following, a coordinate system of X, Y, and Z may be established in some accompanying drawings. A plane on which the circuit board 2 shown in
The chip package structure 1 includes a package substrate 11 (SUB) shown in
It should be noted that the circuit board 2 may be a multi-layer circuit board. As shown in
Still refer to
In addition, as shown in
As shown in
It may be understood that, if the circuit board 2 is a double-sided circuit board, a pad array may further be disposed on the second surface 20b of the circuit board 2, and a structure form of the pad array on the second surface 20b may be similar to or the same as a structure form of the pad array 22 on the first surface 20a. The following uses the pad array 22 on the first surface 20a of the circuit board 2 as an example for description.
In addition, still refer to
It may be understood that, chips 12 with different computing power require different through-current capabilities of the circuit board 2. For a chip 12 with high computing power, if the circuit board 2 mainly uses the metal routing layer 212 to perform horizontal power supply, a horizontal power supply path is long, and a through-current requirement of the chip 12 with high computing power cannot be met. If the circuit board 2 mainly uses the conductive hole 23 to perform vertical power supply, a vertical power supply path is short. Because power of the chip 12 with high computing power is high, pin density of the chip 12 is high. Therefore, a distance between soldering pads, on the circuit board 2, connected to the pins is short, so that only a conductive hole 23 with a small hole diameter can be disposed on the circuit board 2. Therefore, a thickness-to-diameter ratio (the thickness-to-diameter ratio is equal to a thickness of the circuit board 2 divided by a hole diameter of the conductive hole 23) of the conductive hole 23 is large. When the thickness-to-diameter ratio of the conductive hole 23 on the circuit board 2 is excessively large, resistance of an electroplating solution entering the conductive hole 23 is large, so that the electroplating solution cannot enter the conductive hole 23 for full reaction. As a result, a thick conductive layer cannot be formed to meet a large through-current requirement.
For example, a center spacing between two adjacent soldering pads 220 on the circuit board 2 is 0.9 mm, and a width (or a length or a diameter) of the soldering pad 220 is 20 mil. On the premise that an internal wiring of the circuit board 2 is met, a maximum diameter of the conductive hole 23 that can be disposed on a gap between the soldering pads 220 or inside the soldering pads 220 is 12.5 mil. A maximum through-current capability of a metal layer that can be manufactured in the conductive hole 23 with a diameter of 12.5 mil is approximately 4.3 A per hole. Therefore, a through-current requirement of the chip 12 with high computing power cannot be met.
To resolve the foregoing problem, an embodiment of this application provides a circuit board 2, and a conductive hole having a thick conductive layer can be manufactured on the circuit board. A pad array 22 of the circuit board 2 includes a pad unit 22a shown in
It should be noted that there may be one or more pad units 22a in the pad array 22 in embodiments of this application. A quantity and an arrangement manner of first power pads 222a in the plurality of pad units 22a may be the same, or may be different. This is not limited in this application.
The plurality of conductive holes 23 include a first conductive hole 231 shown in
Therefore, when the circuit board 2 is connected to the high-power chip 12, a pin spacing of the chip 12 is small, bringing a small spacing between adjacent first power pads 222a on a package substrate 11 and the circuit board 2. Because the first conductive hole 231 may occupy positions of two or more first power pads 222a, an area of the first conductive hole 231 is large, and a thickness-to-diameter ratio of the first conductive hole is reduced. When the first conductive hole 231 is manufactured, a large-area connection hole may be disposed on the first surface 20a of the circuit board 2, and the large-area connection hole has small resistance to an electroplating solution. This helps entering of the electroplating solution, so that the electroplating solution can have a full reaction with a seed layer in the connection hole. In this way, exchange efficiency of the electroplating solution is improved, so that a thick conductive layer is formed in the connection hole, to obtain the first conductive hole 231. The thick conductive layer improves a through-current capability of the first conductive hole. Therefore, the circuit board 2 in embodiments of this application can improve a vertical through-current capability of the circuit board 2 without increasing a manufacturing process, so that the vertical through-current capability of the circuit board 2 can reach more than 5 A/hole.
