Number | Name | Date | Kind |
---|---|---|---|
4894132 | Tanaka | Jan 1990 | A |
5108569 | Gilboa et al. | Apr 1992 | A |
5439574 | Kobayashi et al. | Aug 1995 | A |
5556520 | Latz | Sep 1996 | A |
5942089 | Sproul et al. | Aug 1999 | A |
Entry |
---|
Affinito and Parsons, “Mechanisms of Voltage Controlled, Reactive, Planar Magnetron Sputtering of A1 in Ar/N2 and Ar/O2 Atmospheres”, Journal of Vacuum Science Technology, A 2(3), Jul.-Sep., 1984, pp. 1275-1284. |
McMahon et al., “Voltage Controlled, Reactive Planar Magnetron Sputtering of AIN Thin Films”, Journal of Vacuum Science Technology, 20(3), Mar., 1982, pp. 376-378. |
Rossnagel et al., Handbook of Plasma Processing Technology, Noyes Publications, NJ, USA, 1989, pp. 233-259. |