Electroplating apparatus

Information

  • Patent Grant
  • 6274010
  • Patent Number
    6,274,010
  • Date Filed
    Monday, July 13, 1998
    26 years ago
  • Date Issued
    Tuesday, August 14, 2001
    23 years ago
Abstract
An apparatus for electroplating at least one substrate is disclosed as including a trough, two anodes, at least one bath and two poly-tetrafluoroethylene sheets or a number of substantially rigid polypropylene plates, in which the trough supports the substrate and is in an electrically conductive relationship therewith, and the bath contains the anodes, the trough and an electrolyte, in which, in operation, an electric field exists in the electrolyte between the trough and the anodes, and in which the poly-tetrafluoroethylene sheets or the polypropylene plates are movable to vary the amount of electric current passing between the trough and the anodes.
Description




This invention relates to an electroplating apparatus and is, in particular, concerned with such an apparatus with improvements in the uniform distribution of metal on substrates to be electroplated, e.g. printed circuit boards.




BACKGROUND OF THE INVENTION




U.S. Pat. No. 4,879,007 discloses a floating shield for use in an electrolytic bath. The shield includes an elongated trough in which substrates are loaded for plating. The substrates are held in the trough in a vertical plane, and with the lower edges of the substrates below the plane of the upper edges of the trough. Immersed into the bath are a pair of anodes, each extending parallel to the longitudinal axis of the floating shield. The substrates loaded in the trough are connected to a cathode bus bar by one or more clamps. In operation, electric current passes between the anodes and the cathode bus bar through electrolyte contained in the bath, and thereby to electroplate the substrates.




When a plating factory orders an electroplating apparatus from a manufacturer, it is necessary to specify the “board size” of the substrates intended to be plated by the apparatus. In this connection, “board size” means the vertical length of the substrate when such is held in a vertical plane. It is also a usual practice in the relevant field to so arrange the depth of the floating shield in the bath that the top edge of the substrates is of a fixed distance from the top edge of the bath. The manufacturer will then arrange the dimensions of the bath, the anodes and the depth of the trough in the bath such that there will be a satisfactory and uniform electroplating result. It is found in practice that if substrates of a board size shorter than the intended board size are electroplated in the bath, the lower edges of the substrates will be “over-plated”. This is known as “edging effect” and means that the metal deposited on or around the lower edges of the substrates is thicker than that deposited in the rest of the substrates.




While it is possible to reduce this “edging effect” by changing the anodes used in each electroplating task, as there may be over forty anodes in a single tank, and they are very heavy, it is very difficult and not practical to replace anodes.




It is therefore an object of the present invention to provide an improved electroplating apparatus in which the aforesaid shortcoming is mitigated, or at least to provide a useful alternative to the trade.




SUMMARY OF THE INVENTION




According to the present invention, there is provided an apparatus for electroplating at least one substrate, comprising support means, anode means, at least one container and blocking means, wherein said support means supports said substrate and is in an electrically conductive relationship therewith, wherein said container contains said anode means, said support means and an electrolyte, wherein in operation, an electric field exists in said electrolyte between said support means and said anode means, and wherein said blocking means is movable to vary the amount of electric current passing between said support means and said anode means.




Advantageously, said blocking means may be movable by said support means.




Conveniently, said blocking means may be movable to vary the amount of electric current passing between a bottom part of said support means and said anode means.




Suitably, said blocking means may be made substantially of an electrically insulating material.




Said insulating material may advantageously be poly-tetrafluoroethylene.




Said blocking means may conveniently comprise a plurality of sheet members.




Said sheet members may suitably be movable away from each other.




Advantageously, said blocking means may be elastic.




Conveniently, said blocking means may comprise a plurality of substantially rigid blocking members.




Suitably, said apparatus may comprise at least two plates to each of which at least one blocking member is hingedly engaged.




Said blocking members may advantageously be pivotally movable relative to the plate to which it is hingedly engaged.




Said blocking members may conveniently be made substantially of polypropylene.











