Semiconductor device having overlapped via apertures

Abstract
Disclosed is a semiconductor device having overlapped via apertures formed in an encapsulant to outwardly expose solder balls. When different types of semiconductor devices are electrically connected to the solder balls through the overlapped via apertures, flux or solder paste is unlikely to contact sidewall portions of the overlapped via apertures. Therefore, different types of semiconductor devices can be mounted with improved efficiency.
Description
TECHNICAL FIELD

The present application relates to a semiconductor device having an overlapped via aperture.


BACKGROUND

In order to integrate a logic device including a baseband, application, an image processor, and the like, and a high performance memory of a mobile product such as a smart phone handset or a digital camera, a package-on-package (PoP) has come into the spotlight. One exemplary PoP is generally constructed such that a logic device is implemented on a printed circuit board by wire bonding or flip chip bonding and a memory device is electrically connected to the logic device by solder balls.


Recently, considerations for POP are an increased number of pins and higher electrical performance. Moreover, future trends required for POP include increased interconnect density, a reduced pitch, reduced package size and thickness, improved warpage controllability, a reduction in the tooling cost, a variety of interconnect architectures, and so on.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1A is a cross-sectional view of a semiconductor device according to an embodiment;



FIG. 1B is an enlarged cross-sectional view of a portion 1B of the semiconductor device of FIG. 1A;



FIG. 2A is a top plan view of the semiconductor device of FIG. 1A according to an embodiment;



FIG. 2B is an enlarged top plan view of a portion 2B of the semiconductor package of FIG. 2A;



FIG. 3 is a cross-sectional view of a package-on-package using the semiconductor device according to an embodiment;



FIGS. 4A, 4B, 4C, 4D are cross-sectional views illustrating a method of manufacturing a semiconductor device according to another embodiment; and



FIG. 5 is a cross-sectional view illustrating a state in which the semiconductor device of FIG. 1A is connected to another semiconductor device according to another embodiment.





Common reference numerals are used throughout the drawings and the detailed description to indicate the same or similar elements.


DETAILED DESCRIPTION

As an overview and in accordance with one embodiment, referring to FIGS. 1A, 1B, 2A, 2B, a semiconductor device 100 includes overlapped via apertures 151 formed in an encapsulant 150 to outwardly expose solder balls 140. Referring now to FIG. 5, when different types of semiconductor devices 201 are electrically connected to the solder balls 140 through the overlapped via apertures 151, flux or solder paste 203 is unlikely to contact sidewall portions 151b of the overlapped via apertures 151. Therefore, different types of semiconductor devices 201 can be mounted with improved efficiency.


Now in more detail, FIG. 1A is a cross-sectional view of a semiconductor device 100 according to an embodiment. FIG. 1B is an enlarged cross-sectional view of a portion 1B of the semiconductor device 100 of FIG. 1A.


As illustrated in FIGS. 1A and 1B, the semiconductor device 100, sometimes called an assembly, includes a printed circuit board 110, a semiconductor die 120, a plurality of conductive bumps 130, a plurality of first solder balls 140, an encapsulant 150, and a plurality of second solder balls 160.


The printed circuit board 110, sometimes called a substrate, includes an insulation layer 111, a first circuit pattern 112, a first solder mask 113, a second circuit pattern 114, a second solder mask 115, and conductive vias 116. The insulation layer 111 has a substantially planar first surface 111a, and a substantially planar second surface 111b opposite to the first surface 111a. In addition, the insulation layer 111 may be made of a rigid or flexible material, but is not limited thereto.


The first circuit pattern 112 is formed on the first surface 111a of the insulation layer 111, and may be generally formed of a copper pattern. The first solder mask 113 covers the first circuit pattern 112 and the first surface 111a around the first circuit pattern 112. However, the first solder mask 113 is not formed on a predetermined area, e.g., on bond fingers and/or terminals, of the first circuit pattern 112 requiring an electrical connection. For example, the first solder mask 113 is not formed at an area of the first circuit pattern 112, where the conductive bumps 130 and the first solder balls 140 are connected to the first circuit pattern 112, which will later be described.


