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Hsinchu, TW
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Patents Grants
last 30 patents
Information
Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Patent number
7,131,102
Issue date
Oct 31, 2006
Taiwan Semiconductor Manufacturing Co., Ltd
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Patent number
7,036,108
Issue date
Apr 25, 2006
Taiwan Semiconductor Manufacturing Co., Ltd
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Patent number
7,013,453
Issue date
Mar 14, 2006
Taiwan Semiconductor Manufacturing Co., Ltd.
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Single trench alternating phase shift mask fabrication
Patent number
6,830,702
Issue date
Dec 14, 2004
Taiwan Semiconductor Manufacturing Co. Ltd
San-De Tzu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Patent number
6,711,732
Issue date
Mar 23, 2004
Taiwan Semiconductor Manufacturing Company
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Dual trench alternating phase shift mask fabrication
Patent number
6,660,653
Issue date
Dec 9, 2003
Taiwan Semiconductor Manufacturing Co. Ltd
San-De Tzu
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Formation of silicon nitride film for a phase shift mask at 193 nm
Patent number
6,319,568
Issue date
Nov 20, 2001
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Elimination of proximity effect in photoresist
Patent number
6,291,118
Issue date
Sep 18, 2001
Industrial Technology Research Institute
Tsai-Sheng Gau
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Single-mask dual damascene processes by using phase-shifting mask
Patent number
6,180,512
Issue date
Jan 30, 2001
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Formation of silicon nitride film for a phase shift mask at 193 nm
Patent number
6,045,954
Issue date
Apr 4, 2000
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Elimination of proximity effect in photoresist
Patent number
6,040,119
Issue date
Mar 21, 2000
Industrial Technology Research Institute
Tsai-Sheng Gau
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Single-mask dual damascene processes by using phase-shifting mask
Patent number
5,976,968
Issue date
Nov 2, 1999
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Two-layered TSI process for dual damascene patterning
Patent number
5,935,762
Issue date
Aug 10, 1999
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process utilizing relationship between reflectivity and resist thic...
Patent number
5,916,717
Issue date
Jun 29, 1999
Industrial Technology Research Institute
Chuen-Huei Yang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of self-aligned dual damascene patterning using developer so...
Patent number
5,882,996
Issue date
Mar 16, 1999
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual damascene process using single photoresist process
Patent number
5,877,075
Issue date
Mar 2, 1999
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Opposed two-layered photoresist process for dual damascene patterning
Patent number
5,877,076
Issue date
Mar 2, 1999
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for fabricating a sub-half micron MOSFET device with global...
Patent number
5,710,076
Issue date
Jan 20, 1998
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for fabricating a sub-half micron MOSFET device with insulat...
Patent number
5,691,215
Issue date
Nov 25, 1997
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for making self-aligned bit line contacts on a DRAM circuit...
Patent number
5,670,404
Issue date
Sep 23, 1997
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Masks and methods of forming masks which avoid phase conflict probl...
Patent number
5,670,281
Issue date
Sep 23, 1997
Industrial Technology Research Institute
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reduced notching of polycide gates using silicon anti reflection layer
Patent number
5,604,157
Issue date
Feb 18, 1997
Industrial Technology Research Institute
Chang-Ming Dai
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Publication number
20040168147
Publication date
Aug 26, 2004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Publication number
20040168146
Publication date
Aug 26, 2004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Full sized scattering bar alt-PSM technique for IC manufacturing in...
Publication number
20040161679
Publication date
Aug 19, 2004
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Chang-Ming Dai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Single trench alternating phase shift mask fabrication
Publication number
20030226819
Publication date
Dec 11, 2003
Taiwan Semiconductor Manufacturing Co., Ltd.
San-De Tzu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
DUAL TRENCH ALTERNATING PHASE SHIFT MASK FABRICATION
Publication number
20030219990
Publication date
Nov 27, 2003
Taiwan Semiconductor Manufacturing Co., Ltd.
San-De Tzu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY