This application is a continuation of application(s) application Ser. No. 08/963,922 filed on Nov. 4, 1997, now U.S. Pat. No. 6,057,083.
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Entry |
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Johnson et al Evaluation of TER-SYSTEM resist for 193 nm Imaging Proceedings of SPIE-Int'l Society for Optical Engineering, vol. 3049, pp. 997-1009, Mar. 1997.* |
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Number | Date | Country | |
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Parent | 08/963922 | Nov 1997 | US |
Child | 09/330418 | US |