The second circuit pattern 114 is formed on the second surface 111b of the insulation layer 111, and is generally formed of a copper pattern. The second solder mask 115 covers the second circuit pattern 114 and the second surface 111b around the second circuit pattern 114. However, the second solder mask 115 is not formed at a predetermined area, e.g., terminals, of the second circuit pattern 114 requiring an electrical connection. For example, the second solder mask 115 is not formed at an area, e.g., terminals, of the second circuit pattern 114 connected to the second solder balls 160, which will later be described.


The semiconductor die 120 is positioned on the printed circuit board 110. In addition, the semiconductor die 120 includes a plurality of bond pads 121 that face toward the printed circuit board 110. The semiconductor die 120 may be a general memory semiconductor, a logic semiconductor, or the like, but is not limited thereto. A width of the semiconductor die 120 is generally smaller than the width of the printed circuit board 110.


The conductive bumps 130 are formed between the printed circuit board 110 and the semiconductor die 120 to electrically connect the printed circuit board 110 and the semiconductor die 120 to each other. That is to say, the conductive bumps 130 electrically connect the bond pad 121 of the semiconductor die 120 to the first circuit pattern 112, e.g., bond fingers thereof, of the printed circuit board 110. The conductive bumps 130 may be made of any one selected from gold (Au), silver (Ag), solder, and equivalents thereof, but are not limited thereto.


The first solder balls 140 are electrically connected to the first circuit pattern 112, e.g., terminals thereof, of the printed circuit board 110. That is to say, the first solder balls 140 are electrically connected to the first circuit pattern 112 formed at the outer periphery of the semiconductor die 120. In addition, the first solder balls 140 may be made of any one selected from tin-lead (Sn—Pb), tin-lead-silver (Sn—Pb—Ag), tin-lead-bismuth (Sn—Pb—Bi), tin-copper (Sn—Cu), tin-silver (Sn—Ag), tin-bismuth (Sn—Bi), tin-silver-copper (Sn—Ag—Cu), tin-silver-bismuth (Sn—Ag—Bi), tin-zinc (Sn—Zn), and equivalents thereof, but are not limited thereto.


The encapsulant 150 covers the semiconductor die 120 mounted on the printed circuit board 110 and the conductive bumps 130, thereby, protecting the same from the outside environments. The encapsulant 150 also covers lower regions of the first solder balls 140.


Meanwhile, overlapped via apertures 151 are formed in the encapsulant 150 to allow the plurality of first solder balls 140 to be exposed outwardly together. In an exemplary embodiment, the overlapped via apertures 151 formed in the encapsulant 150 expose the plurality of first solder balls 140 upwardly together.


In more detail, the overlapped via aperture 151 is defined by a bottom portion 151a of the encapsulant 150. Accordingly, the overlapped via aperture 151 is sometimes said to have a bottom portion 151a. The bottom portion 151a covers the first solder ball 140 and is generally shaped as an annulus.


The overlapped via aperture 151 is further defined by a sidewall portion 151b of the encapsulant 150. Accordingly, the overlapped via aperture 151 is sometimes said to have a sidewall portion 151b. The sidewall portion 151b is separated from the plurality of first solder balls 140 and upwardly extends from the bottom portion 151a to a top portion 150f of the encapsulant 150. A first protrusion 151e of the encapsulant 150 is formed substantially in the middle of (between) adjacent bottom portions 151a and protrudes upwards from the bottom portions 151a.


The bottom portions 151a are formed to be substantially planar and cover lower portions of the first solder balls 140, as described above. In addition, the sidewall portions 151b are formed at an angle in a range of approximately 70° to approximately 90° with respect to the bottom portions 151a and are spaced a predetermined distance apart from the first solder balls 140. In addition, the first protrusion 151e is formed at the center between each of the bottom portion 151a and/or the center between each of the plurality of first solder balls 140.


A thickness of the first protrusion 151e is smaller than that of the encapsulant 150. In practice, the thickness of the first protrusion 151e may be smaller than a diameter of the first solder balls 140. In one embodiment, the height of a top end 151g of the first protrusion 151e above the printed circuit board 110 may be lower than the height of the center of the first solder balls 140 above the printed circuit board 110.