In addition, for a solution in which a metal wire 24 is laid between two first conductive holes 231 on the inner routing layer of the circuit board 2 shown in
It should be noted that, according to different through-current requirements of the circuit board 2, thicknesses of conductive layers in the first conductive hole 231 are different. Therefore, the first conductive hole 231 may be designed into different structures.
For example, in some embodiments of this application, as shown in
For a circuit board assembly 10 that has a high requirement for a through-current capacity, the first conductive hole 231 may be of another structure. For example, in some embodiments of this application, as shown in
For example, as shown in (a) in
For example, as shown in (b) in
As shown in
The four first power pads 222a in the pad unit 22a may alternatively be arranged in another manner. As shown in
In addition, still refer to
The foregoing schematically describes three first conductive holes 231 of different shapes, to meet circuit design requirements of different chips 12. Certainly, the first conductive hole 231 may alternatively be in a triangle, a trapezoid, an ellipse, a square, or another irregular shape. Therefore, circuit design requirements of more chips 12 can be met.
A depth for disposing the first conductive hole 231 varies according to circuit routing requirements of different circuit boards. As shown in
The first conductive hole 231 may meet a large through-current requirement of the circuit board 2 having two or more adjacent power pads 222. As shown in
Similarly, because a length of the second conductive hole 232 is long, when the second conductive hole 232 is manufactured, a large-area connection hole may be disposed on the first surface 20a of the circuit board 2. The large-area connection hole has small resistance to an electroplating solution. This helps entering of the electroplating solution, so that the electroplating solution can have a full reaction with a seed layer in the connection hole. In this way, a thick conductive layer is formed in the connection hole, and the conductive layer may have a high through-current capability. Therefore, the through-current capability of the circuit board 2 may be further improved.
A structure of the second conductive hole 232 may be similar to a structure of some first conductive holes 231. For example, as shown in
Similarly, according to a requirement for a different through-current capability of the circuit board 2, a second conductive layer 2322 with a proper thickness is selected and manufactured to meet the through-current requirement. In addition, a second conductive hole 232 with a proper depth is selected according to a different routing requirement of the circuit board 2. The second conductive hole 232 may be a through hole. It is convenient to dispose the second conductive hole 232, which is applicable to an application scenario in which large routing space is not required. The second conductive hole 232 may alternatively be a blind hole. The second conductive hole 232 of the blind hole structure may increase wiring space on a partial subboard that is not penetrated. However, a depth of the second conductive hole 232 needs to be at least greater than a routing layer from the first surface 20a to the power subboard 21b. In this way, it is ensured that the second conductive hole 232 may be electrically connected to the metal routing layer 212 of the power subboard 21b.
Based on the structure of the foregoing circuit board, an embodiment of this application further includes a manufacturing method for the foregoing circuit board. As shown in
S100: Form a first conductive hole 231 on a first surface 20a of the circuit board 2.
For example, in (a) in
S200: Form at least two first power pads 222a on the first conductive hole 231.
For example, in (b) in
The foregoing the manufacturing method for the circuit board may implement manufacturing of the circuit board in the foregoing embodiment, and both can resolve the same technical problem. Details are not described herein again.
In some embodiments, as shown in
S101a: Dispose a first connection hole 2311 on the first surface 20a of the circuit board 2.
For example, as shown in (a) in
S102a: Manufacture a first conductive layer 2312 in the first connection hole 2311.
For example, as shown in (b) in
S103a: Fill a first filling medium 2313 in the first connection hole 2311 having the first conductive layer 2312.
For example, as shown in (c) in
Based on the structure of the first conductive layer 2312 in the first conductive hole 231 shown in (b) in
S1021a: Form, in an entire hole wall of the first connection hole 2311 in an electroless plating manner, a first conductive layer 2312 whose thickness is less than a preset thickness.
For example, as shown in (a) in
S1022a: Remove a first conductive layer 2312 in a partial region in the first connection hole 2311, to form a plurality of first conductive layers 2312 that are spaced.
For example, as shown in (b) in
S1023a: Increase thickness of the plurality of first conductive layers 2312 of the first connection hole 2311 to the preset thickness in an electroplating manner.
For example, as shown in (c) in
S1021b: Cover a partial region in the first connection hole 2311 with a dry film 3.
