Patent Application
20050008864
1. Field of the Invention
The present invention relates to a method for coating a substrate for EUV lithography and a device manufacturing method.
The present invention is also related to a substrate with photoresist layer.
2. Description of the Related Art
In a lithographic apparatus the size of features that can be imaged onto the substrate is limited by the wavelength of the projection radiation. To produce integrated circuits with a higher density of devices, and hence higher operating speeds, it is desirable to be able to image smaller features. While most current lithographic projection apparatus employ ultraviolet light generated by mercury lamps or excimer lasers, it has been proposed to use shorter wavelength radiation, e.g. of around 13 nm. Such radiation is termed extreme ultraviolet (EUV) or soft x-ray, and possible sources include, for example, laser-produced plasma sources, discharge plasma sources, or synchrotron radiation from electron storage rings.
When using EUV lithography, other requirements are imposed on the process conditions, apparatus and lithography methods, when compared to ultraviolet (UV e.g. 365 nm) or deep ultra violet (DUV e.g. 248 or 193 nm) lithography. Due to high absorption at EUV wavelengths a vacuum environment is required.
With respect to the use of photoresists, in the art a protective coating is disclosed. U.S. Pat. No. 5,240,812 describes a method in which a substrate is coated with an acid catalysed resist, and wherein on the photoresist layer a second polymeric coating is provided. According to U.S. Pat. No. 5,240,812 such coatings can be used for V, and also e-beam and x-ray radiation. The coating is impermeable to vapours of organic and inorganic bases. Van Ingen Schenau et al. (Olin Microlithography seminar, Oct. 27-29, 1996, San Diego Calif.) describe a top coat on a resist (for DUV application). The top coat is used to protect the photoresist against airborne contaminations.
A disadvantage is that commercially available top coats like Aquatar (from Clariant), which might be applied in EUV lithography, are on water basis. This may lead to unwanted absorption by EUV light by water. It may also lead to an undesired outgassing of water, which may also result in unwanted absorption of EUV radiation by water and/or degradation of mirror optics used in EUV lithographic systems. In this way, less reproducible lithographic results might be obtained.
It is an aspect of the present invention to provide a non-aqueous based top coat on a photoresist layer for EUV lithography that is EUV transmissive and protects against contaminations.
According to the present invention, there is provided a method for coating a substrate for EUV lithography including coating a photoresist layer on the substrate by providing an EUV transmissive top coat on the photoresist layer, wherein the EUV transmissive top coat comprises a polymer that includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum.
There is also provided a device manufacturing method including providing a substrate that is at least partially covered by a photoresist layer by coating the photoresist layer on the substrate; projecting a patterned beam of radiation onto a target portion of the photoresist layer and providing an EUV transmissive top coat on the photoresist layer, wherein the EUV transmissive top coat comprises a polymer that includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum.
Such an EUV transmissive top coat on the photoresist layer protects the photoresist layer against contaminations that might be present in the atmosphere over the substrate. It further diminishes outgassing of contaminants such as hydrocarbons and other compounds, such compounds including atoms selected from the group consisting of F, Si, P, S and Cl, originating from the photoresist and, if present, water from the photoresist. Such outgassing might harm, for example, mirror optics.
The EUV transmissive top coat according to the invention is substantially transmissive for EUV radiation, but may substantially be non-transmissive or only slightly transmissive for undesired radiation, e.g. UV or DUV radiation. This leads to an increased spectral selectivity, which may reduce the number of spectral filters present in a lithographic system. Further, the EUV transmissive top coat can dissipate and conduct possible charge due to a relatively high conductance of the coat and thus, the top coat can be used as charge dissipating or conducting layer.
In one embodiment, the invention includes a method wherein the EUV transmissive top coat includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum. Coatings including these elements may function as a spectral filter, being more transmissive for EUV radiation than for (D)UV radiation. For example, the transmission of a 10 nm Si layer for EUV (e.g. 13.5 nm) is about 98% and for DUV (e.g. 193 nm) only about 20%. This means that an EUV transmissive top coat according to the invention may make spectral purity filters less necessary or may permit a decrease in the number of spectral purity filters or other wavelength selective optics in EUV optical systems, like a lithographic apparatus.