However, in other embodiments, the height of the top end 151g of the first protrusion 151e above the printed circuit board 110 may be lower than, equal to, or greater than, the height of the first solder balls 140 above the printed circuit board 110. Generally, the greater the overlap between overlapped via aperture 151, the lower the height of top end 151g of the first protrusion 151e above the printed circuit board 110.


A width of the overlapped via aperture 151 is greater than a pitch between the first solder balls 140. The pitch is the center to center spacing between adjacent first solder balls 140. The width of the overlapped via apertures 151 is greater than the pitch of the first solder balls 140 such the overlapped via apertures 151 overlap each other. A second protrusion 152 is formed inward of the first protrusions 151e, which will further be described below.


The second solder balls 160 are electrically connected to the second circuit pattern 114 of the printed circuit board 110. The second solder balls 160 are to be later mounted on an external device (not shown) such as a larger circuit board. Therefore, the second solder balls 160 practically electrically connect the semiconductor device 100 to the external device while mechanically fixing the semiconductor device 100 to the external device.



FIG. 2A is a top plan view of the semiconductor device 100 of FIG. 1A according to an embodiment. FIG. 2B is an enlarged top plan view of a portion 2B of the semiconductor device 100 of FIG. 2A. As illustrated in FIGS. 2A and 2B, a plurality of overlapped via apertures 151 collectively shaped as a substantially square dual-stacked line are formed in the encapsulant 150. In addition, a plurality of first solder balls 140 are outwardly exposed together through the overlapped via apertures 151. In the illustrated embodiment, the overlapped via apertures 151 collectively have a substantially square, two lined shape.


In alternative embodiments, however, overlapped via apertures 151 collectively have a substantially square shape of two or more lines, or have several disconnected overlapped via apertures. That is to say, the shapes of the overlapped via apertures 151 are not limited to that illustrated in the exemplary embodiment.


The overlapped via apertures 151 outwardly exposing the plurality of first solder balls 140 together according to the illustrated embodiment will now be described in detail. Generally, each overlapped via aperture 151 is defined by an imaginary circle 155 in the plane of top portion 150f of encapsulant 150. The imaginary circles 155 of adjacent overlapped via apertures 151 overlap each other such that the sidewall portions 151b and sides 152a, which lie upon the imaginary circle 155, of the overlapped via apertures 151 are separated from one another.


Where two imaginary circles 155 overlap each other, the first protrusion 151e is formed. At a central area defined by four imaginary circles 155, the second protrusion 152 is formed. The second protrusion 152 is a portion of the encapsulant 150 that was not removed during formation of overlapped via apertures 151, but is surrounded by the overlapped via apertures 151.


The overlapped via apertures 151 have the sidewall portions 151b each having a substantially arc-shaped curve 151c partially corresponding to the circumference of each of the first solder balls 140. The arc-shaped curve 151c is a portion of the imaginary circle 155.


The arc-shaped curves 151c and imaginary circles 155 overlap each other, forming overlapped areas 151d. Each of the first solder balls 140 is positioned within the arc-shaped curve 151c and imaginary circle 155. In addition, a predetermined area of the bottom portion 151a, extending from the first solder balls 140 to the sidewall portion 151b, is exposed.


The first protrusion 151e is formed at the overlapped area 151d between one of the first solder balls 140 and the other adjacent to the one of the first solder balls 140, i.e., between adjacent solder balls 140. That is to say, the first protrusion 151e having a height smaller than the encapsulant 150 is formed in each of the overlapped areas 151d.


A second protrusion 152, sometimes called a central protrusion 152, having a predetermined thickness is formed at the center of an area formed by, for example, four of the first solder balls 140. The thickness of the second protrusion 152 is the same as that of the encapsulant 150, i.e., a top end 152f of the second protrusion 152 is parallel to and coplanar with the top portion 150f of the encapsulant 150.


