Claims
- 1. A photosensitive resin composition which consist essentially of, as essential components,
- (A) a polyamic acid ester consisting of the structural units represented by the following formulas (1a), (1b) and (1c): ##STR17## wherein R.sub.1 : a trivalent or tetravalent organic group,
- R.sub.2 : a divalent organic group
- R.sub.3 : ##STR18## R.sub.4 : ##STR19## --CH.sub.3, or C.sub.2 H.sub.5 R.sub.5 : a divalent to hexavalent organic group,
- R.sub.6 : H or CH.sub.3 group,
- R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independent of one
- another, R.sub.3 and R.sub.4 may be the same or different, and R.sub.4 and R.sub.6 may be the same or different,
- l, m, n: 0 or 1,
- p: an integer of 1-5,
- x, y, z: mol % of the structural units (1a), (1b), (1c), 0<x, y<100, 0<z<80 and x+y+z=100, and
- (B) a stabilizer comprising propylene glycol monomethyl ether acetate.
- 2. A composition according to claim 1 wherein the trivalent or tetravalent organic group R.sub.1 in the formulas (1a), (1b) and (1c) is a residue of an aromatic tetracarboxylic acid or an aromatic tricarboxylic acid.
- 3. A composition according to claim 1 wherein the divalent organic group R.sub.2 in the formulas (1a), (1b) and (1c) is a residue of an aromatic diamine.
- 4. A composition according to claim 1 wherein the amount of the stabilizer is 50-500 parts by weight based on 100 parts by weight of the polyamic acid ester.
- 5. A composition according to claim 1 which additionally contains a sensitizer.
- 6. A composition according to claim 1 which additionally contains a photopolymerization initiator.
- 7. A composition according to claim 1 wherein R.sub.5 is a divalent or trivalent aliphatic group.
Priority Claims (3)
Number |
Date |
Country |
Kind |
5-026400 |
Feb 1993 |
JPX |
|
5-033202 |
Feb 1993 |
JPX |
|
5-061544 |
Mar 1993 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 08/313,102, filed Sep. 30, 1994 now abandonded, Dec. 8, 1995 which is a 371 of PCT/JP 94/60231 filed Feb. 16, 1994.
US Referenced Citations (6)
Foreign Referenced Citations (1)
Number |
Date |
Country |
617837 |
Jan 1986 |
JPX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
313102 |
Sep 1994 |
|