This is a continuation of application Ser. No. 117,708 filed 11/05/87 now abandoned, which is a continuation-in-part of application Ser. No. 074,391 filed 7/16/87 now abandoned.
Number | Name | Date | Kind |
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3961997 | Chu | Jun 1976 | |
4168330 | Kaganowicz | Sep 1979 | |
4183780 | McKenna et al. | Jan 1980 | |
4282268 | Priestly et al. | Aug 1981 | |
4509451 | Collins et al. | Apr 1985 | |
4597985 | Chandross et al. | Jul 1986 | |
4685999 | Davis et al. | Aug 1987 | |
4708884 | Chandross et al. | Nov 1987 |
Entry |
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Lucorsky et al., "Deposition of Silicon Dioxide and Silicon Nitride by Remote Plasma Enhanced Chemical Vapor Deposition", J. Vac. Sci. & Tech., vol. 4, No. 3, May/Jun. 1986, pp. 681-688. |
Wolf et al., Silicon Processing for the VLSI Era, Lattice Press, Sunset Beach, CA, 1986, pp. 187-191. |
Wolf et al., Silicon Processing for the VLSI Era, vol. 1, Lattice Press, Sunset Beach, 1986, pp. 568-574. |
Number | Date | Country | |
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Parent | 117708 | Nov 1987 |
Number | Date | Country | |
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Parent | 74391 | Jul 1987 |