U.S. patent application No. 10/215,173, entitled “Use of Amorphous Carbon Hard Mask for Gate Patterning to Eliminate Requirement of Poly Re-Oxidation”, as filed on Aug. 8, 2002, including claims, drawings, and abstract (29 pages). |
U.S. patent application No. 10/277,760, entitled “Sacrificial Air Gap Layer for Insulation of Metals”, as filed on Aug. 8, 2002, including claims, drawings, and abstract (17 pages). |
U.S. patent application No. 10/244,650, entitled “Use of Multilayer Amorphous Carbon Arc Stack to Eliminate Line Warpage Phenomenon”, as filed on Sep. 16, 2002, including claims, drawings, and abstract (30 pages). |
U.S. patent application No. 10/217,730, entitled “Ion Implantation to Modulate Amorphous Carbon Stress”, as filed on Aug. 13, 2002, including claims, drawings, and abstract (29 pages). |
U.S. patent application No. 10/424,420, entitled “Use of Amorphous Carbon for Gate Pattering”, filed Apr. 28, 2003, by Fisher et al. |
U.S. patent application No. 10/230,794, entitled “Formation of Amorphous Carbon Arc Stack Having Graded Transition Between Amorphous Carbon and Arc Material”, as filed on Aug. 29, 2002, including claims, drawings, and abstract (29 pages). |
U.S. patent application No. 10/230,775 entitled “Use of Buffer Dielectric Layer with Amorphous Carbon Mask to Reduce Line Warpage”, as shown on Aug. 29, 2002, including claims, drawings, and abstract (28 pages). |
U.S. patent application No. 10/335,726, entitled “Use of Diamond as a Hark Mask Material”, as filed on Jan. 2, 2003, including claims, drawings, and abstract (25 pages). |
U.S. patent application No. 10/424,675, entitled “Selective Stress-inducing Implant and Resulting Pattern Distortion in Amorphous Carbon Patterning”, as filed on Apr. 28, 2003, including claims, drawings, and abstract (28 pages). |