Number | Name | Date | Kind |
---|---|---|---|
5538833 | Ferguson et al. | Jul 1996 | A |
5795685 | Liebmann et al. | Aug 1998 | A |
5807649 | Liebmann et al. | Sep 1998 | A |
5919605 | Uchiyama | Jul 1999 | A |
Entry |
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H.Y.Liu et al. “The Application of Alternating Phase-shifting masks to 140nm Gate Patterning”, SPIE, 1998, v3334, p 2-14.* |
“Understanding The DUV Resist Development Process Using A Develop Residue Monitoring Technique,” Christopher L. Pike and Jeff Erhardt, Advanced Micro Devices, Inc., Sunnyvale, California. Published and Presented at Olin Interface '99 Conference, San Diego, California, Oct. 1999. |