This application is a 371 of International PCT Application PCT/EP2013/074744 filed Nov. 26, 2013 which claims priority to Brazilian Patent Application No. 102012032031 2 filed Dec. 14, 2012, the entire contents of which are incorporated herein by reference.
The present invention belongs to the electronic engineering field for its reference to portable equipment for monitoring and controlling the level of oxygen in reflow ovens atmosphere.
A reflow oven is a heating device used for soldering electronic components on printed circuit boards, through the surface mount technology (SMT).
The use of this technique in the industry of electronics manufacturing enables an easier construction of electronic devices, ensuring that the electronic components are properly mounted and that the electrical connections on the circuit board are guaranteed by reflowed soldering techniques.
The technique of using an inert atmosphere is pretty much applied to control chemical reactions when handled substances present high sensitivity to air.
Several materials used in modern technologies such as microelectronics, among others, exhibit unusual and undesired states of oxidation and reactions due to the presence of atmospheric air.
As a solution to this problem, the use of inert gas in, for example, the atmosphere of reflow ovens, made it possible that even at high temperatures, the adverse effects of oxidation are reduced.
Some reflow ovens can operate with an atmosphere of inert gas, although they sometimes have some equipment for monitoring the air quality when related to oxygen levels, and they generally do not make it possible to adjust the quality of the oven atmosphere and it is an integral part of the own reflow oven. In these ovens, without the action of an operator in controlling the flow of nitrogen of this equipment, there may be some waste or lack of nitrogen in the atmosphere of the reflow oven. This lack generates high levels of oxygen in the welding surroundings which can cause welding defects such as open circuits, solder balls, short circuits, among others.
For example, the document JP20100007080 describes a reflow oven capable of controlling the supply of nitrogen and preventing the increase on the concentration of oxygen coming from the outside air. The atmosphere control system is an integral part of the oven, and therefore, it is not a portable device.
The present invention describes a portable equipment for monitoring and controlling the level of oxygen in the atmosphere of reflow ovens, which is portable as its main advantage, and that it can be easily coupled to any conventional reflow ovens using their own outputs of nitrogen and of existing sampling in all reflow ovens, for the connection of collecting and analysis boxes and control of nitrogen injection flow. Therefore, its maintenance is made easier.
The system allows the user to predetermine the desired level of oxygen in the reflow ovens surroundings; it keeps the oxygen levels desired by the user without the need for an operator to control the flow/volume of nitrogen injections in the reflow oven; prevents spending insufficient or excessive nitrogen in reflow ovens processes, and improving the quality of the final product.
The present invention describes the portable equipment for monitoring and controlling the level of oxygen in atmosphere of reflow ovens.
The device features interface in which the user can preselect the desired values for a given operation.
The referred equipment is able to determine the quality of the atmosphere of a reflow oven through parameters predetermined by the user. Therefore, the equipment performs the monitoring of the atmosphere of the reflow oven and controls the oxygen level in the reflow oven by increasing or decreasing the influx of nitrogen through the control that the microcontroller has on the control valve of nitrogen injection, by opening or closing the proportional valve of nitrogen flow control, in order to maintain those predetermined values of oxygen concentration.
This invention describes the portable equipment for monitoring and controlling the atmosphere of reflow ovens (1).
The referred equipment is capable of: instantly ascertain the quality of the atmosphere of a reflow oven (1), to perform its monitoring and control.
According to
The control box of nitrogen injection flow (2) is comprised of ball-type manual valves (5), nitrogen pressure regulators with pressure gauge (8), proportional valve of nitrogen flow control (9) located between the nitrogen network and the reflow oven (1).
There is a cleaning line (16) that comes out of the box control of nitrogen injection flow (2) which can be used to clean the sampling system using nitrogen. The cleaning line (16) is comprised of a ball-type manual valve of the cleaning line (6) and nitrogen pressure regulator of the cleaning line with pressure gauge (7).
The collecting and analysis box (3) is comprised of line filter (10), solenoid valves (11) to control the input of cleaning sample or nitrogen, a lambda sensor coupled to an analysis chamber (12) which sends electrical signal to the signal converter (13), flow meter with needle valve (14) and a diaphragm-type vacuum pump (15).
The box with the programmable controller, electrical power and display with communicative interface (4) is comprised of a microcontroller and an electrical panel of the control system.
Operation of Portable Equipment for Monitoring and Controlling the Level of Oxygen in Reflow Oven Atmosphere
The portable equipment for monitoring and controlling the atmosphere of reflow ovens (1) can be coupled to reflow ovens (1) of any brand and model for monitoring/controlling the reflow atmosphere.
