John E. Bjorkholm, EUV Lithography-The Successor to Optical Lithography?, 8 pages, Intel Corp., Santa Clara. |
Michael Lercel, et al., Examining the Challenges Posed by NGL Photomask Fabrication, MicroMagazine.com, 2001, 12 pages. |
Rajendra Aithal, EUV Lithography: Competitor for the Next Generation Lithography, Dept. of Electrical Engineering, Institute for Micromanufacturing. |
Dr. Lutz Aschke, Fit for Future—Chip Technology, 99/2001, Schott Info, 3 pages. |
EUVL Mask Blank Defect Inspection, 2 pages http://www-mask.lbl.gov/Pages/masks.html. |
Linus Fetter, et al.,Patterning of Membrane Masks for Projection e-Beam Lithography, Bell Laboratories, Lucent Technologies, NJ. |
Peter J. Silverman, The Intel Lithography Roadmap, Intel Technology Journal, May 2002, pp. 55-61, vol. 6, Issue 02, Intel Corp. |
Intel, Intel Delivers Photomask for EUV Lithography, Mar. 2001, Intel Labs. |
Charles W. Gwynn, Extreme Ultraviolet Lithography for Next Generation IC's, Oct. 2000, MDR Forum. |