The second protrusion 152 may be shaped of a diamond or rhombus having a plurality of sides 152a. In addition, centers of the respective sides 152a of the second protrusion 152 are recessed or bent, i.e., curved, toward of the center of the second protrusion 152. The center of the respective sides 152a of the second protrusion 152 face the center of the first solder balls 140 corresponding thereto. In addition, the second protrusion 152 has four vertices 152b, which face between the center of two, for example, of the first solder balls 140. Further, each of the vertices 152b of the second protrusion 152 faces the overlapped area 151d of the arc-shaped curve 151c and the first protrusion 151e formed in the overlapped area 151d.



FIG. 3 is a cross-sectional view of a package-on-package 200 using the semiconductor device 100 according to an embodiment. As illustrated in FIG. 3, a semiconductor device 201 is mounted on the semiconductor device 100, thereby achieving the package-on-package 200, sometimes called an assembly. Here, the semiconductor device 201 different from the semiconductor device 100 may be a memory semiconductor, a logic semiconductor, and equivalents thereof, but is not limited thereto. In an exemplary embodiment, if the semiconductor device 100 is a memory semiconductor, the semiconductor device 201 may be a logic semiconductor.


The semiconductor device 201 according to the illustrated embodiment may also include solder balls 202, which are electrically connected to first solder balls 140 through the exposed overlapped via apertures 151. In practice, the solder balls 202 and the first solder balls 140 of different types of the semiconductor devices 100 and 201 are reflown, followed by cooling, thereby being electrically connected to each other as integral solder columns 204.



FIGS. 4A, 4B, 4C, 4D are cross-sectional views illustrating a method of manufacturing a semiconductor device according to another embodiment. As illustrated in FIG. 4A, the semiconductor die 120 is attached to the printed circuit board 110 using the conductive bumps 130. In addition, a plurality of first solder balls 140 are also attached to the printed circuit board 110.


The semiconductor die 120 having the conductive bumps 130 attached thereto is placed on the printed circuit board 110, e.g., to bond fingers of the first circuit pattern 112, to then perform a general reflow process to attach the semiconductor die 120 to the printed circuit board 110. In addition, the first solder balls 140 are placed on the printed circuit board 110, e.g., on terminals of the first circuit pattern 112, using flux to then perform a general reflow process to attach the first solder balls 140 to the printed circuit board 110.


Here, a die attaching process may first be performed and a solder ball attaching process may then be performed, and vice versa. Alternatively, the die attaching process and the solder ball attaching process may be performed at the same time.


As illustrated in FIG. 4B, the semiconductor die 120, the conductive bumps 130 and the first solder balls 140 are encapsulated using the encapsulant 150. In an exemplary embodiment, the semiconductor device shown in FIG. 4A is positioned inside a mold and the encapsulant 150 in a liquid phase is injected into the mold. Subsequently, if the encapsulant 150 injected into the mold is cured, the encapsulated semiconductor device 100 is taken out from the mold. After the encapsulation, a curing process may further be performed.


As illustrated in FIG. 4C, a predetermined area of the encapsulant 150 corresponding to the plurality of first solder balls 140 is removed by a laser beam, e.g., using laser-ablation, thereby forming the overlapped via apertures 151. Here, the laser beam is supplied to a predetermined area of the encapsulant 150 corresponding to one first solder ball 140.


Additionally, a width or area of the encapsulant 150 removed by the laser beam is greater than that of the one first solder ball 140. Therefore, if the laser beam is supplied to four first solder balls 140, like in an exemplary embodiment, the planar overlapped via apertures 151 according to the illustrated embodiment may have a first protrusion 151e having a thickness smaller than that of the encapsulant 150, and a second protrusion 152 having a thickness equal to that of the encapsulant 150.


The first protrusion 151e is formed at a boundary area between one of the four first solder balls 140 (and a first overlapped via aperture 151) and the other adjacent to the one first solder ball 140 (and an adjacent second overlapped via aperture 151). The second protrusion 152 is formed at a central area formed by, for example, four first solder balls 140 (and four adjacent overlapped via apertures 151).