In the existing communicative interface in the box with programmable controller (4), the user preselects the desired values of oxygen on the reflow surroundings for a given recipe for the oven operation.
Firstly, the equipment evaluates the values if the oxygen amount collected in the sampling collecting and analysis box (3) corresponds to an atmosphere within the desired operating recipe, as predetermined by the user.
The microcontroller performs the control of the oxygen level in the reflow oven (1) by using as an ideal parameter the value preselected by the user. Additionally, the microcontroller informs the oxygen value measured through the equipment display and controls the nitrogen injection flow so that the oxygen level is kept in the reflow surroundings, according to that preselected by the user.
The microcontroller continuously compares the oxygen levels desired predetermined by the oven operator (1) (set point) to real values presented during the operation performed at that time. The information on quality of the reflow atmosphere is obtained by the lambda sensor (12) in the collecting and analysis box (3) connected to the sampling line (17) of the reflow oven (1).
After that comparison performed between the real values at the time of oven operation (1) and the values preset by the user, a command signal is sent from the microcontroller to the nitrogen flow control box (2), which then coordinates if the proportional valve of nitrogen flow control (9) must be open or closed. Therefore, it is possible to control the desired amount of oxygen in the reflow atmosphere.
This system was designed to control oxygen concentrations below 3000 PPM, in the reflow oven surroundings (1). This way, during the monitoring the equipment detects that there is too much oxygen in the reflow oven surroundings (1) (levels above those previously determined by the user), the equipment automatically injects more nitrogen to the reflow oven (1) until the level predetermined by the user is reached.
On the other hand, when the level of residual oxygen in the reflow surroundings is extremely low (below those values predetermined by the user), the equipment automatically reduces the nitrogen flow into the reflow oven (1), by closing the proportional valve of nitrogen flow control. (9).
When the oxygen level is according to what has previously been predetermined by the user, the equipment automatically locks the open position of the proportional valve of nitrogen flow control (9). This way, it is kept a constant nitrogen injection flow into the reflow oven (1) until the moment at which the equipment detects that the oxygen level is no longer as predetermined by the user.
Therefore, the use of a nitrogen amount lower or higher than that required for that oven specific operation (1) is avoided, preventing the waste of nitrogen, improving the quality of the final product of which specification requires low oxygen concentration in the reflow surroundings.
Although the invention has been extensively described, it is obvious to those skilled in the art that several changes and modifications can be made aiming at a design improvement without these changes being not covered by the scope of the invention.
Number | Date | Country | Kind |
---|---|---|---|
102012032031 U | Dec 2012 | BR | national |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/EP2013/074744 | 11/26/2013 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2014/090571 | 6/19/2014 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
5296680 | Yamada | Mar 1994 | A |
5341978 | Halstead | Aug 1994 | A |
5356066 | Yamada | Oct 1994 | A |
5364007 | Jacobs | Nov 1994 | A |
6409070 | Master | Jun 2002 | B1 |
20010030184 | Richert | Oct 2001 | A1 |
20020073574 | Durdag | Jun 2002 | A1 |
20020130164 | Matsuki | Sep 2002 | A1 |
20030168499 | Tanabe | Sep 2003 | A1 |
20030213833 | Nakamura | Nov 2003 | A1 |
20030218058 | Shaw | Nov 2003 | A1 |
20070284417 | Yamada | Dec 2007 | A1 |
20090218386 | Kimbara | Sep 2009 | A1 |
20090325116 | Matsuura | Dec 2009 | A1 |
20100147327 | Kondo | Jun 2010 | A1 |
20110017805 | Yanaros et al. | Jan 2011 | A1 |
20130175323 | Zhang | Jul 2013 | A1 |
20130200136 | Besshi | Aug 2013 | A1 |
20140290286 | Liebert | Oct 2014 | A1 |
20150122876 | Breingan | May 2015 | A1 |
20150208515 | Dautenhahn | Jul 2015 | A1 |
Number | Date | Country |
---|---|---|
202411611 | Sep 2012 | CN |
103203509 | Jul 2013 | CN |
10 2009 003023 | Nov 2010 | DE |
0 549 262 | Jun 1993 | EP |
06344176 | Dec 1994 | JP |
07170062 | Jul 1995 | JP |
08172263 | Jul 1996 | JP |
2011 143458 | Jul 2011 | JP |
2011245529 | Dec 2011 | JP |
101213641 | Dec 2012 | KR |
WO 2007 069705 | Jun 2007 | WO |
Entry |
---|
International Search Report for corresponding PCT/EP2013/074744, Mar. 14, 2014. |
Written Opinion for related PCT/EP2013/074744, Nov. 26, 2013. |
Number | Date | Country | |
---|---|---|---|
20150314401 A1 | Nov 2015 | US |