Probe station thermal chuck with shielding for capacitive current

Information

  • Patent Grant
  • 7138813
  • Patent Number
    7,138,813
  • Date Filed
    Friday, July 25, 2003
    22 years ago
  • Date Issued
    Tuesday, November 21, 2006
    19 years ago
Abstract
To reduce noise in measurements obtained by probing a device supported on surface of a thermal chuck in a probe station, a conductive member is arranged to intercept current coupling the thermal unit of the chuck to the surface supporting the device. The conductive member is capacitively coupled to the thermal unit but free of direct electrical connection thereto.
Description
BACKGROUND OF THE INVENTION

The present invention is directed to probe stations suitable for making low current and low voltage measurements and, more particularly, to a system for reducing noise due to capacitive currents resulting from the operation of a thermal chuck for a probe station.


Integrated circuit devices are typically manufactured in and on a wafer of semiconductor material using well-known techniques. Prior to cutting the individual integrated circuit devices from a wafer, tests are run on individual devices to determine if the devices operate properly. The wafer is supported on a chuck inside an environmental enclosure in a probe station. Probes are brought into contact with test points or pads on the integrated circuit devices and a series of measurements are preformed. Schwindt et al., U.S. Pat. No. 5,663,653, disclose an example of a probe station in which the present invention might be used and the patent is incorporated herein by reference.


Many integrated circuit devices are designed to operate at temperatures other than room temperature. To accommodate device testing at temperatures other than the ambient temperature, a thermal chuck may be employed. One design of a thermal chuck comprises a multilayered chuck for securing a wafer having a thermal driver to modify the temperature of the chuck. A thermal chuck of this design is disclosed by Schwindt in U.S. Pat. No. 5,610,529 which is incorporated herein by reference.


The thermal driver may provide for either heating, cooling, or heating and cooling of the chuck. To modify the temperature of the chuck, the thermal driver may comprise one or more thermal units including a thermal device and a plurality of power conductors connecting the thermal device to a power source. Thermal devices, typically electric resistance heaters or thermoelectric heat pumps, are provided to heat the chuck to temperatures above the ambient temperature. The thermoelectric heat pump, also known as a Peltier device, is reversible and can be used for cooling as well as heating the chuck. The thermoelectric heat pump comprises a number of thermocouples sandwiched between two electrically insulating, thermally conductive plates. When DC power is supplied to the thermocouples, the Peltier effect causes heat to be transferred from one plate to the other. The direction of heat flow is reversible by reversing the direction of current flow in the thermocouples. Exposing the chuck to the warmer plate or the cooler plate of the thermoelectric heat pump will, respectively, either heat or cool the chuck. For testing at temperatures below ambient, the thermal chuck may also include passages for circulating coolant to cool the chuck directly or remove excess heat from the thermoelectric heat pump.


When making the low voltage and low current measurements common to testing integrated circuit devices, even very low levels of electrical noise are unsatisfactory. Thermal chucks include several sources of noise and unacceptably high levels of noise are a common problem when using a thermal chuck. One known source of noise is the result of expansion or contraction of the components of the thermal chuck due to changing temperature. Expansion or contraction changes the spacing between conductive components resulting in the generation of capacitive currents which can reach the conductive surface of the chuck. Expansion or contraction due to temperature change can also cause relative transverse movement between the multiple material layers of the chuck. Relative movement between contacting layers of insulating and conductive materials can generate triboelectric current. In a probe station chuck, the triboelectric current can appear as noise in the test measurements. Triboelectric currents can be reduced by a chuck design which prevents movement between contacting layers of insulating and conducting materials.


The operation of the thermal units by the thermal driver controller is another potential source of noise when using a thermal chuck. To change or maintain the temperature of the thermal chuck, the thermal driver controller fluctuates the electrical power to the thermal units in response to a temperature control system. As a result of the voltage drop within the conductors of the thermal units, physically adjacent portions of the electrical conductors leading to and from, and internal to the thermal devices, will be at different potentials. As the power fluctuates, the difference in voltage between the power conductors changes with time. This results in a displacement of charges in the dielectric material surrounding the conductors which manifests itself as a displacement or capacitive current coupled to the conductive top surface of the chuck. This capacitive current appears as noise in the test measurements.


The currently accepted technique to reduce the effects of capacitive currents involves shielding the chuck from external electromagnetic sources. However, the shielding layers of conductive material in the chuck have proven unsuccessful in eliminating the noise from the thermal driver. To reduce noise due to capacitive currents originating in the thermal chuck, users of probe stations often shut off the thermal units and wait for the current to dissipate. However, the RC time constant involved can be greater than five seconds. Waiting a period of five time constants (e.g. 25 seconds) for the observed noise to dissipate to an acceptable level before making a measurement substantially effects the productivity of the probe station.


What is desired, therefore, is a system for reducing the electrical noise generated by the operation of the thermal unit of a probe station's thermal chuck. Reducing noise generated by the thermal chuck reduces the time for the noise to dissipate to acceptable levels improving the productivity of the probe station.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a cross-section of a probe station incorporating a thermal chuck.



FIG. 2 is a cross section of an exemplary thermal chuck constructed in accordance with the present invention.



FIG. 3 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a first aspect of a preferred embodiment of the present invention.



FIG. 4 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a second aspect of a preferred embodiment of the present invention.



FIG. 5 is an exemplary schematic diagram of a thermal unit and shielding in accordance with a third aspect of a preferred embodiment of the present invention.





DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

As illustrated in FIG. 1, a probe station generally includes an environmental enclosure 2 in which is located a chuck 4 and one or more probes 6. The environmental enclosure 2 is typically constructed of a conductive material and grounded 7 so that the chamber, interior to the enclosure 2, is shielded from electromagnetic fields emanating from outside of the enclosure 2. The chuck 4 typically comprises multiple layers of conductive and dielectric materials that are connected to the various conductors of a coaxial or triaxial cable 8. The chuck 4 includes a securement technique for securing a device under test 10, generally a wafer of semiconductor material, to the upper surface 12 of the chuck 4. The upper surface 12 of the chuck 4 is typically conductive. One technique for securing a device under test 10 relies on a vacuum source (not shown) located outside of the environmental enclosure. The vacuum source communicates through appropriate control valves and piping with apertures (not shown) in the upper surface 12 of the chuck 4. When the device under test 10 is placed on the chuck 4 the device blocks apertures leading to the vacuum source. Air pressure holds the device under test 10 against the chuck's upper surface 12. One or more probes 6 can be positioned over the device under test 10 and brought into contact with test pads on the circuit to be tested. Instrumentation connected to the probes 6 measures selected operating parameters of the circuit at the test pads.


A thermal chuck 14, bracketed, may be used to test the operation of devices at temperatures other than the ambient temperature of the environmental enclosure 2. Referring to FIG. 2, the thermal chuck 14, indicated with a bracket, may include a thermal driver 16 having facilities for modifying the temperature of a chuck 4, indicated with a bracket, supported on the top of the thermal driver 16. The thermal driver 16 may be arranged to provide for either heating, cooling, or heating and cooling of the chuck 4. The thermal driver 16 comprises one or more electrically powered thermal units 20 each of which includes one or more thermal devices 22 and a plurality of insulated power conductors 24 connecting the thermal devices 22 to a thermal driver controller 18. Typically, the thermal devices 22 are resistance heaters or thermoelectric heat pumps. Resistance heaters and thermoelectric heat pumps can increase the temperature of the chuck 4. The thermoelectric heat pump can also be used to cool the chuck 4. The thermoelectric heat pump, also known as a Peltier device, comprises a plurality of electrically connected thermocouples of p-type and n-type semiconductor materials sandwiched between two plates of an electrically insulating, thermally conducting material. When DC power is supplied to the thermocouples, heat is transferred from one plate to the other as a result of the Peltier effect. The direction of heat flow is reversible by reversing the direction of current flow in the semiconductors. Exposing the chuck 4 to the warmer plate or the cooler plate of the thermoelectric heat pump will, respectively, heat or cool the chuck 4.


The thermal driver 16 may also include passages 26 for circulating coolant supplied by a coolant source (not shown) typically located outside of the environmental enclosure 2. For testing at temperatures below the ambient temperature, the chuck 4 may be cooled directly by the coolant. If a thermoelectric heat pump is used to cool the chuck, circulating coolant may be necessary to remove heat transferred to the thermal driver 16 by the heat pump.


Electric power for the thermal units 20 is supplied by the thermal driver controller 18 located outside of the environmental enclosure 2. Insulated power conductors 24 transfer the electrical power to the thermal devices 22 in the thermal chuck 14. In response to a temperature sensing system, the thermal driver controller 18 fluctuates the electrical power to the thermal unit 20 to vary its thermal output to either reduce or increase the rate of addition or removal of thermal energy to or from the chuck 4. As a result of the voltage drop in the thermal unit 20, adjacent portions of the insulated power conductors 24 and the conductors inside the thermal devices 22 are at differing potentials. This causes a displacement of charge in the dielectric material surrounding the conductors. As the thermal driver controller 18 fluctuates the power to the thermal unit 20 the difference in voltage between adjacent conductors also varies with time. The present inventors came to the realization that this displacement of charge varying with time causes a displacement or capacitive current which is coupled to the conductive upper surface 12 of the chuck 4. The present inventors further realized that this capacitive current manifests itself as noise in the test measurements.


The present inventors came to the realization that the aforementioned capacitive currents are a significant source of noise when making measurements in the femtoamp range with state of the art probe stations. The present inventors further realized that conductive shielding of the thermal unit 20 that is capacitively coupled to the conductors of the thermal unit 20 can intercept a substantial amount, and preferably substantially all, of the capacitive currents resulting from the operation of the thermal unit 20 and provide a conductive path to return any current induced in the conductive shielding to the thermal driver controller 18 and to ground. This is in contrast to the presently accepted techniques of adding more shielding to the chuck itself. Referring also to FIG. 3, a conductive thermal device shell 28 substantially encloses the thermal devices 22 and the power conductors 24 at their connection to the thermal devices 22. Variation in charge displacement resulting from the operation of the electric circuit of the thermal device 22 results in a displacement current in the conductive thermal device shell 28. In other words, the thermal device shell 28 is capacitively coupled through “virtual” coupling capacitors 30 to the electric circuit of the thermal device 22 and intercepts capacitive currents that would otherwise find their way to the upper surface 12 of the chuck 4. Although apertures may be required in the thermal device shell 28 they should be minimized in relation to the total surface area of the thermal device shell 28. The more completely the thermal device shell 28 spatially encloses the thermal device 22 the more completely it will intercept capacitive currents emanating from the thermal device 22. The thermal device shell 28 is conductively connected to the thermal driver controller 18 through the conductive shield of the cable 32. The conductive connection of the thermal device shell 28 to the thermal driver controller 18 provides a path for any current in the thermal device shell 28 to exit the environmental enclosure 2 to the thermal driver controller 18. The driver controller 18 is connected to ground 7 extending the conductive return path for capacitive currents to ground 7.


The present inventors also came to the stark realization that by enclosing the thermal devices 22 with a conductive shell 28 the RC time constant of the thermal chuck is dramatically reduced. The thermal devices 22 do not need to be turned off in order for the noise to be sufficiently reduced. The present inventors determined that this reduction in RC time constant is due to a reduction in the stored capacitive charge in the dielectric material within the chuck, referred to as absorption capacitance. The absorption capacitance of a material includes a series resistance so, in effect, it has a memory of previous charges and is slow to dissipate. This absorption capacitance was not previously considered in the design of thermal chucks. There was little, if any, motivation to enclose the thermal devices 22 in a conductive enclosure, as it was believed that noise from the thermal devices 22 could be removed by layers of shielding in the chuck 4. The layers of the chuck 4 include, however, dielectric material which the inventor realized is, in fact, a source of the long RC time constant.


The cable 32 includes the power conductors 24 connecting the thermal driver controller 18 to the thermal devices 22. The shield of the cable 32 ideally extends through the wall of the environmental enclosure 2 and encompasses the power conductors 24 at their entrance into the thermal device shell 28. The shield of the cable 32 is capacitively coupled to the power conductors 24 and will intercept and return to the thermal driver controller 18 currents emanating from the capacitive effects of power fluctuation in the power conductors 24. The thermal driver controller 18 is grounded at ground connection 21. The more complete the enclosure of all conductors in the thermal unit 20 by the conductive shielding, the more complete will be the protection of the test measurement from noise generated by the operation of the thermal unit 20.


The walls of the environmental enclosure 2 are typically conductive material. The conductive material shields the chamber inside the environmental enclosure 2 from electromagnetic (EM) fields originating outside of the enclosure 2 which would otherwise result in noise within the probe 6. The environmental enclosure 2 is grounded to return to ground the currents generated in the conductive wall by the EM fields. In a preferred embodiment of the present invention, the conductive wall of the environmental enclosure is extended to substantially surround parts of the thermal units. The extension of the wall of the enclosure provides a conductive shield capacitively coupled to the thermal units which can return capacitive currents to the enclosure ground.


Referring to FIG. 3, in a first aspect of this preferred embodiment the wall of the environmental enclosure 2 is extended coaxially with yet another shield layer 34 of the cable 32 to a point of close physical proximity to the thermal device shell 28 yet being free from direct electrical connection to the shield of the cable 32, the thermal driver controller 18, and the thermal device shell 28. The wall of the environmental enclosure 2 is extended proximate to the thermal device shell 28 by connecting the outer shield layer 34 of the cable 32 to the wall of the environmental enclosure 2. The cable 32 includes the power conductors 24 connecting the thermal driver controller 18 to the thermal devices 22. Capacitive currents emanating from the power conductors 24 are intercepted by the shield of cable 32 and returned to the thermal driver controller 18 and the thermal driver controller ground 21. The extension of the wall of the environmental enclosure 2 through the outer shield 34 of the power cable 32 is capacitively coupled to the shield of the cable 32 by a “virtual” capacitor 36 and intercepts capacitive currents leaking from within the cable 32 which might otherwise couple to the chuck 4. Any current in the extension of the environmental enclosure 2 is returned to ground 7 outside of the environmental enclosure 2 if switch 23 is closed. If the switch 23 is open, capacitive currents are returned to the ground 25 of an instrument 27 which is connected by leads 29 to probes inside the chamber.


Referring to FIG. 4, in a second aspect of this preferred embodiment the wall 40 of the environmental enclosure 2 is extended to substantially surround the thermal devices 42, the thermal device shell 44 and the power cable 46, comprising electrical conductors 43, connecting the thermal devices 42 to the thermal driver controller 50. Heat is transferred to and from the device supporting surface 56 of the chuck 70 through the thermal device shell 44 and the wall of the environmental enclosure 40, which includes an outer surface 40B and inner surface 40A enclosing the chuck and having a portion 40C that separates the device supporting surface of the chuck from the thermal devices 42. The thermal devices 42 are capacitively coupled to the thermal shell 44 by virtual capacitors 48. The thermal device shell 44 and the shield of the power cable 46 are, in turn, capacitively coupled to the wall of the environmental enclosure 40 by virtual coupling capacitors 52. Capacitive currents in the thermal device shell 44 or the shield of the cable 46 are returned to the thermal driver controller 50 through the conductive shield layer of the cable 46. The thermal driver controller 50 is connected to the thermal devices 42 by power conductors 43 and to ground at ground 51. Capacitive currents leaking from the thermal device shell 44 or the power cable 46 will be intercepted by the wall of the enclosure and returned to the enclosure ground 54 when the switch 53 is closed. When the switch 53 is open, capacitive currents in the wall 40 of the environmental enclosure are returned to the ground 55 of the instrument 57. The instrument 57 is connected to the probes 6 inside the environmental enclosure by instrument leads 47.


Referring to FIG. 5, in a third aspect of this preferred embodiment the wall 60 of the environmental enclosure 2, comprising an inner surface 60A defining the interior of the enclosure and an outer surface 60B, is extended to substantially surround the thermal devices 64 and the power conductors 62 connecting the thermal devices 64 to the thermal driver controller 63. The outer surface 60B of the wall 60 substantially encircles the thermal devices 64 so that portion of the wall including a portion 60C of the inner surface 60A separates the thermal devices from the device supporting surface 56 of the chuck 70. The thermal driver controller is grounded at ground 74. In this aspect of the invention, the thermal devices 64 and the power conductors 62 are capacitively coupled to the wall 60 of the environmental enclosure through the virtual coupling capacitors 66. Capacitive currents generated in the thermal devices 64 or power cables 62 are intercepted by the shield formed by the conductive wall of the enclosure 60 and returned to the enclosure ground 68 when the switch 69 is closed. If the switch 69 is open the walls of the enclosure are grounded through the instrument 73 to the instrument ground 71. Heat is transferred to and from the chuck 70 through the wall 60 of the environmental enclosure.