Here, the overlapped via apertures 151 formed by the laser beam includes a substantially planar bottom portion 151a formed around the solder balls 140, a sidewall portion 151b separated from the solder balls 140, and a side 152a also separated from the solder balls 140. In addition, the laser beam makes the bottom portion 151a remain on the printed circuit board 110 to a predetermined thickness, thereby allowing the first solder balls 140 to be tightly interlocked with the bottom portion 151a.


As illustrated in FIG. 4D, a plurality of second solder balls 160 are attached to the printed circuit board 110, e.g., to terminals of the second circuit pattern 114. In an exemplary embodiment, the second solder balls 160 are placed on the printed circuit board 110 using flux to then perform a general reflow process to attach the second solder balls 160 to the printed circuit board 110. In practice, since the semiconductor device shown in FIG. 4D is processed upside down, the printed circuit board 110 and the second solder balls 160 are not separated from each other due to a gravitational action.



FIG. 5 is a cross-sectional view illustrating a state in which the semiconductor device 100 of FIG. 1A is connected to another semiconductor device 201 according to another embodiment to form the package-on-package 200. As illustrated in FIG. 5, the semiconductor device 201 may be electrically connected to the semiconductor device 100 according to one embodiment. Here, commonly used flux 203 or solder paste may be used as a connection medium.


In the illustrated embodiment, an overlapped via aperture 151 having a relatively large width or area is formed on the semiconductor device 100. Thus, when solder balls 202 of another semiconductor device 201 are temporarily attached onto the semiconductor device 100 using, for example, flux 203, the flux 203 is unlikely to touch sidewall portions 151b of the overlapped via apertures 151.


Therefore, during a reflow process, the first solder balls 140 formed in the semiconductor device 100 and the solder balls 202 formed in another semiconductor device 201 are uniformly melted and cooled, so that the semiconductor device 201 is not tilted. Since the overlying semiconductor device 201 is not tilted, a good package-on-package 200 can be obtained.


Although specific embodiments were described herein, the scope of the invention is not limited to those specific embodiments. Numerous variations, whether explicitly given in the specification or not, such as differences in structure, dimension, and use of material, are possible. The scope of the invention is at least as broad as given by the following claims.

