Number | Name | Date | Kind |
---|---|---|---|
4112575 | Fu et al. | Sep 1978 | |
4282270 | Nozaki et al. | Aug 1981 | |
4363868 | Takasaki et al. | Dec 1982 | |
4621277 | Ito et al. | Nov 1986 |
Entry |
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Pan et al., "Properties of Thin LPCVD Silicon Oxynitride Films, " J. Electronic Matls., vol. 14, No. 5, Sep. 1985, pp. 617-632. |
Remmerie et al., "Physical and Electrical Characterization of LPCVD Oxynitride Layers, " Insulating Films on Semiconductors, 1985. |
Gaind et al., "Physiochemical Properties of Chemical Vapor-Deposited Silicon Oxynitride from a SiH.sub.4 --CO.sub.2 --NH.sub.3 --H.sub.2 System," J. Electrochem. Soc., vol. 125, No. 1, pp. 139-145, Jan. 1978. |