The terms and expressions that have been employed in the foregoing specification are used as terms of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding equivalents of the features shown and described or portions thereof, it being recognized that the scope of the invention is defined and limited only by the claims that follow.

Claims
  • 1. An enclosure for a probe station chuck, said probe station chuck including a device supporting surface and a thermal device arranged to modify a temperature of said device supporting surface, said enclosure comprising a conductive wall including an inner surface having a portion separating said device supporting surface from said thermal device and defining a chamber substantially enclosing said device supporting surface.
  • 2. The enclosure of claim 1 further comprising an electrically conductive connection of said conductive wall to an instrument.
  • 3. The enclosure of claim 2 further comprising an electrically conductive connection of said instrument to a ground.
  • 4. The enclosure of claim 1 further comprising: (a) an electrically conductive connection of said conductive wall to an instrument; and(b) a switch having a first terminal selectively connectable to a second terminal, said second terminal being conductively connected to said conductive wall and said first terminal being conductively connected to a ground.
  • 5. The enclosure of claim 4 further comprising an electrically conductive connection of said instrument to a ground.
  • 6. The enclosure of claim 1 wherein said conductive wall further comprises a portion separating said device supporting surface from an electrical conductor arranged to conduct electrical energy from a controller to said thermal device.
  • 7. The enclosure of claim 6 further comprising an electrically conductive connection of said conductive wall to an instrument.
  • 8. The enclosure of claim 7 further comprising an electrically conductive connection of said instrument to a ground.
  • 9. The enclosure of claim 6 further comprising: (a) an electrically conductive connection of said conductive wall to an instrument; and(b) a switch having a first terminal selectively connectable to a second terminal, said second terminal being conductively connected to said conductive wall and said first terminal being conductively connected to a ground.
  • 10. The enclosure of claim 9 further comprising an electrically conductive connection of said instrument to a ground.
  • 11. An enclosure for a probe station chuck, said probe station chuck including a device supporting surface and a thermal device arranged to modify a temperature of said device supporting surface, said enclosure comprising a conductive wall including (a) an inner surface having a portion separating said device supporting surface from said thermal device and defining a chamber substantially enclosing said device supporting surface; and(b) an outer surface, said outer surface including a portion substantially encircling a portion of said thermal device.
  • 12. The enclosure of claim 11 further comprising an electrically conductive connection of said conductive wall to an instrument.
  • 13. The enclosure of claim 12 further comprising an electrically conductive connection of said instrument to a ground.
  • 14. The enclosure of claim 11 further comprising: (a) an electrically conductive connection of said conductive wall to an instrument; and(b) a switch having a first terminal selectively connectable to a second terminal, said second terminal being conductively connected to said conductive wall and said first terminal being conductively connected to a ground.
  • 15. The enclosure of claim 14 further comprising an electrically conductive connection of said instrument to a ground.
  • 16. The enclosure of claim 11 wherein said outer surface includes another portion substantially encircling a portion of an electrical conductor arranged to conduct electrical energy from a controller to said thermal device.
  • 17. The enclosure of claim 16 further comprising an electrically conductive connection of said conductive wall to an instrument.
  • 18. The enclosure of claim 17 further comprising an electrically conductive connection of said instrument to a ground.
  • 19. The enclosure of claim 16 further comprising: (a) an electrically conductive connection of said conductive wall to an instrument; and(b) a switch having a first terminal selectively connectable to a second terminal, said second terminal being conductively connected to said conductive wall and said first terminal being conductively connected to a ground.
  • 20. The enclosure of claim 19 further comprising an electrically conductive connection of said instrument to a ground.
CROSS REFERENCE TO RELATED APPLICATIONS

This is a continuation of application Ser. No. 10/308,847, filed Dec. 2, 2002, now U.S. Pat. No. 6,642,732 B2, issued Nov. 4, 2003; which is a continuation of application Ser. No. 10/179,771, filed Jun. 24, 2002, now U.S. Pat. No. 6,512,391 B2, issued Jan. 28, 2003, which is a continuation of application Ser. No. 09/345,571, filed Jun. 30, 1999, now U.S. Pat. No. 6,445,202, issued Sept. 3, 2002.

