SUBSTRATE PROCESSING APPARATUS

Abstract

A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plan view of a substrate processing apparatus according to a first embodiment of the present invention;

FIG. 2 is a schematic side view of the substrate processing apparatus shown in FIG. 1 as viewed from the +X direction;

FIG. 3 is a schematic side view of the substrate processing apparatus shown in FIG. 1 as viewed from the −X direction;

FIG. 4 is a schematic side view of an interface block as viewed from the +Y side;

FIG. 5 is a diagram for explaining the configuration of a cleaning/drying processing unit;

FIG. 6 is a diagram for explaining the operation of the cleaning/drying processing unit;

FIG. 7 is a schematic view showing a nozzle for cleaning processing and a nozzle for drying processing that are integrally formed;

FIG. 8 is a schematic view showing another example of a nozzle for drying processing;

FIG. 9 is a diagram for explaining a method of subjecting a substrate to drying processing using the nozzle for drying processing shown in FIG. 8;

FIG. 10 is a schematic view showing still another example of a nozzle for drying processing;

FIG. 11 is a schematic view showing another example of a cleaning/drying processing unit;

FIG. 12 is a diagram for explaining a method of subjecting a substrate to drying processing using the cleaning/drying processing unit shown in FIG. 11;

FIG. 13 is a vertical sectional view showing an example of the internal configuration of a two-fluid nozzle used for cleaning and drying processing;

FIG. 14 is a diagram for explaining a method of subjecting a substrate to cleaning and drying processing using the two-fluid nozzle shown in FIG. 13;

FIG. 15 is a plan view of a substrate processing apparatus according to a second embodiment of the present invention; and

FIG. 16 is a schematic side view of an interface block shown in FIG. 15 as viewed from the +Y side.

Claims

1. A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: a processing section for subjecting a substrate to processing; andan interface that transfers and receives the substrate between said processing section and said exposure device,said interface includingfirst and second transport units that transport the substrate,a cleaning processing unit that subjects the substrate to cleaning processing before exposure processing by said exposure device,a drying processing unit that subjects the substrate to drying processing after the exposure processing by said exposure device, anda platform on which the substrate is temporarily placed,said first transport unit transporting the substrate among said processing section, said cleaning processing unit, and said platform,said second transport unit transporting the substrate among said platform, said exposure device, and said drying processing unit.

2. The substrate processing apparatus according to claim 1, wherein said cleaning processing unit subjects the substrate to the drying processing after subjecting the substrate to the cleaning processing.

3. The substrate processing apparatus according to claim 1, wherein said drying processing unit subjects the substrate to the cleaning processing before subjecting the substrate to the drying processing.

4. The substrate processing apparatus according to claim 1, wherein said platform includes a temperature control waiting unit that makes the substrate wait until the substrate before the exposure processing by said exposure device can be carried into said exposure device while keeping the substrate at a predetermined temperature.

5. The substrate processing apparatus according to claim 1, wherein said processing section, said interface, and said exposure device are arranged side by side in a first direction,said interface has at least one side surface in a second direction perpendicular to said first direction within a horizontal plane, andsaid drying processing unit is arranged on the side of said one side surface within said interface.

6. The substrate processing apparatus according to claim 5, wherein said interface has another side surface opposite to said one side surface in said second direction, andsaid cleaning processing unit is arranged on the side of said opposite side surface within said interface.

7. The substrate processing apparatus according to claim 6, wherein said platform is arranged in a substantially central portion in said second direction within said interface,said first transport unit is arranged between said cleaning processing unit and said platform, andsaid second transport unit is arranged between said platform and said drying processing unit.

8. The substrate processing apparatus according to claim 5, wherein said interface has another side surface opposite to said one side surface in said second direction,said first transport unit is arranged on the side of said opposite side surface within said interface,said cleaning processing unit and said platform are stacked in a substantially central portion in said second direction within said interface, andsaid second transport unit is arranged in an area from said cleaning processing unit and said platform to said drying processing unit.

9. The substrate processing apparatus according to claim 1, wherein said second transport unit includes first and second holders that each hold the substrate,said first holder holding the substrate when the substrate is transported before the exposure processing by said exposure device and after the drying processing by said drying processing unit, andsaid second holder holding the substrate when the substrate after said exposure processing is transported from said exposure device to said drying processing unit.

10. The substrate processing apparatus according to claim 9, wherein said second holder is provided below said first holder.

11. The substrate processing apparatus according to claim 1, wherein said interface further includes an edge exposure unit that exposes a peripheral portion of the substrate, andsaid first transport unit transports the substrate among said processing section, said edge exposure unit, said cleaning processing unit, and said platform.