In another embodiment, the invention includes a method wherein the top coat includes a polymer. For example, this can be a method wherein the polymer has a molecular weight of 500-15000 g/mol, e.g. 1000-10000 g/mol. The polymer can include groups with one or more of the following atoms: beryllium, boron, silicon, zirconium, niobium and molybdenum.
In a further embodiment, the invention includes a method wherein the polymers are based on Si, C and H, e.g. wherein the top coat includes one or more of the following polymers (or polymer groups): polysilanes (e.g. polydimethylsilane, polymethyhydrosilane), polysilylenes, polysiloxanes, silylated polyhydroxystyrene (PHS), silane containing polymers, silsesquioxane polymers, acryl silane polymers, methacryl silane polymers, and silylated polymers (e.g. Si-containing Novolac).
An example of a possible polymer that can be used as top coat is Si-containing Novolac. Novolac has a high DUV absorption, improving the EUV/DUV selectivity. Polymers, like Novolac, may be sylilated, in order to further improve EUV/DUV selectivity.
In another embodiment, polymers are used including boron, i.e. based on B, C and H, e.g. carborane polyamide, or a polymer that is boron-loaded (e.g. a boron loaded polyimide).
In a further embodiment, the invention includes a method wherein the top coat includes a solvent. In a specific embodiment, the solvent of the top coat is a solvent that is also used as solvent for coating the photoresist on the substrate (i.e. the same solvent is used for the photoresist layer as well for the EUV transmissive top coat).
Hence, in a specific embodiment the top coat might e.g. include a combination of a) one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum, b) a solvent (e.g. a photoresist solvent) and c) a polymer. In a further aspect of this embodiment, the polymer in the EUV transmissive top coat includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum, and wherein the polymer in the EUV transmissive top coat including carbon, also includes one of the other mentioned atoms. Such top coats can be applied on the surface of the photoresist layer, e.g. by spin coating. Hence, in another specific embodiment the top coat might e.g. include a) a polymer including a group with one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and b) a solvent (e.g. a photoresist solvent).
The method according to the invention for coating a substrate for EUV lithography may include: preparing a surface of a substrate, e.g. including cleaning and drying; coating a photoresist layer on the surface of the substrate, e.g. including spin coating a photoresist layer on the surface of the substrate; heating the substrate during softbake, wherein a partial evaporation of the photoresist solvents take place by heating; cooling the substrate during “chilling”; providing an EUV transmissive top coat on the surface of the photoresist layer, e.g. including spin coating an EUV transmissive top coat on the surface of the photoresist layer. Alternatively, in another embodiment, an EUV transmissive top coat is applied on the photoresist layer, immediately after the coating of the photoresist layer.
In another embodiment, the EUV transmissive top coat is provided on the surface of the photoresist layer by chemical vapor deposition (CVD). In this way, an EUV transmissive top coat is created, including one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum. Such top coats can e.g. be based on Si, C and H; or B, C and H, or a combination thereof.
In another embodiment, a polymer and one or more of beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum, are coated as top coat by CVD. In this way, a polymer top coat is provided including one or more of beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum components. In a further aspect of this embodiment, the polymer in the EUV transmissive top coat, provided by CVD, includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum, and wherein the polymer in the EUV transmissive top coat including carbon, also includes one of the other mentioned atoms. In this way, EUV transmissive top coats based on e.g. Si, C and H, or B, C and H, can be obtained by CVD.
The embodiments of the invention may provide EUV transmissive top coats, wherein the top coat has a final thickness such that the transmission of EUV radiation is higher than 50%, preferably more than 80%. In a further embodiment, the invention provides a method wherein the top coat has a transmission for DUV and UV radiation of less than 50%. The top coat may have a final thickness of 20-100 nm, preferably 30-80 nm.
