Claims
- 1. A planetary rotation process for forming a thin film coating on a workpiece, comprising rotating the workpiece about a main axis past spaced deposition and reaction devices to separately deposit a selected material and chemically react the deposited material, while simultaneously rotating the substrate about a planetary axis, the ratio of the rotation speed about the planetary axis to that about the main axis being.ltoreq.1:1.
- 2. The process of claim 1, wherein the rotation speed ratio is within the range 1:10 to 1:2.
- 3. The process of claim 1, wherein the rotation speed ratio is within the range 1:4 to 1:3.
- 4. The process of claim 1 or 2, wherein at least two deposition devices are used, a first layer is formed by operating the first deposition device and rotating the substrate about the main axis in a selected direction to traverse the shorter distance between the first deposition device and the reaction device, then a second layer is formed by operating the second deposition device and rotating the substrate in the opposite direction to traverse the shorter distance between the second deposition device and the reaction device.
- 5. The process of claim 4, wherein the rotation speed ratio is within the range 1:4 to 1:3.
- 6. The process of claim 5, wherein the two deposition devices are located 60.degree.-120.degree. on opposite sides of the reaction device.
- 7. The process of claim 5, wherein the two deposition devices are located 90.degree. on either side of the reaction device.
- 8. In the process of operating a planetary workpiece support system of the type having at least one workpiece support shaft driven by a main drive shaft with double rotation past a peripheral process station, the improvement comprising: rotatably supporting the workpiece drive shafts at the periphery of disc means; driving the disc means directly by the main drive shaft; and rotating the workpiece drive shaft by a gear rotatably mounted on the main drive shaft and driven by planetary gear means driven by the main drive shaft.
- 9. A system for forming a thin film coating on a workpiece, comprising: a deposition device; a reaction device; and means rotating a workpiece about a main axis past the deposition and reaction devices to separately deposit a selected material and chemically react the deposited material and simultaneously rotating the substrate about a planetary axis at a rotation speed such that the ratio of the rotation speed about the planetary axis to that about the main axis is.ltoreq.1:1.
- 10. The system of claim 9, wherein the rotating means is adapted to provide a rotation speed ratio within the range 1:10 to 1:2.
- 11. The system of claim 9, wherein the rotating means is adapted to provide a rotation speed ratio within the range 1:4 to 1:3.
- 12. The system of claim 9, 10 or 11, the rotating means comprising: a main drive shaft; at least one workpiece support shaft; disc means mounted on and driven directly by the main drive shaft; the workpiece support shaft being mounted for rotation at the periphery of the disc means; and a gear rotatably mounted on the main drive shaft and drivingly coupled to the workpiece support shaft for driving the workpiece support shaft, said gear being driven by planetary gear means driven by the main drive shaft.
- 13. The system of claim 9, 10 or 11, the rotating means comprising a primary or sun drive shaft and at least one planetary workpiece support driven by the primary drive with double rotary motion past circumferential processing stations, wherein the system comprises gears A through G arranged to provide a planetary support rotational speed which is slower than the main drive shaft rotational speed according to the relationship
- w.sub.S =w.sub.D *(1-AC/BD)(EG/FH),
- where w.sub.S is the rotational speed of the planetary support, w.sub.D is the rotational speed of the primary drive, and A through H are the number of gear teeth of the like designated gears.
- 14. The system of claim 13, wherein gears A and J are mounted at spaced locations on and are driven directly by the main drive shaft; gears D and E are coupled together and mounted for free rotation on the main drive shaft between A and J, with D and E adjacent A and J, respectively; B and C are planetary gears coupled together for free rotation on a shaft and meshing, respectively, with A and D; and further including planetary substrate rotation means comprising at least one elongated substrate support drive shaft rotatably journalled at the periphery of gear or plate J, said substrate support drive shaft mounting gear F on one side of plate J meshing with gear E and mounting gear G on the other side of plate J, and gear H adapted for and supporting at least one workpiece, said gear H being rotatably captured to the substrate support shaft and meshing with substrate rotating gear G.
CROSS-REFERENCE TO RELATED APPLICATIONS
This is a continuation-in-part of commonly assigned U.S patent application Ser. No. 604,362, filed Oct. 26, 1990, now abandoned, which is a continuation of commonly assigned U.S. patent application Ser. No. 490,535, filed Mar. 5, 1990, now abandoned, which is a continuation of commonly assigned U.S. patent application Ser. No. 374,484, filed Jun. 30, 1989, now abandoned, which is a continuation of commonly assigned U.S. Pat. No. 4,851,095, entitled MAGNETRON SPUTTERING APPARATUS AND PROCESS, issued Jul. 25, 1989, to inventors Scobey, Seddon, Seeser, Austin, LeFebvre, and Manley from application Ser. No. 154,177 filed Feb. 8, 1988.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3562140 |
Skinner et al. |
Feb 1971 |
|
4798663 |
Herklotz et al. |
Jan 1989 |
|
4851095 |
Scobey et al. |
Jul 1989 |
|
Continuations (3)
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Number |
Date |
Country |
Parent |
490535 |
Mar 1990 |
|
Parent |
374484 |
Jun 1989 |
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Parent |
154177 |
Feb 1988 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
604362 |
Oct 1990 |
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