This application is a continuation of application Ser. No. 09/840,291 filed Apr. 24, 2001, now U.S. Pat. No. 6,623,895 which is a CIP of 09/562,443 filed May 1, 2000 now abandonded.
Number | Name | Date | Kind |
---|---|---|---|
4902899 | Lin et al. | Feb 1990 | A |
5229255 | White | Jul 1993 | A |
5242770 | Chen et al. | Sep 1993 | A |
5256505 | Chen et al. | Oct 1993 | A |
5288569 | Lin | Feb 1994 | A |
5302477 | Dao et al. | Apr 1994 | A |
5324600 | Jinbo et al. | Jun 1994 | A |
5348826 | Dao et al. | Sep 1994 | A |
5354632 | Dao et al. | Oct 1994 | A |
5362584 | Brock et al. | Nov 1994 | A |
5362591 | Imai et al. | Nov 1994 | A |
5384219 | Dao et al. | Jan 1995 | A |
5424154 | Borodovsky | Jun 1995 | A |
5436095 | Mizuno et al. | Jul 1995 | A |
5447810 | Chen et al. | Sep 1995 | A |
5538815 | Oi et al. | Jul 1996 | A |
5605775 | Watanabe | Feb 1997 | A |
5618643 | Dao et al. | Apr 1997 | A |
5633102 | Toh et al. | May 1997 | A |
5663893 | Wampler et al. | Sep 1997 | A |
5707765 | Chen | Jan 1998 | A |
5723233 | Garza et al. | Mar 1998 | A |
5795685 | Liebmann et al. | Aug 1998 | A |
5807649 | Liebmann et al. | Sep 1998 | A |
5821014 | Chen et al. | Oct 1998 | A |
5827623 | Ishida et al. | Oct 1998 | A |
5858580 | Wang et al. | Jan 1999 | A |
5882827 | Nakao | Mar 1999 | A |
6114071 | Chen et al. | Sep 2000 | A |
6210841 | Lin et al. | Apr 2001 | B1 |
6258493 | Wang et al. | Jul 2001 | B1 |
6458495 | Tsai et al. | Oct 2002 | B1 |
Number | Date | Country |
---|---|---|
0 620 498 | Oct 1994 | EP |
1 122 603 | Aug 2001 | EP |
11223930 | Aug 1999 | JP |
9947981 | Sep 1999 | WO |
Entry |
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Fourmun Lee and Tom Zirkle, “Process for Hybrid Phase-Shifting Mask Fabrication,” Mar. 1, 1993, pp. 1-2. |
Toh, et al., “Optical Lithography with Chromeless Phase-Shifted Masks”, SPIE vol. 1463, pp. 74-86. |
Levenson, et al., “SCAA Mask Exposures and Phase Phirst Design for 110nm and Below”, Proc. SPIE vol. 4346, pp. 817-826. |
Watanabe, et al., “Sub-quarter-Micron Gate Pattern Fabrication Using a Transparent Phase Shifting Mask”, J. Vac. Sci, Technol, B, vol. 9, No. 6, Nov./Dec. 1991, pp. 3172-3175. |
Watanabe, et al., “Transparent Phase Shifting Mask”, IEDM 90, pp. 33.2.1 to 33.2.4. |
Number | Date | Country | |
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Parent | 09/840291 | Apr 2001 | US |
Child | 10/662365 | US |
Number | Date | Country | |
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Parent | 09/562443 | May 2000 | US |
Child | 09/840291 | US |