Claims
  • 1. An assembly comprising: a substrate comprising a first surface;a semiconductor die coupled to the first surface of the substrate;an encapsulant covering the first surface of the substrate and the semiconductor die;first solder balls coupled to the first surface of the substrate;overlapped via apertures formed in the encapsulant and exposing the first solder balls, wherein a width of the overlapped via apertures is greater than a pitch of the first solder balls such that the overlapped via apertures overlap each other; anda first protrusion having a vertical thickness smaller than that of the encapsulant formed between a bottom portion of a first overlapped via aperture and a bottom portion of a second overlapped via aperture, the first protrusion being a portion of the encapsulant.
  • 2. The assembly of claim 1, wherein the overlapped via apertures comprise bottom portions, the bottom portions covering the first solder balls.
  • 3. The assembly of claim 2, wherein the overlapped via apertures further comprise sidewall portions separated from the first solder balls.
  • 4. The assembly of claim 3 wherein the sidewall portions extend upwardly from the bottom portions to a top portion of the encapsulant.
  • 5. The assembly of claim 1 wherein the first protrusion is formed between one of the first solder balls and an adjacent one of the first solder balls.
  • 6. The assembly of claim 1, wherein the height of the first protrusion is less than a height of the first solder balls.
  • 7. The assembly of claim 1, wherein the height of the first protrusion is equal to a height of the first solder balls.
  • 8. The assembly of claim 1, wherein the height of the first protrusion is greater than a height of the first solder balls.
  • 9. The assembly of claim 1 further comprising a second semiconductor device coupled to the first solder balls through the overlapped via apertures.
  • 10. A method of forming an assembly comprising: coupling a semiconductor die to a substrate;coupling first solder balls to the substrate;encapsulating the semiconductor die and the first solder balls in an encapsulant;forming overlapped via apertures in the encapsulant to expose the first solder balls such that the overlapped via apertures overlap each other comprising:forming a first protrusion having a vertical thickness smaller than a vertical thickness of the encapsulant, the first protrusion being between a bottom portion of a first overlapped via aperture of the overlapped via apertures and a bottom portion of a second overlapped via aperture of the overlapped via apertures, the first protrusion being a portion of the encapsulant.
  • 11. The method of claim 10 wherein the forming overlapped via apertures further comprises: forming a second protrusion having a vertical thickness equal to a vertical thickness of the encapsulant at a central area formed by the overlapped via apertures.
US Referenced Citations (187)
Number Name Date Kind
3868724 Perrino Feb 1975 A
3916434 Garboushian Oct 1975 A
4322778 Barbour et al. Mar 1982 A
4532419 Takeda Jul 1985 A
4642160 Burgess Feb 1987 A
4645552 Vitriol et al. Feb 1987 A
4685033 Inoue Aug 1987 A
4706167 Sullivan Nov 1987 A
4716049 Patraw Dec 1987 A
4786952 MacIver et al. Nov 1988 A
4806188 Rellick Feb 1989 A
4811082 Jacobs et al. Mar 1989 A
4897338 Spicciati et al. Jan 1990 A
4905124 Banjo et al. Feb 1990 A
4964212 Deroux-Dauphin et al. Oct 1990 A
4974120 Kodai et al. Nov 1990 A
4996391 Schmidt Feb 1991 A
5021047 Movern Jun 1991 A
5072075 Lee et al. Dec 1991 A
