This application claims priority under 35 USC § 119(e)(1) of provisional application Ser. No. 60/222,209, filed 08/01/2000.
Number | Name | Date | Kind |
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5872387 | Lyding et al. | Feb 1999 | A |
5972765 | Clark et al. | Oct 1999 | A |
6147014 | Lyding et al. | Nov 2000 | A |
6187665 | Chetlur et al. | Feb 2001 | B1 |
6191463 | Mitani et al. | Feb 2001 | B1 |
6281138 | Brady et al. | Aug 2001 | B1 |
6544862 | Bryan | Apr 2003 | B1 |
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0 892 424 | Jan 1999 | EP |
54043679 | Apr 1979 | JP |
07297178 | Nov 1995 | JP |
10012609 | Jan 1998 | JP |
11330476 | Nov 1999 | JP |
WO 9419829 | Sep 1994 | WO |
Entry |
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Mikkelsen, “Secondary ion mass spectrometry characterization of H2O-D2 and H2O-O-18 steam oxidation of silicon”, Journal of Electronic materials 1982, vol. 11, No. 3, pp. 541-558.* |
Mitani, Yuichiro, et al., “Highly Reliable Gate Oxide under Fowler-Nordheim Electron Injection by Deuterium Pyrogenic Oxidation and Deuterated Poly-Si Deposition,” XP-000988856, 2000 IEEE, pp. 14.6.1-14.6.4. |
Number | Date | Country | |
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60/222209 | Aug 2000 | US |