This application is a division of and claims the benefit of U.S. application Ser. No. 08/599,270, filed Feb. 9, 1996 now U.S. Pat. No. 6,121,163. This application is also related to U.S. application Ser. No. 09/608,786, filed Jun. 30, 2000. Both the 08/599,270 and 09/608,786 applications are hereby incorporated by reference in their entirety. This application is related to concurrently filed patent application entitled “METHOD AND APPARATUS FOR REDUCING PARTICLE CONTAMINATION IN A SUBSTRATE PROCESSING CHAMBER”, having Anand Gupta listed as the sole inventor; and concurrently filed patent application entitled “METHOD AND APPARATUS FOR REDUCING PARTICLE GENERATION BY LIMITING DC BIAS SPIKE”, having Anand Gupta, Stefan Wolfe and Maria Galiano listed as co-inventors. Each of the above referenced applications are assigned to Applied Materials Inc, the assignee of the present invention, and each of the above referenced applications are hereby incorporated by reference.
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5441596 | Nulty | Aug 1995 | |
5456796 | Gupta et al. | Oct 1995 | |
5563105 | Dobuzinsky et al. | Oct 1996 | |
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5811323 | Miyasaka et al. | Sep 1998 |
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4128779 | Aug 1991 | DE |
0425419 | Feb 1991 | EP |
0453780 | Oct 1991 | EP |
60-42831 | Aug 1983 | JP |
61-196538 | Feb 1985 | JP |
63-1035 | Jun 1986 | JP |
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