5072520 Nelson Dec 1991 A
5081520 Yoshii et al. Jan 1992 A
5091769 Eichelberger Feb 1992 A
5108553 Foster et al. Apr 1992 A
5110664 Nakanishi et al. May 1992 A
5191174 Chang et al. Mar 1993 A
5229550 Bindra et al. Jul 1993 A
5239448 Perkins et al. Aug 1993 A
5247429 Iwase et al. Sep 1993 A
5250843 Eichelberger Oct 1993 A
5278726 Bernardoni et al. Jan 1994 A
5283459 Hirano et al. Feb 1994 A
5353498 Fillion et al. Oct 1994 A
5371654 Beaman et al. Dec 1994 A
5379191 Carey et al. Jan 1995 A
5404044 Booth et al. Apr 1995 A
5463253 Waki et al. Oct 1995 A
5474957 Urushima Dec 1995 A
5474958 Djennas et al. Dec 1995 A
5497033 Fillion et al. Mar 1996 A
5508938 Wheeler Apr 1996 A
5530288 Stone Jun 1996 A
5531020 Durand et al. Jul 1996 A
5546654 Wojnarowski et al. Aug 1996 A
5574309 Papapietro et al. Nov 1996 A
5581498 Ludwig et al. Dec 1996 A
5582858 Adamopoulos et al. Dec 1996 A
5608265 Kitano et al. Mar 1997 A
5616422 Ballard et al. Apr 1997 A
5637832 Danner Jun 1997 A
5674785 Akram et al. Oct 1997 A
5719749 Stopperan Feb 1998 A
5726493 Yamashita et al. Mar 1998 A
5739581 Chillara Apr 1998 A
5739585 Akram et al. Apr 1998 A
5739588 Ishida et al. Apr 1998 A
5742479 Asakura Apr 1998 A
5774340 Chang et al. Jun 1998 A
5784259 Asakura Jul 1998 A
5798014 Weber Aug 1998 A
5822190 Iwasaki Oct 1998 A
5826330 Isoda et al. Oct 1998 A
5835355 Dordi Nov 1998 A
5847453 Uematsu et al. Dec 1998 A
5883425 Kobayashi Mar 1999 A
5894108 Mostafazadeh et al. Apr 1999 A
5903052 Chen et al. May 1999 A
5907477 Tuttle et al. May 1999 A
5924003 Slocum Jul 1999 A
5936843 Ohshima et al. Aug 1999 A
5952611 Eng et al. Sep 1999 A
5973393 Chia et al. Oct 1999 A
6004619 Dippon et al. Dec 1999 A
6013948 Akram et al. Jan 2000 A
6021564 Hanson Feb 2000 A
6028364 Ogino et al. Feb 2000 A
6034427 Lan et al. Mar 2000 A
6035527 Tamm Mar 2000 A
6040622 Wallace Mar 2000 A
6060778 Jeong et al. May 2000 A
6069407 Hamzehdoost May 2000 A
6072243 Nakanishi Jun 2000 A
6081036 Hirano et al. Jun 2000 A
6119338 Wang et al. Sep 2000 A
6122171 Akram et al. Sep 2000 A
6127833 Wu et al. Oct 2000 A
6160705 Stearns et al. Dec 2000 A
6172419 Kinsman Jan 2001 B1
6175087 Keesler et al. Jan 2001 B1
6184463 Panchou et al. Feb 2001 B1
6194250 Melton et al. Feb 2001 B1
6204453 Fallon et al. Mar 2001 B1
6214641 Akram Apr 2001 B1
6235554 Akram et al. May 2001 B1
6239485 Peters et al. May 2001 B1
D445096 Wallace Jul 2001 S
D446525 Okamoto et al. Aug 2001 S
6274821 Echigo et al. Aug 2001 B1
6280641 Gaku et al. Aug 2001 B1
6316285 Jiang et al. Nov 2001 B1
6351031 Iijima et al. Feb 2002 B1
6353999 Cheng Mar 2002 B1
6365975 DiStefano et al. Apr 2002 B1
6376906 Asai et al. Apr 2002 B1
6392160 Andry et al. May 2002 B1
6395578 Shin et al. May 2002 B1
6405431 Shin et al. Jun 2002 B1
6406942 Honda Jun 2002 B2
6407341 Anstrom et al. Jun 2002 B1
6407930 Hsu Jun 2002 B1
6448510 Neftin et al. Sep 2002 B1
6451509 Keesler et al. Sep 2002 B2
6479762 Kusaka Nov 2002 B2
6497943 Jimarez et al. Dec 2002 B1
6517995 Jacobson et al. Feb 2003 B1
6534391 Huemoeller et al. Mar 2003 B1
6544638 Fischer et al. Apr 2003 B2
6586682 Strandberg Jul 2003 B2
6608757 Bhatt et al. Aug 2003 B1
6660559 Huemoeller et al. Dec 2003 B1
6715204 Tsukada et al. Apr 2004 B1
6727645 Tsujimura et al. Apr 2004 B2
6730857 Konrad et al. May 2004 B2
6734542 Nakatani et al. May 2004 B2
6740964 Sasaki May 2004 B2
6753612 Adae-Amoakoh et al. Jun 2004 B2
6774748 Ito et al. Aug 2004 B1
6787443 Boggs et al. Sep 2004 B1
6803528 Koyanagi Oct 2004 B1
6815709 Clothier et al. Nov 2004 B2
6815739 Huff et al. Nov 2004 B2
6838776 Leal et al. Jan 2005 B2
