Claims
- 1. A scanning exposure apparatus in which a mask and a substrate are moved in respective scanning directions during scanning exposure, the apparatus comprising:a scanning system having a mask stage, a substrate stage, a mask interferometer system which detects positional information of the mask stage, and a substrate interferometer system which detects positional information of the substrate stage, which moves the mask and the substrate synchronously relative to exposure light from an illumination system; an optical device disposed in the illumination system, which defines an illumination area of the exposure light; and an optical filter arranged in the illumination system, which changes intensity distribution of the exposure light within the illumination area in a direction perpendicular to the scanning direction.
- 2. A scanning exposure apparatus according to claim 1, wherein the optical device changes shape and size of the illumination area.
- 3. A scanning exposure apparatus according to claim 2, wherein the optical device includes movable members.
- 4. A scanning exposure apparatus according to claim 1, wherein relative relationship between the scanning direction of the mask and the scanning direction of the substrate is controlled based on the positional information of the mask and substrate interferometer systems.
- 5. A scanning exposure apparatus according to claim 1, wherein during the scanning exposure, relative speed between the mask and the substrate is adjusted.
- 6. A scanning exposure apparatus according to claim 5, wherein during the scanning exposure, an image projected onto the substrate via a projection system is adjusted.
- 7. A scanning exposure apparatus according to claim 1, further comprising:a projection system; and an image adjustment system which adjusts a magnification of the projection system in accordance with a size of a pattern on the substrate in the direction perpendicular to the scanning direction, and which adjusts a relative speed between the mask and the substrate in accordance with the size of the pattern on the substrate in the scanning direction.
- 8. A scanning exposure apparatus according to claim 1, further comprising:an adjustment system which adjusts a pattern to be formed on the substrate in accordance with distortion of a pattern on the substrate, wherein the optical filter changes the intensity distribution in accordance with an operation of the adjustment system.
- 9. A scanning exposure apparatus according to claim 8, wherein the adjustment system changes a shape of the illumination area of the exposure light.
- 10. A scanning exposure apparatus according to claim 9, wherein the adjustment system changes, during the scanning exposure, a relative angle between the mask and the substrate.
- 11. A scanning exposure apparatus according to claim 8, wherein the adjustment system changes, during the scanning exposure, a relative angle between the mask and the substrate.
- 12. A scanning exposure apparatus according to claim 8, wherein the pattern formed on the substrate has trapezoidal distortion.
- 13. A scanning exposure apparatus according to claim 8, wherein the distortion of the pattern on the substrate is determined based on information obtained by detecting marks on the substrate.
- 14. A scanning exposure apparatus according to claim 13, wherein the adjustment system changes a shape of the illumination area of the exposure light.
- 15. A scanning exposure apparatus according to claim 13, wherein the adjustment system changes a relative angle between the mask and the substrate.
- 16. A scanning exposure apparatus according to claim 15, wherein the adjustment system changes a shape of the illumination area of the exposure light.
Priority Claims (3)
Number |
Date |
Country |
Kind |
5-100621 |
Apr 1993 |
JP |
|
5-200911 |
Aug 1993 |
JP |
|
7-21455 |
Feb 1995 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of application Ser. No. 09/150,006 filed Sep. 9, 1998 now abandoned; which is a continuation of application Ser. No. 08/533,923 filed Sep. 26, 1995 now abandoned, which is a continuation-in-part of application Ser. No. 08/506,367 filed Jul. 24, 1995 now abandoned, which is a continuation of application Ser. No. 08/233,319 filed Apr. 26, 1994 now abandoned.
US Referenced Citations (38)
Foreign Referenced Citations (7)
Number |
Date |
Country |
61-91662 |
May 1986 |
JP |
63-128713 |
Jun 1988 |
JP |
2-297918 |
Dec 1990 |
JP |
4-196513 |
Jul 1992 |
JP |
4-225514 |
Aug 1992 |
JP |
5-62878 |
Mar 1993 |
JP |
5-29129 |
Apr 1993 |
JP |
Non-Patent Literature Citations (1)
Entry |
Buckley, Jere D., “Expanding the Horizons of Optical Projection Lithography”, Solid State Technology, pp. 77-82, May, 1982. |
Continuations (3)
|
Number |
Date |
Country |
Parent |
09/150006 |
Sep 1998 |
US |
Child |
10/268907 |
|
US |
Parent |
08/533923 |
Sep 1995 |
US |
Child |
09/150006 |
|
US |
Parent |
08/233319 |
Apr 1994 |
US |
Child |
08/506367 |
|
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
08/506367 |
Jul 1995 |
US |
Child |
08/533923 |
|
US |