Claims
- 1. A method of forming a patterned layer on a substrate comprising:
- (a) coating the substrate with a polymeric photoresist composition containing one or more photoacid generating agents or photoacid components;
- (b) drying the coating to form a resist film;
- (c) coating the resist film with a thin layer of an organometallic reagent;
- (d) exposing selected portions of the coated film with a source of radiation, thereby producing strong acids which convert the organometallic reagent to a hydrolyzed by-product product;
- (e) partial wet developing to remove portions of said hydrolyzed by-product; and
- (f) dry developing the film to remove the remaining reactive portions by etching in an oxygen plasma.
- 2. The method of claim 1 wherein the polymeric materials in the photoresist composition are selected from the group consisting of poly(p-vinyl)phenols, the novolak resins, polyvinyl pyrollidones, and mixtures thereof.
- 3. The method of claim 1 wherein the photoacid generator is selected from the group consisting of halogenated aromatic compounds of the formula: ##STR3## wherein: X=Cl, Br, F, or I;
- n is an integer from 1 to 10 inclusive;
- m is an integer from 1 to 10 inclusive; and the organic substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of alkyl or aryl groups.
- 4. The method of claim 3 wherein the organic substituents R.sub.1 -R.sub.3 are each independently C.sub.1 -C.sub.16 alkyl groups.
- 5. The method of claim 3 wherein the organic substituents R.sub.1 -R.sub.3 are each independently C.sub.1 -C.sub.10 groups.
- 6. The method of claim 3 wherein the organic substituents R.sub.1 -R.sub.3 are each independently C.sub.1 -C.sub.6 groups.
- 7. The method of claim 3 wherein the organic substituents R.sub.1 -R.sub.3 are each independently phenyl or alkyl substituted phenyl.
- 8. The method of claim 1 wherein the photoacid generator is selected from the group consisting of halogenated aromatic compounds of the formula: ##STR4## wherein: the substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of hydrogen, and halogenated (F, Br, Cl, I) alkyl groups.
- 9. The method of claim 8 wherein the halogenated alkyl groups are each independently C.sub.1 -C.sub.16 alkyl groups.
- 10. The method of claim 8 wherein the halogenated alkyl groups are each independently C.sub.1 -C.sub.10 groups.
- 11. The method of claim 8 wherein the halogenated alkyl groups are each independently C.sub.1 -C.sub.6 groups.
- 12. The method of claim 1 wherein the photoacid generator is selected from the group of onium salts comprising halonium salts, ammonium salts, phosphonium salts, arsonium salts, aromatic sulfonium salts, sulfoxonium salts or selenonium salts.
- 13. The method of claim 1 wherein the organometallic compound is selected from the compounds having the formula:
- R.sub.1 R.sub.2 R.sub.3 R.sub.4 -M
- wherein:
- M is selected from the group consisting of Si, Sn, Ti, P, Ge, and Zr; and
- the organic substituents R.sub.1 -R.sub.4 are each independently selected from the group consisting of alkyl, aryl, and a suitable leaving group, with the proviso that one such substituent is a leaving group.
- 14. The method of claim 13 wherein M is Si.
- 15. The method of claim 13 wherein up to three of the organic substituents R.sub.1 -R.sub.4 are each independently selected from the group consisting of C.sub.1 -C.sub.16 alkyl.
- 16. The method of claim 13 wherein up to three of the organic substituents R.sub.1 -R.sub.4 are each independently selected from the group consisting of C.sub.1 -C.sub.10 alkyl.
- 17. The method of claim 13 wherein up to three of the organic substituents R.sub.1 -R.sub.4 are each independently selected from the group consisting of C.sub.1 -C.sub.6 alkyl.
- 18. The method of claim 13 wherein up to three of the organic substituents R.sub.1 -R.sub.4 are each independently selected from the group consisting of phenyl or alkyl substituted phenyl.
- 19. The method of claim 13 wherein at least one of the leaving groups is halogen selected from the group consisting of F, Cl, Br, or I.
- 20. The method of claim 13 wherein at least one of the leaving groups is an amino group of the formula NR.sub.1 R.sub.2.
- 21. The method of claim 13 wherein at least one of the leaving groups is an alkoxy group of the formula OR.sub.1.
- 22. The method of claim 1 wherein the organometallic compound is selected from the compounds having the formula:
- (R.sub.1 R.sub.2 R.sub.3 -M).sub.2 +x-NH.sub.1-x
- wherein;
- x=0 or 1;
- M is selected from the group consisting of Si, Sn, Ti, Ge, and Zr; and
- the organic substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of alkyl and aryl.
- 23. The method of claim 22 wherein M is Si.
- 24. The method of claim 22 wherein the organic substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of C.sub.1 -C.sub.16 alkyl.
- 25. The method of claim 22 wherein the organic substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of C.sub.1 -C.sub.10 alkyl.
- 26. The method of claim 22 wherein the organic substituents R.sub.1 -R.sub.3 are independently selected from the group consisting of C.sub.1 -C.sub.6 alkyl.
- 27. The method of claim 22 wherein the organic substituents R.sub.1 -R.sub.3 are each independently selected from the group consisting of phenyl and alkyl substituted phenyl.
- 28. The method of claim 1 wherein the photoactive compound is selected from compounds having the formula: ##STR5## wherein Y is selected from the group consisting of O, S, N, and C; and
- R is selected from the group consisting of alkyl and aryl substituents.
- 29. The method of claim 26 wherein R is selected from the group consisting of C.sub.1 -C.sub.16 alkyl.
- 30. The method of claim 26 wherein R is selected from the group consisting of C.sub.1 -C.sub.10 alkyl.
- 31. The method of claim 26 wherein R is selected from the group consisting of C.sub.1 -C.sub.6 alkyl.
- 32. The method of claim 26 wherein R is selected from the group consisting of phenyl and alkyl substituted phenyl.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of copending U.S. application Ser. No. 07/226,282, filed Jul. 29, 1988, now U.S. Pat. No. 4,921,778.
US Referenced Citations (8)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
226282 |
Jul 1988 |
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