6888240 Towle et al. May 2005 B2
6919514 Konrad et al. Jul 2005 B2
6921968 Chung Jul 2005 B2
6921975 Leal et al. Jul 2005 B2
6931726 Boyko et al. Aug 2005 B2
6953995 Farnworth et al. Oct 2005 B2
6987314 Yoshida et al. Jan 2006 B1
7015075 Fay et al. Mar 2006 B2
7030469 Mahadevan et al. Apr 2006 B2
7081661 Takehara et al. Jul 2006 B2
7125744 Takehara et al. Oct 2006 B2
7185426 Hiner et al. Mar 2007 B1
7198980 Jiang et al. Apr 2007 B2
7242081 Lee Jul 2007 B1
7262082 Lin et al. Aug 2007 B1
7282394 Cho et al. Oct 2007 B2
7285855 Foong Oct 2007 B2
7345361 Mallik et al. Mar 2008 B2
7372151 Fan et al. May 2008 B1
7429786 Karnezos et al. Sep 2008 B2
7459202 Magera et al. Dec 2008 B2
7459349 Yoshida et al. Dec 2008 B1
7548430 Huemoeller et al. Jun 2009 B1
7550857 Longo et al. Jun 2009 B1
7633765 Scanlan et al. Dec 2009 B1
7671457 Hiner et al. Mar 2010 B1
7714453 Khan et al. May 2010 B2
7737542 Yoshida et al. Jun 2010 B1
7777351 Berry et al. Aug 2010 B1
7825520 Longo et al. Nov 2010 B1
7851894 Scanlan Dec 2010 B1
7968918 Kim Jun 2011 B2
8058101 Haba et al. Nov 2011 B2
8076765 Chen et al. Dec 2011 B2
8405212 Chu et al. Mar 2013 B2
20020017712 Bessho et al. Feb 2002 A1
20020061642 Haji et al. May 2002 A1
20020066952 Taniguchi et al. Jun 2002 A1
20020195697 Mess et al. Dec 2002 A1
20030025199 Wu et al. Feb 2003 A1
20030128096 Mazzochette Jul 2003 A1
20030141582 Yang et al. Jul 2003 A1
20030197284 Khiang et al. Oct 2003 A1
20040063246 Karnezos Apr 2004 A1
20040145044 Sugaya et al. Jul 2004 A1
20040159462 Chung Aug 2004 A1
20050121764 Mallik et al. Jun 2005 A1
20050139985 Takahashi Jun 2005 A1
20050242425 Leal et al. Nov 2005 A1
20070273049 Khan et al. Nov 2007 A1
20070281471 Hurwitz et al. Dec 2007 A1
20070290376 Zhao et al. Dec 2007 A1
20080230887 Sun et al. Sep 2008 A1
20110117700 Weng et al. May 2011 A1
20110140247 Pagaila et al. Jun 2011 A1
20120228782 Kawata et al. Sep 2012 A1
Foreign Referenced Citations (5)
Number Date Country
05-109975 Apr 1993 JP
05-136323 Jun 1993 JP
07-017175 Jan 1995 JP
08-190615 Jul 1996 JP
10-334205 Dec 1998 JP
Non-Patent Literature Citations (12)
Entry
IBM Technical Disclosure Bulletin, “Microstructure Solder Mask by Means of a Laser”, vol. 36, Issue 11, p. 589, Nov. 1, 1993.
Kim et al., “Application of Through Mold Via (TMV) as PoP base package”, 58th ECTC Proceedings, May 2008, Lake Buena Vista, FL, 6 pages, IEEE.
Scanlan, “Package-on-package (PoP) with Through-mold Vias”, Advanced Packaging, Jan. 2008, 3 pages, vol. 17, Issue 1, PennWell Corporation.
Hiner et al., “Printed Wiring Motherboard Having Bonded Interconnect Redistribution Mesa”, U.S. Appl. No. 10/992,371, filed Nov. 18, 2004.
Huemoeller et al., “Build Up Motherboard Fabrication Method and Structure”, U.S. Appl. No. 11/824,395, filed Jun. 29, 2007.
Huemoeller et al., “Buildup Dielectric Layer Having Metallization Pattern Semiconductor Package Fabrication Method”, U.S. Appl. No. 12/387,691, filed May 5, 2009.
Miller, Jr. et al., “Thermal Via Heat Spreader Package and Method”, U.S. Appl. No. 12/421,118, filed Apr. 9, 2009.
Darveaux et al., “Stackable Treated Via Package and Method”, U.S. Appl. No. 12/787,238, filed May 25, 2010.
Yoshida et al., “Stackable Semiconductor Package”, U.S. Appl. No. 12/799,751, filed Apr. 30, 2010.
Darveaux et al., “Stackable Package and Method”, U.S. Appl. No. 12/917,185, filed Nov. 1, 2010.
Yoshida et al., “Stackable Semiconductor Package”, U.S. Appl. No. 12/931,325, filed Jan. 27, 2011.
Kim et al., “Semiconductor Device and Fabricating Method Thereof”, U.S. Appl. No. 12/943,540, filed Nov. 10, 2010.