In another aspect of the invention, the invention is also directed to a coat for use as top coat on a photoresist layer, wherein the coat includes a polymer including a group with one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum, and wherein the coat enables at least on of a) a diminishing of outgassing of a contaminant from the photoresist layer and b) preventing contamination of the photoresist. Such a coat can be used as top coat on a photoresist layer and provides thereby a contaminant barrier function. This contaminant barrier may diminish or prevent outgassing of compounds from the photoresist, e.g. in a lithographic apparatus. Such compounds (contaminants) are for example compounds selected from water, hydrocarbons and compounds including at least one atom selected from the group consisting of F, Si, P, S and Cl. However, the barrier does not only diminish or prevent diffusion of contaminants from the photoresist through the top coat (protection of e.g. optics in a lithographic apparatus), it also may reduce or prevent contamination of the photoresist (protection of the photoresist). Preferably, the contaminant barrier leads to a substantial reduction in diffusion of contaminants through the top coat in either direction, e.g. a diminishing in outgassing of at least 50%, or e.g. 80%.
The invention is also directed to a coat that includes one or more of the following polymers: polysilanes, polysilylenes, polysiloxanes, silylated polyhydroxystyrene, silane containing polymers, silsesquioxane polymers, acryl silane polymers, methacryl silane polymers and silylated polymers; an embodiment, wherein the coat is EUV transmissive; an embodiment, wherein the coat has a thickness such that the transmission of EUV radiation is higher than 50%; an embodiment, wherein the coat has a transmission for DUV and UV radiation of less than 50%; etc.
The invention is also directed to a substrate with a photoresist layer, wherein the substrate has an EUV transmissive top coat on the photoresist layer, wherein the EUV transmissive top coat comprises a polymer that includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum.
A “substrate” is defined as a wafer, for application in lithographic apparatus. Such substrates (or wafers) are known in the art (substrates or wafers for lithographic use like e.g. 8 or 12 inch wafers).
The photoresist layer will usually include an EUV photoresist. In another aspect, the invention is also related to the use of an EUV transmissive top coat on a photoresist layer, e.g. in EUV lithography. Such EUV transmissive top coat can e.g. be used as protective coating for the resist and/or to prevent contamination of the resist.
According to a further aspect of the invention, there is provided a device which is manufactured using the method of the invention.
In another aspect of the invention, the invention is also directed to a lithographic projection apparatus including: a radiation system for supplying a beam of radiation; a support structure for supporting patterning device, the patterning configured to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; and a substrate for EUV lithography being at least partially covered by a photoresist layer, and an EUV transmissive top coat on the photoresist layer, wherein the EUV transmissive top coat comprises a polymer that includes one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum.
The above described embodiments with respect to the method, coat and substrate with photoresist layer of the invention also relate to the lithographic apparatus of the invention.
Herein, the phrase “a polymer including a group with one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum”, indicates a polymer having at least one of such groups. The polymer may also have more of such groups like e.g. polysilane. Such “group” may include one or more of these atoms. It should be appreciated that such group may also include other atoms, like e.g. a silane group including Si and C. The term “group” in this invention is directed to chemical groups as known to the person skilled in the art like silane or siloxane groups. It may also indicate e.g. a polymer that is loaded with at least one of these atoms (e.g. boron loaded polyimide). In the context of the invention, “a polymer”, “a group”, “an atom”, etc. may also mean combinations of polymers, groups and atoms, respectively.
Although specific reference may be made in this text to the use of a lithographic apparatus in the manufacture of ICs, it should be explicitly understood that the method of the invention is not confined to the use of such an apparatus, but that the method has many other possible applications. For example, it may be employed in the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, liquid-crystal display panels, thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms “reticle” or “die” in this text should be considered as being replaced by the more general terms “mask”, and “target portion”, respectively.
With the term “EUV radiation” in the invention is meant radiation of all types of electromagnetic radiation having a wavelength between about 5-20 nm, e.g. around 13 nm. The term ‘layer’ can also include a number of layers. The term ‘coat’ or ‘coating’ includes the term ‘layer’.
