This application is a divisional of application Ser. No. 08/343,126, filed 22 Nov. 1994 now U.S. Pat. No. 5,536,559.
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4497465 | Yeakley et al. | Feb 1985 | |
4506184 | Siddall | Mar 1985 | |
4747608 | Sato et al. | May 1988 | |
4893403 | Helflinger et al. | Jan 1990 | |
5374829 | Sakamoto et al. | Dec 1994 | |
5544213 | Chiba et al. | Aug 1996 |
Number | Date | Country |
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54-58365 | Nov 1979 | JPX |
Entry |
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Wallace et al. A novel aligner for X-ray Lighography, Nuclear Instruments and Methods in Physics Research, A319, pp. 371-375, 1992. |
Paros et al., How to design FLEXURE HINGES, Machine Design, pp. 151-156, Nov. 25, 1965. |
Scire et al., Piezodriven 50.mu.m range stage with subnanometer resolution, Rev. Sci. Instrum. 49(12), pp. 1735-1740, Dec. 1976. |
Wallace et al. A novel aligner for X-ray lithography, Nuclear Instruments and Methods in Physics Research, A319, pp. 371-375, 1992. |
Drawing entitled "IBM Mask". |
Drawing entitled "Example of Sperry Mask Mount One of Three Vacuum Holding Cups", Dec. 5, 1996. |
Number | Date | Country | |
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Parent | 343126 | Nov 1994 |