US Referenced Citations (467)
Number Name Date Kind
1337866 Whitaker Apr 1920 A
2142625 Zoethoul Jan 1939 A
2197081 Piron Apr 1940 A
2376101 Tyzzer May 1945 A
2389668 Johnson Nov 1945 A
2471897 Rappl May 1949 A
2812502 Doherty Nov 1957 A
3176091 Hanson et al. Mar 1965 A
3185927 Margulis et al. May 1965 A
3192844 Szasz et al. Jul 1965 A
3193712 Harris Jul 1965 A
3201721 Voelcker Aug 1965 A
3230299 Radziejowski Jan 1966 A
3256484 Terry Jun 1966 A
3265969 Catu Aug 1966 A
3289046 Carr Nov 1966 A
3333274 Forcier Jul 1967 A
3405361 Kattner et al. Oct 1968 A
3408565 Frick et al. Oct 1968 A
3435185 Gerard Mar 1969 A
3484679 Hodgson et al. Dec 1969 A
3596228 Reed, Jr. et al. Jul 1971 A
3602845 Agrios et al. Aug 1971 A
3609539 Gunthert Sep 1971 A
3648169 Wiesler Mar 1972 A
3654573 Graham Apr 1972 A
3662318 Decuyper May 1972 A
3710251 Hagge et al. Jan 1973 A
3714572 Ham et al. Jan 1973 A
3775644 Cotner et al. Nov 1973 A
3777260 Davies et al. Dec 1973 A
3810017 Wiesler et al. May 1974 A
3814888 Bowers et al. Jun 1974 A
3829076 Sofy Aug 1974 A
3863181 Glance et al. Jan 1975 A
3866093 Kusters et al. Feb 1975 A
3930809 Evans Jan 1976 A
3936743 Roch Feb 1976 A
3970934 Aksu Jul 1976 A
3996517 Fergason et al. Dec 1976 A
4001685 Roch Jan 1977 A
4008900 Khoshaba Feb 1977 A
4009456 Hopfer Feb 1977 A
4027253 Chiron et al. May 1977 A
4035723 Kvaternik Jul 1977 A
4038894 Knibbe et al. Aug 1977 A
4042119 Hassan et al. Aug 1977 A
4049252 Bell Sep 1977 A
4066943 Roch Jan 1978 A
4093988 Scott Jun 1978 A
4099120 Aksu Jul 1978 A
4115735 Stanford Sep 1978 A
4115736 Tracy Sep 1978 A
4116523 Coberly et al. Sep 1978 A
4151465 Lenz Apr 1979 A
4161692 Tarzwell Jul 1979 A
4172993 Leach Oct 1979 A
4186338 Fichtenbaum Jan 1980 A
4275446 Blaess Jun 1981 A
4280112 Eisenhart Jul 1981 A
4284033 delRio Aug 1981 A
4284682 Frosch et al. Aug 1981 A
4287473 Sawyer Sep 1981 A
4342958 Russell Aug 1982 A
4346355 Tsukii Aug 1982 A
4352061 Matrone Sep 1982 A
4357575 Uren et al. Nov 1982 A
4365109 O'Loughlin Dec 1982 A
4365195 Stegens Dec 1982 A
4371742 Manly Feb 1983 A
4376920 Smith Mar 1983 A
4383178 Shibata et al. May 1983 A
4414638 Talambrias Nov 1983 A
4419626 Cedrone et al. Dec 1983 A
4425395 Negishi et al. Jan 1984 A
4426619 Demand Jan 1984 A
4473798 Cedrone et al. Sep 1984 A
4479690 Inouye et al. Oct 1984 A
4480223 Aigo Oct 1984 A
4487996 Rabinowitz et al. Dec 1984 A
4491173 Demand Jan 1985 A
4503335 Takahashi Mar 1985 A
4507602 Aguirre Mar 1985 A
4528504 Thornton, Jr. et al. Jul 1985 A
4531474 Inuta Jul 1985 A
4532423 Tojo et al. Jul 1985 A
4557599 Zimring Dec 1985 A
4566184 Higgins et al. Jan 1986 A
4567321 Harayama Jan 1986 A
4567908 Bolsterli Feb 1986 A
4575676 Palkuti Mar 1986 A
4588970 Donecker et al. May 1986 A
4621169 Petinelli et al. Nov 1986 A
4626618 Takaoka et al. Dec 1986 A
4642417 Ruthrof et al. Feb 1987 A
4646005 Ryan Feb 1987 A
4665360 Phillips May 1987 A
4673839 Veenendaal Jun 1987 A
4675600 Gergin Jun 1987 A
4680538 Dalman et al. Jul 1987 A
4684883 Ackerman et al. Aug 1987 A
4691831 Suzuki et al. Sep 1987 A
4694245 Frommes Sep 1987 A
4695794 Bargett et al. Sep 1987 A
4697143 Lockwood et al. Sep 1987 A
4703433 Sharrit Oct 1987 A
4711563 Lass Dec 1987 A
4712370 MacGee Dec 1987 A
4727637 Buckwitz et al. Mar 1988 A
4730158 Kasai et al. Mar 1988 A
4731577 Logan Mar 1988 A
4734872 Eager et al. Mar 1988 A
4739259 Hadwin et al. Apr 1988 A
4744041 Strunk et al. May 1988 A
4755746 Mallory et al. Jul 1988 A
4755874 Esrig et al. Jul 1988 A
4757255 Margozzi Jul 1988 A
4758785 Rath Jul 1988 A
4759712 Demand Jul 1988 A
4771234 Cook et al. Sep 1988 A
4772846 Reeds Sep 1988 A
4777434 Miller et al. Oct 1988 A
4783625 Harry et al. Nov 1988 A
4784213 Eager et al. Nov 1988 A
4786867 Yamatsu Nov 1988 A
4787752 Fraser et al. Nov 1988 A
4791363 Logan Dec 1988 A
4810981 Herstein Mar 1989 A
4812754 Tracy et al. Mar 1989 A
4816767 Cannon et al. Mar 1989 A
4818169 Schram et al. Apr 1989 A
4827211 Strid et al. May 1989 A
4838802 Soar Jun 1989 A