The term “patterning device” as here employed should be broadly interpreted as referring to a device that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate. The term “light valve” can also be used in this context. Generally, the pattern will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit or other device (see below). Examples of such patterning means include a mask. The concept of a mask is well known in lithography, and it includes mask types such as binary, alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types. Placement of such a mask in the radiation beam causes selective transmission (in the case of a transmissive mask) or reflection (in the case of a reflective mask) of the radiation impinging on the mask, according to the pattern on the mask. In the case of a mask, the support will generally be a mask table, which ensures that the mask can be held at a desired position in the incoming radiation beam, and that it can be moved relative to the beam if so desired;
A programmable mirror array is another example of a patterning device. One example of such a device is a matrix-addressable surface having a viscoelastic control layer and a reflective surface. The basic principle behind such an apparatus is that addressed areas of the reflective surface reflect incident light as diffracted light, whereas unaddressed areas reflect incident light as undiffracted light. Using an appropriate filter, the undiffracted light can be filtered out of the reflected beam, leaving only the diffracted light behind. In this manner, the beam becomes patterned according to the addressing pattern of the matrix-addressable surface. An alternative embodiment of a programmable mirror array employs a matrix arrangement of tiny mirrors, each of which can be individually tilted about an axis by applying a suitable localised electric field, or by employing piezoelectric actuators. Once again, the mirrors are matrix-addressable, such that addressed mirrors will reflect an incoming radiation beam in a different direction to unaddressed mirrors. In this manner, the reflected beam is patterned according to the addressing pattern of the matrix-addressable mirrors. The required matrix addressing can be performed using suitable electronics. In both of the situations described hereabove, the patterning device can include one or more programmable mirror arrays. More information on mirror arrays as here referred to can be gleaned, for example, from U.S. Pat. Nos. 5,296,891 and 5,523,193, and PCT patent applications WO 98/38597 and WO 98/33096, which are incorporated herein by reference. In the case of a programmable mirror array, the support may be embodied as a frame or table, for example, which may be fixed or movable as required.
A programmable LCD array is another example of a patterning device. An example of such a construction is given in U.S. Pat. No. 5,229,872, which is incorporated herein by reference. As above, the support in this case may be embodied as a frame or table, for example, which may be fixed or movable as required.
For purposes of simplicity, the rest of this text may, at certain locations, specifically direct itself to examples involving a mask and mask table. However, the general principles discussed in such instances should be seen in the broader context of the patterning device as hereabove set forth.
Lithographic projection apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, the patterning device may generate a circuit pattern corresponding to an individual layer of the IC, and this pattern can be imaged onto a target portion (e.g. including one or more dies) on a substrate (silicon wafer) that has been coated with a layer of radiation-sensitive material (or photoresist layer). In general, a single wafer will contain a whole network of adjacent target portions that are successively irradiated via the projection system, one at a time. In current apparatus, employing patterning by a mask on a mask table, a distinction can be made between two different types of machine. In one type of lithographic projection apparatus, each target portion is irradiated by exposing the entire mask pattern onto the target portion at once. Such an apparatus is commonly referred to as a wafer stepper or step-and-repeat apparatus. In an alternative apparatus, commonly referred to as a step-and-scan apparatus, each target portion is irradiated by progressively scanning the mask pattern under the projection beam in a given reference direction (the “scanning” direction) while synchronously scanning the substrate table parallel or anti-parallel to this direction; since, in general, the projection system will have a magnification factor M (generally <1), the speed V at which the substrate table is scanned will be a factor M times that at which the mask table is scanned. More information with regard to lithographic devices as here described can be gleaned, for example, from U.S. Pat. No. 6,046,792, incorporated herein by reference.