For example, as shown in (a) in
S1022b: Form, in the first connection hole 2311 by using an electroless plating process, a first conductive layer 2312 whose thickness is less than a preset thickness.
For example, as shown in (b) in
S1023b: Remove the dry film in the first connection hole 2311, to obtain a plurality of first conductive layers 2312 that are spaced.
For example, as shown in (c) in
S1024b: Increase thickness of the plurality of first conductive layers 2312 in the first connection hole 2311 to the preset thickness by using an electroplating process.
For example, as shown in (d) in
In some other embodiments of this application, as shown in
S101b: Dispose a first connection hole 2311 on the first surface 20a of the circuit board 2.
For example, as shown in (a) in
S102b: Form a seed layer 230a of a conductive medium 230 in the first connection hole 2311 by using an electroless plating process.
For example, as shown in (b) in
S103b: Increase a thickness of the seed layer 230a in the first connection hole 2311 by using an electroplating process until the entire first connection hole 2311 is fully filled, to obtain a first conductive hole 231.
For example, as shown in (c) in
The first conductive holes 231 of different depths may be completed by using different processing procedures in the manufacturing process of the circuit board 2. For example, if the first conductive hole 231 is a through hole, for a circuit board 2 having a plurality of layers of subboards 21, the first conductive hole 231 may be directly disposed on the plurality of layers of subboards 21 that are laminated. If the first conductive hole 231 is a blind hole, for circuit boards 2 of different structures, the first conductive hole 231 may be completed in different processing procedures in manufacturing processes of the circuit boards 2.
For example, the circuit board 2 includes two or more laminated board units 201 disposed in a laminated manner. Any laminated board unit 201 includes a plurality of layers of subboards 21 that are disposed in a laminated manner. One or more laminated board units 201 in the circuit board 2 are first laminated board units 201a having power subboards 21b for power supply. One subboard 21 in the first laminated board unit 201a is a power subboard 21b. The first surface 20a is an outer surface, far away from the power subboard 21b, on the first laminated board unit 201a. After the step of manufacturing the two or more than two laminated board units 201 of the circuit board 2 is completed, refer to
S1011: Form a first conductive hole 231 electrically connected to the power subboard 21b on the first surface 20a of the first laminated board unit 201a.
For example, as shown in (a) in
S1012: Laminate the first laminated board unit 201a and another laminated board unit 201.
For example, the circuit board 2 includes two or more laminated board units 201 shown in (b) and (c) in
In some other embodiments of this application, the first conductive hole 231 of the blind hole structure shown in (c) in
In addition, in some embodiments of this application, as shown in
S300: Form a second conductive hole 232 on the first surface 20a of the circuit board 2.
For example, as shown in (a) in
S400: Form a second power pad 222b on the second conductive hole 232.
For example, as shown in (b) in
In addition, the step of forming the strip-shaped second conductive hole 232 on the first surface 20a of the circuit board 2 may be similar to the step of forming the first conductive hole 231 on the first surface 20a of the circuit board 2. A strip-shaped second connection hole 2321 may be disposed on the circuit board 2 by using a drilling machine or a numerical control machine tool. Then, a second conductive layer 2322 is formed by using an electroless plating process, an electroplating process, or the like. Finally, a second filling medium 2323 is formed in the second connection hole 2321 having the second conductive layer 2322. In this way, the second conductive hole 232 is obtained.
The foregoing descriptions are merely implementations of this application, but are not intended to limit the protection scope of this application. Any variation or replacement readily figured out by a person skilled in the art within the technical scope disclosed in this application shall fall within the protection scope of this application. Therefore, the protection scope of this application shall be subject to the protection scope of the claims.
Number | Date | Country | Kind |
---|---|---|---|
202210454822.1 | Apr 2022 | CN | national |
This application is a continuation of International Application No. PCT/CN2023/073912, filed on Jan. 31, 2023, which claims priority to Chinese Patent Application No. 202210454822.1, filed on Apr. 24, 2022. The disclosures of the aforementioned applications are hereby incorporated by reference in their entireties.
Number | Date | Country | |
---|---|---|---|
Parent | PCT/CN2023/073912 | Jan 2023 | WO |
Child | 18773591 | US |