4839587 Flatley et al. Jun 1989 A
4845426 Nolan et al. Jul 1989 A
4849689 Gleason Jul 1989 A
4853613 Sequeira et al. Aug 1989 A
4856426 Wirz Aug 1989 A
4856904 Akagawa Aug 1989 A
4858160 Strid et al. Aug 1989 A
4859989 McPherson Aug 1989 A
4871883 Guiol Oct 1989 A
4871965 Elbert et al. Oct 1989 A
4884026 Hayakawa et al. Nov 1989 A
4884206 Mate Nov 1989 A
4888550 Reid Dec 1989 A
4893914 Hancock et al. Jan 1990 A
4894612 Drake et al. Jan 1990 A
4896109 Rauscher Jan 1990 A
4899998 Teramachi Feb 1990 A
4904933 Snyder et al. Feb 1990 A
4904935 Calma et al. Feb 1990 A
4906920 Huff et al. Mar 1990 A
4916398 Rath Apr 1990 A
4918279 Babel et al. Apr 1990 A
4918374 Stewart et al. Apr 1990 A
4923407 Rice et al. May 1990 A
4926118 O'Connor et al. May 1990 A
4933634 Cuzin et al. Jun 1990 A
4968931 Littlebury et al. Nov 1990 A
4978907 Smith Dec 1990 A
4978914 Akimoto et al. Dec 1990 A
4982153 Collins et al. Jan 1991 A
4994737 Carlton et al. Feb 1991 A
5001423 Abrami et al. Mar 1991 A
5006796 Burton et al. Apr 1991 A
5010296 Okada et al. Apr 1991 A
5019692 Nbedi et al. May 1991 A
5030907 Yih et al. Jul 1991 A
5034688 Moulene et al. Jul 1991 A
5041782 Marzan Aug 1991 A
5045781 Gleason et al. Sep 1991 A
5061823 Carroll Oct 1991 A
5065089 Rich Nov 1991 A
5065092 Sigler Nov 1991 A
5066357 Smyth, Jr. et al. Nov 1991 A
5070297 Kwon et al. Dec 1991 A
5077523 Blanz Dec 1991 A
5084671 Miyata et al. Jan 1992 A
5089774 Nakano Feb 1992 A
5091691 Kamieniecki et al. Feb 1992 A
5095891 Reitter Mar 1992 A
5097207 Blanz Mar 1992 A
5101149 Adams et al. Mar 1992 A
5101453 Rumbaugh Mar 1992 A
5103169 Heaton et al. Apr 1992 A
5105148 Lee Apr 1992 A
5105181 Ross Apr 1992 A
5107076 Bullock et al. Apr 1992 A
5142224 Smith et al. Aug 1992 A
5144228 Sorna et al. Sep 1992 A
5159752 Mahant-Shetti et al. Nov 1992 A
5160883 Blanz Nov 1992 A
5164661 Jones Nov 1992 A
5166606 Blanz Nov 1992 A
5172049 Kiyokawa et al. Dec 1992 A
5198752 Miyata et al. Mar 1993 A
5198753 Hamburgen Mar 1993 A
5198756 Jenkins et al. Mar 1993 A
5198758 Iknaian et al. Mar 1993 A
5202558 Barker Apr 1993 A
5209088 Vaks May 1993 A
5210485 Kreiger et al. May 1993 A
5214243 Johnson May 1993 A
5214374 St. Onge May 1993 A
5218185 Gross Jun 1993 A
5220277 Reitinger Jun 1993 A
5221905 Bhangu et al. Jun 1993 A
5225037 Elder et al. Jul 1993 A
5225796 Williams et al. Jul 1993 A
5237267 Harwood et al. Aug 1993 A
5266889 Harwood et al. Nov 1993 A
5278494 Obigane Jan 1994 A
5280156 Niori et al. Jan 1994 A
5303938 Miller et al. Apr 1994 A
5315237 Iwakura et al. May 1994 A
5321352 Takebuchi Jun 1994 A
5325052 Yamashita Jun 1994 A
5334931 Clarke et al. Aug 1994 A
5336989 Hofer Aug 1994 A
5345170 Schwindt et al. Sep 1994 A
5369370 Stratmann et al. Nov 1994 A
5371457 Lipp Dec 1994 A
5373231 Boll et al. Dec 1994 A
5382898 Subramanian Jan 1995 A
5397855 Ferlier Mar 1995 A
5404111 Mori et al. Apr 1995 A
5408189 Swart et al. Apr 1995 A
5410259 Fujihara et al. Apr 1995 A
5422574 Kister Jun 1995 A
5434512 Schwindt et al. Jul 1995 A
5451884 Sauerland Sep 1995 A
5457398 Schwindt et al. Oct 1995 A
5461328 Devereaux et al. Oct 1995 A
5469324 Henderson et al. Nov 1995 A
5475316 Hurley et al. Dec 1995 A
5477011 Singles et al. Dec 1995 A
5479108 Cheng Dec 1995 A
5479109 Lau et al. Dec 1995 A
5481936 Yanagisawa Jan 1996 A
5486975 Shamouilian et al. Jan 1996 A
5488954 Sleva et al. Feb 1996 A
5491426 Small Feb 1996 A
5493070 Habu Feb 1996 A
5493236 Ishii et al. Feb 1996 A
5500606 Holmes Mar 1996 A
5506515 Godshalk et al. Apr 1996 A
5508631 Manku et al. Apr 1996 A
5510792 Ono et al. Apr 1996 A
5511010 Burns Apr 1996 A
5515167 Ledger et al. May 1996 A
5517111 Shelor May 1996 A
5521522 Abe et al. May 1996 A
5523694 Cole, Jr. Jun 1996 A
5530371 Perry et al. Jun 1996 A
5530372 Lee et al. Jun 1996 A
5532609 Harwood et al. Jul 1996 A
5539323 Davis, Jr. Jul 1996 A
5546012 Perry et al. Aug 1996 A
5550480 Nelson et al. Aug 1996 A
5550482 Sano Aug 1996 A
5552716 Takahashi et al. Sep 1996 A