In a manufacturing process using a lithographic projection apparatus, a pattern (e.g. in a mask) is imaged onto a substrate that is at least partially covered by a layer of radiation-sensitive material (resist). Prior to this imaging step, the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures, such as a post-exposure bake (PEB), development, a hard bake and measurement/inspection of the imaged features. This array of procedures is used as a basis to pattern an individual layer of a device, e.g. an IC. Such a patterned layer may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemo-mechanical polishing, etc., all intended to finish off an individual layer. If several layers are required, then the whole procedure, or a variant thereof, will have to be repeated for each new layer. Eventually, an array of devices will be present on the substrate (wafer). These devices are then separated from one another by a technique such as dicing or sawing, whence the individual devices can be mounted on a carrier, connected to pins, etc. Further information regarding such processes can be obtained, for example, from the book “Microchip Fabrication: A Practical Guide to Semiconductor Processing”, Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN 0-07-067250-4, incorporated herein by reference.
For the sake of simplicity, the projection system may hereinafter be referred to as the “lens.” However, this term should be broadly interpreted as encompassing various types of projection system, including refractive optics, reflective optics, and catadioptric systems, for example. The radiation system may also include components operating according to any of these design types for directing, shaping or controlling the projection beam of radiation, and such components may also be referred to below, collectively or singularly, as a “lens”. Further, the lithographic apparatus may be of a type having two or more substrate tables (and/or two or more mask tables). In such “multiple stage” devices the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposures. Dual stage lithographic apparatus are described, for example, in U.S. Pat. Nos. 5,969,441 and 6,262,796, both incorporated herein by reference.
Embodiments of the invention will now be described, by way of example only, starting with a description of a lithographic apparatus, and with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:
As here depicted, the apparatus is of a reflective type (i.e. has a reflective mask). However, in general, it may also be of a transmissive type, for example (with a transmissive mask). Alternatively, the apparatus may employ another kind of patterning device, such as a programmable mirror array of a type as referred to above.
The source LA produces radiation. This radiation is fed into an illumination system (illuminator) IL, either directly or after having traversed a conditioning device, such as the beam expander Ex, for example. The illuminator IL may include an adjusting device AM that sets the outer and/or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) of the intensity distribution in the beam. In addition, it will generally include various other components, such as an integrator IN and a condenser CO. In this way, the beam PB impinging on the mask MA has a desired uniformity and intensity distribution in its cross-section.
It should be noted with regard to
The beam PB subsequently intercepts the mask MA, which is held on a mask table MT. Having traversed the mask MA, the beam PB passes through the lens PL, which focuses the beam PB onto a target portion C of the substrate W. With the aid of the second positioning device PW (and interferometric an measuring device IF), the substrate table WT can be moved accurately, e.g. so as to position different target portions C in the path of the beam PB. Similarly, the first positioning device PM can be used to accurately position the mask MA with respect to the path of the beam PB, e.g. after mechanical retrieval of the mask MA from a mask library, or during a scan. In general, movement of the object tables MT, WT will be realised with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which are not explicitly depicted in
The depicted apparatus can be used in two different modes:
1. In step mode, the mask table MT is kept essentially stationary, and an entire mask image is projected at once (i.e. a single “flash”) onto a target portion C. The substrate table WT is then shifted in the X and/or Y directions so that a different target portion C can be irradiated by the beam PB; and
2. In scan mode, essentially the same scenario applies, except that a given target portion C is not exposed in a single “flash”. Instead, the mask table MT is movable in a given direction (the so-called “scan direction”, e.g. the Y direction) with a speed v, so that the projection beam PB is caused to scan over a mask image. Concurrently, the substrate table WT is simultaneously moved in the same or opposite direction at a speed V=Mv, in which M is the magnification of the lens PL (typically, M=¼ or ⅕). In this manner, a relatively large target portion C can be exposed, without having to compromise on resolution.
In this embodiment, an EUV transmissive top coat on a photoresist layer may include one or more of the following atoms: beryllium, boron, carbon, silicon, zirconium, niobium and molybdenum. It may further include one or more of the following polymers: polysilanes, polysilylenes, polysiloxanes, silylated polyhydroxystyrene, silane containing polymers, silsesquioxane polymers, acryl silane polymers, methacryl silane polymers and silylated polymers. The top coat may have a final thickness such that the transmission of EUV radiation is higher than 50%. This may result in a top coat that has a transmission for DUV and UV radiation of less than 50%.
