Number | Name | Date | Kind |
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5614990 | Bruce et al. | Mar 1997 |
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George, et al., A Practical and Precise Method for Mask Defect Size Measurement, Mar. 10, 1996, Proceedings of the SPIE Conference on Photo-lithography. |
Stocker, et al., Characterisation of Defect Sizing On An Automatic Inspection Station (KLA238e), 1993, SPIE vol. 2087 Photomask Technology and Management. |
Kawahira, et al., SEMI Standards Programmed Defect Masks and Its Applications for Defect Inspection, SEMI Japan Standards Committee. |
Peter J. Fiekowsky, Quotation (Preliminary), Oct. 17, 1994. |