BRIEF DESCRIPTION OF THE DRAWINGS




The present invention will now be described by way of an example and with reference to the accompanying drawings, in which:





FIG. 1

is a schematic diagram showing a first embodiment of an electroplating apparatus according to the present invention in which the trough is loaded with a substrate of a vertical length of 18 inches;





FIG. 2

is a side view of a polypropylene diaphragm used in the present invention;





FIG. 3

is a schematic diagram of the electroplating apparatus shown in

FIG. 1

in which the trough is loaded with a substrate of a vertical length of 21 inches;





FIG. 4

is a schematic diagram of the electroplating apparatus shown in

FIG. 1

in which the trough is loaded with a substrate of a vertical length of 24 inches;





FIG. 5

is a schematic diagram showing a second embodiment of an electroplating apparatus according to the present invention in which the trough is loaded with a substrate of a vertical length of 18 inches;





FIG. 6

is a schematic diagram of the electroplating apparatus shown in

FIG. 5

in which the trough is loaded with a substrate of a vertical length of 21 inches;





FIG. 7

is a schematic diagram of the electroplating apparatus shown in

FIG. 5

in which the trough is loaded with a substrate of a vertical length of 24 inches;





FIGS. 8A and 8B

are respectively a side view and an end view of a side plate used in the electroplating apparatus shown in

FIG. 5

;





FIGS. 9A and 9B

are respectively a side view and an end view of a blocking plate used in the electroplating apparatus shown in

FIG. 5

; and





FIG. 10

is a perspective view showing the engagement between the side plate and the blocking plates in the electroplating apparatus shown in FIG.


5


.











DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS




As shown in

FIG. 1

, a first embodiment of an electroplating apparatus according to the present invention is designated generally as


10


. The electroplating apparatus


10


includes a bath


12


for containing an electrolyte which, for clarity purposes, is not shown in any of these drawings. Depending from an upper edge


14


of the bath


12


are two rows of anodes


16


, of which only two are shown here. Within the bath


12


is a trough


18


, which may be lowered into the bath


12


or raised therefrom. The trough


18


includes a number of receiving plates


20


, only one of which is shown here. Each receiving plate


20


includes a V-shaped notch in which an lower edge


22


of a substrate


24


to be plated, e.g. a printed circuit board, may be received, so that the substrate


24


is held in a substantially vertical plane. In

FIG. 1

, the vertical length of the substrate


24


is 18 inches. On either side of the trough


18


is an electrically insulating polypropylene diaphragm


26


, details of which are shown in FIG.


2


and to be discussed below.




Attached to each of the polypropylene diaphragms


26


is an elastic and electrically insulating poly-tetrafluoroethylene sheet


28


which extends across the length of the bath


12


. The poly-tetrafluoroethylene


28


sheets assume a generally horizontal configuration in the bath


12


. The poly-tetrafluoroethylene sheets


28


are of a thickness of about 0.5mm.




The trough


18


includes two side boards


30


which, when substrates


24


of a vertical length of 18 inches are loaded into the receiving plates


20


, just contact and bear on the upper surface of the poly-tetrafluoroethylene sheets


28


.




Turning to

FIG. 2

, a polypropylene diaphragm


26


is shown as including an outer impermeable electrically insulating polypropylene frame


32


, with a perforated cloth


34


made of electrically insulating polypropylene mesh material stretched across the inner open area. In this figure, for clarity purposes, only some areas (the five circular areas) of the cloth


34


are shown as perforated. It should however be understood that the whole cloth


34


is perforated. It is apparent that, with such an arrangement, while an electric field can exist across the perforated cloth


34


, no electric field can exist across the polypropylene frame


32


. The polypropylene diaphragm


26


effectively divides the bath


12


into a central “cathode compartment” and two outer “anode compartments”. The holes in the perforated cloth


34


are so sized as to prevent particles such as anode sludge from passing into the central “cathode compartment”, while allowing free movement of the electrolyte therethrough.




As can be seen in

FIG. 1

, although an electric field (as denoted by the hashed lines) can exist across the polypropylene diaphragm


26


, no electric current can pass from under the bottom part


36


of the trough


18


since such is blocked by the poly-tetrafluoroethylene sheets


28


and/or the polypropylene frame


32


. Since the amount of electric current reaching the lower end of the substrate


24


is reduced, less metal will be deposited in this area, thus reducing the “edging effect”.




Turning to

FIG. 3

, the same electroplating apparatus


10


according to the present invention is shown. The substrate


24


received by the receiving plate


20


of the trough


18


is now of a vertical length of 21 inches. It can be seen that while some electric current passes between the anodes


16


and the lower part of the substrate


24


, part of the current is blocked by the impermeable electrically insulating polypropylene frame


32


of the polypropylene diaphragm


26


. It can also be seen that when the trough


18


is lowered into the bath


12


, the side plates


30


push the poly-tetrafluoroethylene sheets


28


away from each other. Due to their elasticity, when the trough


18


is raised from the bath


12


, e.g. after plating, the poly-tetrafluoroethylene sheets


28


will resume their position as shown in FIG.