The substrate of wafer W of
The following procedure is performed: preparing the surface of the substrate by cleaning and drying; coating the photoresist layer on the surface of the substrate by spin coating the photoresist layer on the surface of the substrate; heating the substrate during softbake, wherein a partial evaporation of the photoresist solvent takes place by the heating; cooling the substrate during ‘chilling’; spin coating the EUV transmissive top coat on the surface of the photoresist layer. After applying these processes, the procedure is followed with a subsequent heating and cooling. The top coat is substantially transmissive for EUV radiation, but is substantially non-transmissive for UV or DUV radiation.
The lithographic apparatus of
According to another embodiment a Novolac-based top coat is used. With respect to the commercially available water-based top coats, the Novolac-based top coat with a silylated polyhydroxystyrene substantially absorbs DUV radiation and has an improved EUV/DUV selectivity. The top coat may have a final thickness of 20-100 nm, e.g between 30-80 nm.
According to another embodiment instead of applying soft-bake and cooling processes after applying the photoresist on the substrate W, the EUV transmissive top coat is applied on the photoresist layer, immediately after the coating of the photoresist layer. Subsequently, the procedure is followed by a soft-bake and cooling.
After applying the photoresist on the substrate W, the substrate is applied to a soft-bake and cooling. Subsequently, via CVD, a silicon containing component layer is provided as top coat by CVD coating of a polymer and of a silylated polymer. The top coat is substantially transmissive for EUV radiation, but is substantially non-transmissive for UV or DUV radiation.
The transmission of a Si coating against the wavelength (in nm) is simulated in FIG. 3 for a 10 nm layer. This figure shows a coating that is substantially transmissive for EUV radiation, but which is substantially non-transmissive or only slightly transmissive for undesired UV or DUV radiation. Since the trend of transmission versus wavelength of Si,C,H containing polymers compares well with that of Si, this figure shows that in general Si,C,H containing top coats, e.g. polymers with Si groups, or polymer layers with Si components can be applied (e.g. by CVD) as top coatings.
After applying the photoresist on the substrate W, the substrate is applied to a soft-bake and cooling. Subsequently, via CVD, a boron containing component layer is provided as top coat (B,C,H based top coat), e.g. by applying polymer and boron CVD.
After applying a top coat as described above, the resist is exposed to EUV radiation. Subsequently, a post exposure bake is performed and then the top coat and resist is removed during a development step.
After applying a top coat as described above, the resist is exposed to EUV radiation. Subsequently, a post exposure bake is performed and then the top coat is ‘stripped’ by a plasma etch process. Afterwards, the resist is removed during development.
After applying a top coat as described above, the resist is exposed to EUV radiation. Subsequently, a post exposure bake is performed and then the top coat is ashed. Afterwards, the resist is removed during development.
A top coat is applied according to another embodiment of the invention. The top coat is transmissive for EUV radiation, and absorbs DUV radiation. During exposure and processing, the photoresist is not charged, or charged less than with conventional top coats, due to the use of the EUV top coat as charge dissipating or conducting layer.
This embodiment includes most of the features described above, but silylated Novolac is used. With respect to the commercially available water-based top coats, the silylated Novolac-based top coat substantially absorbs DUV radiation and has an improved EUV/DUV selectivity. The top coat may have a final thickness of 20-100 nm, e.g between 30-80 nm.
While specific embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. The description of the embodiments and the figures are not intended to limit the invention. For example, other coating techniques, leading to EUV transmissive coatings might also be used. The EUV coatings might also include other atoms, that lead to suitable coatings being transmissive to EUV radiation. Further, the invention is not confined to the lithographic apparatus as described. It will be appreciated that the invention may also include combinations of the embodiments described herein.
| Number | Date | Country | Kind |
|---|---|---|---|
| 03076531.7 | May 2003 | EP | regional |
