Patent Application
20060024901
1. Field of the Invention
The present invention relates to a method for fabricating a high-frequency and high-power semiconductor module, more particularly, the method performs a first stage using thick-film processes employed to produce high impedance resistors and a second stage using thin-film processes to fabricate other precise elements.
2. Description of Related Art
The so-called thick-film process utilized in semiconductor fabricating technology is to produce a film with a thickness from a few micrometers (μ) to 20 micrometers μ. When forming the thick film, a colloid compound of metal powder, metallic oxide powder, glass powder, and organic colloid solvent are firstly prepared. The colloid compound then is printed to form desired grill patterns and further sintered at high temperature, i.e. approximately 500-1000 degrees Centigrade thereby forming a thick film. Such a thick film is usually applied in the manufacturing of resistors, conductors, capacitors, multi-layer wires or protective glass film.
Differing from the thick-film process, the thin-film process uses the compound of the metal, alloy, insulation material and other chemical compositions as the raw material and forms thin films with the thickness from a few angstroms (Å) to a few micrometers (μ) through sputtering, vapor deposition etc. The thin film is also widely used to produce resistors, conductors, capacitors, multi-layer wires and protective glass films. In comparison to the thick-film process, elements manufactured with the thin-film process possess superior precision but involve higher cost.
The characteristic of low impedance and power of resistors manufactured through the thin film process are unsuitable for high frequency modules that require higher power. Although the thick-film process can fit such power requirements, it is unable to form precision circuit patterns.
Therefore, the invention provides a method for fabricating a high-frequency and high-power semiconductor module to mitigate or obviate the aforementioned problem.
The main objective of the present invention is to provide a method for fabricating a high-frequency and high-power semiconductor module in which resistors of high impedance and passive elements as well as precise circuits are all integrated therein.
To accomplish the objective, the method comprises two stages, wherein a first stage uses a thick-film process to form resistors and circuits requiring high impedance; and a second stage uses a thin-film process to form electrical components and circuits requiring high precision.
Other objectives, advantages and novel features of the invention will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings.
With reference to
The first stage (100) involves the acts as follows:
Besides the forming of the resistors, the foregoing first stage (100) can be applied to form circuits of high impedance. Subsequent to the first stage of forming the resistors, the second stage (200) using thin-film process is introduced to produce other precise elements and circuits, which comprises the acts of:
In conclusion, the method for forming a high frequency, high power semiconductor module in accordance with the present invention integrates the advantages of the respective thin-film and thick-film processes through two stages, whereby the semiconductor module can simultaneously possess resistors with high impedance and precise circuits.
It is to be understood, however, that even though numerous characteristics and advantages of the present invention have been set forth in the foregoing description, together with details of the structure and function of the invention, the disclosure is illustrative only, and changes may be made in detail, especially in matters of shape, size, and arrangement of parts within the principles of the invention to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.