5561377 Strid et al. Oct 1996 A
5561585 Barnes et al. Oct 1996 A
5565788 Burr et al. Oct 1996 A
5571324 Sago et al. Nov 1996 A
5572398 Federlin et al. Nov 1996 A
5583445 Mullen Dec 1996 A
5594358 Ishikawa et al. Jan 1997 A
5604444 Harwood et al. Feb 1997 A
5610529 Schwindt Mar 1997 A
5611946 Leong et al. Mar 1997 A
5617035 Swapp Apr 1997 A
5629631 Perry et al. May 1997 A
5631571 Spaziani et al. May 1997 A
5640101 Kuji et al. Jun 1997 A
5646538 Lide et al. Jul 1997 A
5657394 Schwartz et al. Aug 1997 A
5659255 Strid et al. Aug 1997 A
5663653 Schwindt et al. Sep 1997 A
5666063 Abercrombie et al. Sep 1997 A
5668470 Shelor Sep 1997 A
5669316 Faz et al. Sep 1997 A
5670888 Cheng Sep 1997 A
5675499 Lee et al. Oct 1997 A
5675932 Mauney Oct 1997 A
5676360 Boucher et al. Oct 1997 A
5680039 Mochizuki et al. Oct 1997 A
5682337 El-Fishaway et al. Oct 1997 A
5685232 Inoue Nov 1997 A
5712571 O'Donoghue Jan 1998 A
5729150 Schwindt Mar 1998 A
5731708 Sobhami Mar 1998 A
5773951 Markowski et al. Jun 1998 A
5777485 Tanaka et al. Jul 1998 A
5798652 Taraci Aug 1998 A
5804982 Lo et al. Sep 1998 A
5804983 Nakajima et al. Sep 1998 A
5807107 Bright et al. Sep 1998 A
5811751 Leong et al. Sep 1998 A
5828225 Obikane et al. Oct 1998 A
5831442 Heigl Nov 1998 A
5835997 Yassine Nov 1998 A
5838161 Akram et al. Nov 1998 A
5847569 Ho et al. Dec 1998 A
5848500 Kirk Dec 1998 A
5857667 Lee Jan 1999 A
5861743 Pye et al. Jan 1999 A
5869975 Strid et al. Feb 1999 A
5874361 Collins et al. Feb 1999 A
5879289 Yarush et al. Mar 1999 A
5883522 O'Boyle Mar 1999 A
5883523 Ferland et al. Mar 1999 A
5892539 Colvin Apr 1999 A
5900737 Graham et al. May 1999 A
5903143 Mochizuki et al. May 1999 A
5910727 Fujihara et al. Jun 1999 A
5916689 Collins et al. Jun 1999 A
5923177 Wardwell Jul 1999 A
5942907 Chiang Aug 1999 A
5945836 Sayre et al. Aug 1999 A
5949579 Baker Sep 1999 A
5952842 Fujimoto Sep 1999 A
5959461 Brown et al. Sep 1999 A
5960411 Hartman et al. Sep 1999 A
5963027 Peters Oct 1999 A
5963364 Leong et al. Oct 1999 A
5973505 Strid et al. Oct 1999 A
5982166 Mautz Nov 1999 A
5995914 Cabot Nov 1999 A
5998768 Hunter et al. Dec 1999 A
5999268 Yonezawa et al. Dec 1999 A
6001760 Katsuda et al. Dec 1999 A
6002263 Peters et al. Dec 1999 A
6002426 Back et al. Dec 1999 A
6013586 McGhee et al. Jan 2000 A
6023209 Faulkner et al. Feb 2000 A
6028435 Nikawa Feb 2000 A
6029141 Bezos et al. Feb 2000 A
6031383 Streib et al. Feb 2000 A
6034533 Tervo et al. Mar 2000 A
6037785 Higgins Mar 2000 A
6037793 Miyazawa et al. Mar 2000 A
6043667 Cadwallader et al. Mar 2000 A
6049216 Yang et al. Apr 2000 A
6052653 Mazur et al. Apr 2000 A
6054869 Hutton et al. Apr 2000 A
6060888 Blackham et al. May 2000 A
6060891 Hembree et al. May 2000 A
6078183 Cole, Jr. Jun 2000 A
6091236 Piety et al. Jul 2000 A
6091255 Godfrey Jul 2000 A
6096567 Kaplan et al. Aug 2000 A
6104203 Costello et al. Aug 2000 A
6111419 Lefever et al. Aug 2000 A
6114865 Lagowski et al. Sep 2000 A
6118894 Schwartz et al. Sep 2000 A
6121783 Horner et al. Sep 2000 A
6124723 Costello Sep 2000 A
6124725 Sato Sep 2000 A
6127831 Khoury et al. Oct 2000 A
6130544 Strid et al. Oct 2000 A
6137302 Schwindt Oct 2000 A
6137303 Deckert et al. Oct 2000 A
6144212 Mizuta Nov 2000 A
6147851 Anderson Nov 2000 A
6160407 Nikawa Dec 2000 A
6194907 Kanao et al. Feb 2001 B1
6198299 Hollman Mar 2001 B1
6211663 Moulthrop et al. Apr 2001 B1
6222970 Wach et al. Apr 2001 B1
6232787 Lo et al. May 2001 B1
6232788 Schwindt et al. May 2001 B1
6232789 Schwindt May 2001 B1
6232790 Bryan et al. May 2001 B1
6236975 Boe et al. May 2001 B1
6236977 Verba et al. May 2001 B1
6245692 Pearce et al. Jun 2001 B1
6252392 Peters Jun 2001 B1
6257319 Kainuma et al. Jul 2001 B1
6259261 Engelking et al. Jul 2001 B1
6271673 Furuta et al. Aug 2001 B1
6284971 Atalar et al. Sep 2001 B1
6288557 Peters et al. Sep 2001 B1
6292760 Burns Sep 2001 B1
6300775 Peach et al. Oct 2001 B1
6310755 Kholodenko et al. Oct 2001 B1
6313649 Harwood et al. Nov 2001 B1