1


. As shown in

FIG. 3

, the side boards


30


are in contact with the poly-tetrafluoroethylene sheets


28


, so that there are no gaps between the side boards


30


and the poly-tetrafluoroethylene sheets


28


through which electric current can pass through. However, as compared with the situation in

FIG. 1

, more electricity passes between the anodes


16


and the lower part of the substrate


24


.




As to

FIG. 4

, again, the same electroplating apparatus


10


according to the present invention is shown. The substrate


24


received by the receiving plate


20


of the trough


18


is now of a vertical length of 24 inches. It can be seen that the trough


18


is much nearer to the bottom of the bath


12


. As the trough


18


is lowered further towards the bottom of the bath


12


, two rows of fingers


38


(only two are shown here for clarity purposes) of the trough


18


push the poly-tetrafluoroethylene sheets


28


further away from each other, so that gaps exist between the side boards


30


and the poly-tetrafluoroethylene sheets


28


. As shown clearly in

FIG. 4

, more electric current can pass between the anodes


16


and bottom part


36


of the trough


18


.




A second embodiment of an electroplating apparatus is shown in

FIG. 5

as generally designated as


100


. The structure of the electroplating apparatus


100


is essentially the same as that in the electroplating apparatus


10


shown in

FIGS. 1

to


4


, except that the elastic poly-tetrafluoroethylene sheets


28


are replaced by a number of rigid electrically insulating blocking plates


102


which are made of polypropylene, the structure of which will be discussed below.




As shown in

FIGS. 5

to


7


, the blocking plates


102


operate in essentially the same way as the elastic poly-tetrafluoroethylene sheets


28


, and can be pushed away from each other when a trough


104


is immersed downward. The density of the blocking plates


102


is such that they will float and assume the position as shown in

FIG. 5

in the electrolyte unless they are acted upon by the trough


104


.





FIGS. 8A and 8B

show a side plate


106


with which the blocking plates


102


may be engaged. The side plate


106


includes a back plate


108


fixed with four rods


110


. The side plate


106


includes four holes


112


for enhancing securing thereof to the apparatus


100


.

FIGS. 9A and 9B

show the blocking plate


102


as also including a rod


114


. As shown in

FIG. 10

, the rod


114


of each of the blocking plates


102


may be engaged with one of the rods


110


so as to enable the blocking plates


102


to pivot relative to the side plate


106


when acted upon by the trough


104


.




From the foregoing discussion, it can be clearly seen that the performance of an electroplating apparatus according to the present invention is versatile and flexible, and can provide satisfactory plating performance of substrates over a wide range of board sizes.




It should, however, be noted that the above only describes an embodiment whereby the present invention may be carried out, and modifications and alterations may be made thereto without departing from the spirit of the present invention.



Claims
  • 1. An apparatus for electroplating at least one substrate, comprising at least one anode member, at least one blocking member, at least one container, and means adapted to support said substrate in said container and adapted to be in an electrically conductive relationship with said substrate, wherein said container contains said at least one anode member, said support means and said at least one blocking member, and said container is adapted to contain an electrolyte, wherein in operation, an electric field exists in said electrolyte between said support means and said at least one anode member, wherein said blocking member is movable by said support means to vary the amount of electric current passing between said support means and said at least one anode member, and wherein said blocking member is positionable between said support means and said at least one anode member and movable between a first position in which it is substantially horizontal, and a second position in which it extends generally downwardly.
  • 2. An apparatus according to claim 1, wherein each or said blocking member is made of an electrically insulating material.
  • 3. An apparatus according to claim 2, wherein said blocking member is made predominantly of poly-tetrafluoroethylene.
  • 4. An apparatus according to claim 1, wherein each or said blocking member is elastic.
  • 5. An apparatus according to claim 1, further including a plurality of blocking members.
Priority Claims (2)
Number Date Country Kind
9721245 Oct 1997 GB
9810764 May 1998 GB
Parent Case Info

This application is a continuation-in-part of Ser. No. 998,368, filed Dec. 24, 1997, and now abandoned.

US Referenced Citations (8)
Number Name Date Kind
4879007 Wong Nov 1989
4964964 Murphy Oct 1990
4988426 Metzka Jan 1991
5391276 Astor et al. Feb 1995
5401370 Kauper et al. Mar 1995
5589051 Henington Dec 1996
5744013 Botts et al. Apr 1998
5776327 Botts et al. Jul 1998
Foreign Referenced Citations (4)
Number Date Country
3726571 C1 Mar 1989 DE
4005209 A1 Aug 1991 DE
0 666 343 A1 Aug 1995 EP
712505 Oct 1931 FR
Continuation in Parts (1)
Number Date Country
Parent 08/998368 Dec 1997 US
Child 09/114122 US