6320372 Keller Nov 2001 B1
6320396 Nikawa Nov 2001 B1
6335628 Schwindt et al. Jan 2002 B1
6362636 Peters et al. Mar 2002 B1
6380751 Harwood et al. Apr 2002 B1
6396296 Tarter et al. May 2002 B1
6424141 Hollman et al. Jul 2002 B1
6445202 Cowan et al. Sep 2002 B1
6480013 Nayler et al. Nov 2002 B1
6483327 Bruce et al. Nov 2002 B1
6483336 Harris et al. Nov 2002 B1
6486687 Harwood et al. Nov 2002 B1
6488405 Eppes et al. Dec 2002 B1
6489789 Peters et al. Dec 2002 B1
6492822 Schwindt et al. Dec 2002 B1
6501289 Takekoshi Dec 2002 B1
6512391 Cowan et al. Jan 2003 B1
6549022 Cole, Jr. et al. Apr 2003 B1
6549106 Martin Apr 2003 B1
6573702 Marcuse et al. Jun 2003 B1
6605951 Cowan Aug 2003 B1
6605955 Costello et al. Aug 2003 B1
6608494 Bruce et al. Aug 2003 B1
6608496 Strid et al. Aug 2003 B1
6617862 Bruce Sep 2003 B1
6621082 Morita et al. Sep 2003 B1
6624891 Marcus et al. Sep 2003 B1
6633174 Satya et al. Oct 2003 B1
6636059 Harwood et al. Oct 2003 B1
6639415 Peters et al. Oct 2003 B1
6642732 Cowan et al. Nov 2003 B1
6643597 Dunsmore Nov 2003 B1
6686753 Kitahata Feb 2004 B1
6701265 Hill et al. Mar 2004 B1
6710798 Hershel et al. Mar 2004 B1
6720782 Schwindt et al. Apr 2004 B1
6724205 Hayden et al. Apr 2004 B1
6724928 Davis Apr 2004 B1
6734687 Ishitani et al. May 2004 B1
6744268 Hollman Jun 2004 B1
6771090 Harris et al. Aug 2004 B1
6771806 Satya et al. Aug 2004 B1
6774651 Hembree Aug 2004 B1
6777964 Navratil et al. Aug 2004 B1
6788093 Aitren et al. Sep 2004 B1
6791344 Cook et al. Sep 2004 B1
6801047 Harwood et al. Oct 2004 B1
6806724 Hayden et al. Oct 2004 B1
6836135 Harris et al. Dec 2004 B1
6838885 Kamitani Jan 2005 B1
6842024 Peters et al. Jan 2005 B1
6843024 Nozaki et al. Jan 2005 B1
6847219 Lesher et al. Jan 2005 B1
6856129 Thomas et al. Feb 2005 B1
6861856 Dunklee et al. Mar 2005 B1
6873167 Goto et al. Mar 2005 B1
6885197 Harris et al. Apr 2005 B1
6927079 Fyfield Aug 2005 B1
20010009377 Schwindt et al. Jul 2001 A1
20010010468 Gleason et al. Aug 2001 A1
20010020283 Sakaguchi Sep 2001 A1
20010030549 Gleason et al. Oct 2001 A1
20020075027 Hollman et al. Jun 2002 A1
20020118009 Hollman et al. Aug 2002 A1
20030057513 Alexander Apr 2003 A1
20030062915 Arnold et al. Apr 2003 A1
20030071631 Alexander Apr 2003 A1
20030141861 Navratil et al. Jul 2003 A1
20040061514 Schwindt et al. Apr 2004 A1
20040095145 Boudlaf et al. May 2004 A1
20040100276 Fanton May 2004 A1
20040113639 Dunklee et al. Jun 2004 A1
20040162689 Jamneala et al. Aug 2004 A1
20040193382 Adamian et al. Sep 2004 A1
20040199350 Blackham et al. Oct 2004 A1
20040207424 Hollman Oct 2004 A1
20040251922 Martens et al. Dec 2004 A1
20050024069 Hayden et al. Feb 2005 A1
20050099192 Dunklee et al. May 2005 A1
Foreign Referenced Citations (44)
Number Date Country
31 14 466 Mar 1982 DE
31 25 552 Nov 1982 DE
41 09 908 Oct 1992 DE
43 16 111 Nov 1994 DE
195 41 334 Sep 1996 DE
196 16 212 Oct 1996 DE
196 18 717 Jan 1998 DE
0 087 497 Sep 1983 EP
0 201 205 Dec 1986 EP
0 314 481 May 1989 EP
0 333 521 Sep 1989 EP
0 460 911 Dec 1991 EP
0 574 149 Dec 1993 EP
0 706 210 Apr 1996 EP
0 573 183 Jan 1999 EP
2 197 081 May 1988 GB
53-052354 May 1978 JP
56-007439 Jan 1981 JP
62-011243 Jan 1987 JP
63-143814 Jun 1988 JP
1-165968 Jun 1989 JP
1-178872 Jul 1989 JP
1-209380 Aug 1989 JP
1-214038 Aug 1989 JP
1-219575 Sep 1989 JP
1-296167 Nov 1989 JP
2-22837 Jan 1990 JP
2-22873 Jan 1990 JP
3-175367 Jul 1991 JP
5-157790 Jun 1993 JP
5-166893 Jul 1993 JP
60-71425 Mar 1994 JP
7005078 Jan 1995 JP
10-116866 May 1998 JP
11-031724 Feb 1999 JP
2001-189285 Jul 2001 JP
2001-189378 Jul 2001 JP
2002033374 Jan 2002 JP
2002-164396 Jun 2002 JP
WO 8000101 Jan 1980 WO
WO 8607493 Dec 1986 WO
WO 8904001 May 1989 WO
WO 0169656 Sep 2001 WO
WO 2004049395 Jun 2004 WO
Related Publications (1)
Number Date Country
20040150416 A1 Aug 2004 US
Continuations (3)
Number Date Country
Parent 10308847 Dec 2002 US
Child 10626903 US
Parent 10179771 Jun 2002 US
Child 10308847 US
Parent 09345571 Jun 1999 US
Child 10179771 US